Chapter 10: IC Technology

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Presentation transcript:

Chapter 10: IC Technology

Outline Anatomy of integrated circuits Full-Custom (VLSI) IC Technology Semi-Custom (ASIC) IC Technology Programmable Logic Device (PLD) IC Technology

CMOS transistor Source, Drain Gate Oxide Diffusion area where electrons can flow Can be connected to metal contacts (via’s) Gate Polysilicon area where control voltage is applied Oxide Si O2 Insulator so the gate voltage can’t leak

End of the Moore’s Law? Every dimension of the MOSFET has to scale (PMOS) Gate oxide has to scale down to Increase gate capacitance Reduce leakage current from S to D Pinch off current from source to drain Current gate oxide thickness is about 2.5-3nm That’s about 25 atoms!!! source drain oxide gate IC package IC channel Silicon substrate

20Ghz + FinFET has been manufactured to 18nm Still acts as a very good transistor Simulation shown that it can be scaled to 10nm Quantum effect start to kick in Reduce mobility by ~10% Ballistic transport become significant Increase current by about ~20%

NAND Metal layers for routing (~10) PMOS don’t like 0 NMOS don’t like 1 A stick diagram form the basis for mask sets

Silicon manufacturing steps Tape out Send design to manufacturing Spin One time through the manufacturing process Photolithography Drawing patterns by using photoresist to form barriers for deposition

Full Custom Very Large Scale Integration (VLSI) Placement Routing Place and orient transistors Routing Connect transistors Sizing Make fat, fast wires or thin, slow wires May also need to size buffer Design Rules “simple” rules for correct circuit function Metal/metal spacing, min poly width…

Full Custom Best size, power, performance Hand design Horrible time-to-market/flexibility/NRE cost… Reserve for the most important units in a processor ALU, Instruction fetch… Physical design tools Less optimal, but faster…

Semi-Custom Gate Array Standard Cell Array of prefabricated gates “place” and route Higher density, faster time-to-market Does not integrate as well with full-custom Standard Cell A library of pre-designed cell Place and route Lower density, higher complexity Integrate great with full-custom

Semi-Custom Most popular design style Jack of all trade Master of none Good Power, time-to-market, performance, NRE cost, per-unit cost, area… Master of none Integrate with full custom for critical regions of design

Programmable Logic Device Programmable Logic Array, Programmable Array Logic, Field Programmable Gate Array All layers already exist Designers can purchase an IC To implement desired functionality Connections on the IC are either created or destroyed to implement Benefits Very low NRE costs Great time to market Drawback High unit cost, bad for large volume Power Except special PLA slower 1600 usable gate, 7.5 ns $7 list price

Xilinx FPGA

Configurable Logic Block (CLB)

I/O Block