Milano Activities: an update Mauro Citterio On behalf of INFN Milano

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Presentation transcript:

Milano Activities: an update Mauro Citterio On behalf of INFN Milano

Summary Aluminum Bus Evaluation  measurements with improved accuracy  design of a bus for “3-chip-assembly” Rad-Hard SRAM  on-going design and recent submission  results from previous submission Revision of the HDI  what are the functionalities under study

Aluminum Bus Evaluation Measurements on the 1st BUS prototype are on-going  improved TDR measurements confirm a typical impedance of ~ 60 Ohm  crosstalk is higher than estimated and can as high as ~10 %  measurements performed on various samples with same results Discussion on the stackup is still on going with CERN simulation and actual BUS properties still do not agree CERN or Milano will perform a “cut” of the BUS to verify layer thickness frequency response (signal up to 200 MHz, on individual lines) are promising at full BUS lenght ~ 10 cm Our goal was ~ 10 cm in BUS lenght. indeed 1st layer signal traces “cover layer” ground plane 2nd layer signal traces 155 µ Glue 5µ - er = 4.5 Polyimide 40µ - er = 3.5 Aluminium 25µ Aluminium 10µ Polyimide 20µ - er = 3.5

Impedance Measurements End of a probe (un-terminated) Probe contact (negligible parasitic inductance) 50 ohm injection line Trace impedance Impedance measurement for 6 “identical” traces The positive slope measures the trace resistance Trace impedance is > 60 Ohm Traces are not homegenuos in impedance

Signal Integrity Measurements Trace lenghts ~ 10 cm: - Termination at the receiving end is 50 Ohm The signal has 200 MHz frequency and 50 % duty cycle, 1 Volt amplitude Reference line (60 Ohm) is a PCB trace used for calibration Set-up for multiple trace injection is being put together

Crosstalk measurements From Simulation: - Hp: “one” aggressor and one victim nearby. - Signal on victim is approximately 30 mV at its peak - Signal on victim is mostly due to the nearby aggressors NEXT ~ 3 % From Measurement: - Signal on victim is indeed due to nearby aggressors - Lines are with via between two layers NEXT ~ 10 %

Bus for a 3-chip Assembly Layout of a BUS for up to 3 front-end IC “FE 32x128” - Bus widht: 8.7 mm - Signal trace layer widht: 7.5 mm - Bus length ~ 6.5 cm Issues accepted by CERN: - “Area opening” of 300x500 mm possible on power planes to allow decoupling cap mounting. The size of the openings is the “best results” on test structures - The stackup (layer and dielectric thickness) will be similar to the one used in the prototype bus. However multiple thin polyimide layers will be used to get “thick insulating” layers (to use same brand material everywhere) Detailed design NOT started

Radiation hardened SRAM (A. Stabile, V. Liberali) Radiation hardness (rad-hard) is achieved by means of design techniques Rad-hard techniques are used at various levels of representation: system level; architecture level; circuit level; layout level. Fabrication process: 180 nm standard CMOS good trade-off between cumulative effects and single event effects.

Design of a rad-hard SRAM cell Edgeless nMOS transistors to mitigate cumulative effects “Fringe” capacitor to mitigate single events Large number of bulk/n-well contacts to mitigate latch-up

SRAM cells comparison We have designed three different rad-hard SRAM cells: H-cell: Good level of radiation hardening Cumulative effect: up to 10 Mrad of dose Cell area: 16 µm2 S-cell: Medium level of radiation hardening Cumulative effect: up to 2-3 Mrad of dose (estimated) Cell area: 13 µm2 M-cell: Rad tolerant cell Cumulative effect: up to 1 Mrad (estimated) Cell area: 9 µm2 180 nm standard (non rad-hard) SRAM area: 7 µm2

Cell layouts H-cell S-cell M-cell

RC7C512RHH 512 kbit SRAM Based on H-cells Tested up to 10 Mrad of total dose Access times range from 10 to 20 ns Fabricated in 2009 by X-FAB (Sarawak)

RC7C512RHS 512 kbit SRAM Based on S-cells We have estimated a rad-hard level up to 2-3 Mrad of dose Access times range from 7 to 16 ns Submitted for prototyping to X-FAB (Sarawak), Feb. 2010

Power consumption (1/2) Power consumption strongly depends on total dose received Power consumption in memories based on H-cells increases of few microampere, which is only due to parasitic leakage currents generated by I/O pads Pre radiation power consumption:

Power consumption (2/2)

Receiver + optical link Revision of the HDI New Baseline will not necessarily require that all data will be transferred to the transition card the HDI could/should act as a data buffer awaiting for trigger, if necessary The SRAM project will provide guidelines The HDI will drive a short copper link (up to 50 cm) How many copper lines are needed is under study The line drivers will be preceded by a “formatting logic” The “transition card” will do the transition between copper and fiber using the optical link suggested by Aloisio Transition Card: Receiver + optical link Optical link ~ 1 Gbit/s Buffering Modulations Drivers Cu “bus” ~ 50 cm Power lines EDRO Near detector “medium” rad area (10 krad/yr) Counting room On detector High rad area (15 Mrad/yr)