Temperature Sensors on Flexible Substrates

Slides:



Advertisements
Similar presentations
NEW SENSING DEVICES FOR IMPROVING THE QUALITY OF LIFE Interest in FP 6 call: 'Nanotechnologies and nanosciences, knowledge-based multifunctional materials.
Advertisements

Aamer Mahmood Donald P. Butler Zeynep Çelik-Butler
I have seen this happen !. You have exceeded your storage allocation.
Process Flow : Overhead and Cross Section Views ( Diagrams courtesy of Mr. Bryant Colwill ) Grey=Si, Blue=Silicon Dioxide, Red=Photoresist, Purple= Phosphorus.
Process Flow Steps Steps –Choose a substrate  Add epitaxial layers if needed –Form n and p regions –Deposit contacts and local interconnects –Deposit.
Simplified Example of a LOCOS Fabrication Process
COUNCIL FOR THE CENTRAL LABORATORY OF THE RESEARCH COUNCILS EAP dimple fabrication process. Process D EAP dimple using carbon powder electrodes and DRIE.
TimePix / InGrid Problems and solutions Yevgen Bilevych Amsterdam
Adhesive Bonding with SU-8
Photolithography Photolithography is the transfer of patterns, circuits, device structures, etc. to a substrate or wafer using light and a mask.
Design and Implementation of VLSI Systems (EN1600) lecture04 Sherief Reda Division of Engineering, Brown University Spring 2008 [sources: Sedra/Prentice.
Top Side Conductor vacuum deposition Aluminum sputter deposit in Argon plasma CVC 601-sputter deposition tool.
Bulk MEMS 2014, Part 1 Types of MEMS Bulk MEMS: anisotropic wet or DRIE of bulk silicon SOI MEMS: DRIE or wet etching of SOI.
Temperature Sensor Array Using flexible Substrate 陳俊廷.
Fig 10: I-V characteristics of Au/PDNC/Al/Au junction. This shows that the molecule has rectification towards the positive bias. Current (A) M I A M I.
BIO-MEMS DEVICES TO MONITOR NEURAL ELECTRICAL CIRCUITRY Andres Huertas, Michele Panico, Shuming Zhang ME 381 Final Project, Dec 4th, 2003.
Applications: CO Gas Sensor
SOIMUMPs Process Flow Keith Miller Foundry Process Engineer.
Bulk MEMS 2013, Part 2
Rochester Institute of Technology - MicroE © REP/LFF 8/17/2015 Metal Gate PMOS Process EMCR201 PMOS page-1  10 Micrometer Design Rules  4 Design Layers.
ES 176/276 – Section # 2 – 09/19/2011 Brief Overview from Section #1 MEMS = MicroElectroMechanical Systems Micron-scale devices which transduce an environmental.
NanoFab Smart Skin: Multi-sensory Arrays on Flexible Substrates Zeynep Çelik-Butler, and Donald P. Butler, Electrical Engineering & NanoFab University.
McGill Nanotools Microfabrication Processes
Fabrication of Active Matrix (STEM) Detectors
Dahee Kim (Ewha womans university) for MPC-EX collaboration TEST OF MINI-PAD SILICON SENSOR FOR PHENIX MPC-EX.
Noise Reduction Of Si x Ge 1-x and Si x Ge 1-x O y Bolometers by Forming Gas Passivation Mukti Rana and Donald Butler University of Texas at Arlington.
1 Absolute Pressure Sensors Z. Celik-Butler, D. Butler and M. Chitteboyina Nanotechnology Research and Teaching Facility University of Texas at Arlington.
I have seen this happen !. You have exceeded your storage allocation.
Fabrication Technology(1)
Microcontact Printing
PTC Proposal Seongjin Jang September 09, Submit Application To PTC All the users should submit their process-related information to Process Technology.
MIT Lincoln Laboratory NU Status-1 JAB 11/20/2015 Advanced Photodiode Development 7 April, 2000 James A. Burns ll.mit.edu.
Thermal doping review example This presentation is partially animated. Only use the control panel at the bottom of screen to review what you have seen.
1 M. Chitteboyina, D. Butler and Z. Celik-Butler, Nanotechnology Research and Teaching Facility University of Texas at Arlington
Spencer/Ghausi, Introduction to Electronic Circuit Design, 1e, ©2003, Pearson Education, Inc. Chapter 3, slide 1 Introduction to Electronic Circuit Design.
Microprocessor Production: The Use of a Plasma Barrel Etcher to Make Microchips Mentor: Erik Muehlenkamp Advisor: Dr. Chih-Hung Chang Done by Sarah Bronner.
NMOS FABRICATION 1. Processing is carried out on a thin wafer cut from a single crystal of silicon of high purity into which the required p-impurities.
CORPORATE INSTITUTE OF SCIENCE & TECHNOLOGY, BHOPAL DEPARTMENT OF ELECTRONICS & COMMUNICATIONS NMOS FABRICATION PROCESS - PROF. RAKESH K. JHA.
Substitute beer and pizza?. Basic Silicon Solar Cell as fabricated in Cameron With Schematic.
Atomic Layer Deposition for Microchannel Plates Jeffrey Elam Argonne National Laboratory September 24, 2009.
Possible types of module Si/W CALORIMETER CONCEPT Si/W CALORIMETER CONCEPT G.Bashindzhagyan Moscow State University June 2002 Internal structure (not in.
Design and Implement a Electro thermal Compliant
Fab - Step 1 Take SOI Wafer Top view Side view Si substrate SiO2 – 2 um Si confidential.
(Chapters 29 & 30; good to refresh 20 & 21, too)
Antenna Project in Cameron clean room Wafer preparation, conductor deposition, photolithography.
Microfabrication Home exercise #3 Return by Feb 21st, 22 o’clock
Date of download: 9/26/2017 Copyright © ASME. All rights reserved.
Infineon CoolIR2DieTM Power Module
Photolithography Photolithography is the transfer of patterns, circuits, device structures, etc. to a substrate or wafer using light and a mask.
New Mask and vendor for 3D detectors
CMOS Fabrication CMOS transistors are fabricated on silicon wafer
TimePix3 status and protection
Manufacturing Process I
Bonding interface characterization devices
MEMS Two-Phase Vapor Escape Heat Exchanger
Fabrication Steps of Detectors
CMOS Process Flow.
ALICE PD group meeting Andrea Francescon.
SCUBA-2 Detector Technology Development
VLSI System Design LEC3.1 CMOS FABRICATION REVIEW
MEMS Two-Phase Vapor Escape Heat Exchanger
Lecture #25 OUTLINE Device isolation methods Electrical contacts to Si
Micromachined Infrared Sensor Arrays on Flexible Polyimide Substrates
Process flow part 2 Develop a basic-level process flow for creating a simple MEMS device State and explain the principles involved in attaining good mask.
Memscap - A publicly traded MEMS company
Manufacturing Process I
Layer Transfer Using Plasma Processing for SMART-Wafer
BONDING The construction of any complicated mechanical device requires not only the machining of individual components but also the assembly of components.
Possible types of Si-sensor: SILICON CALORIMETRY FOR A LINEAR COLLIDER G.Bashindzhagyan, Il Park August Silicon sensor.
Fig. 2 Materials and designs for bioresorbable PC microcavity-based pressure and temperature sensors. Materials and designs for bioresorbable PC microcavity-based.
Presentation transcript:

Temperature Sensors on Flexible Substrates Z. Celik-Butler, D. Butler and M. Chitteboyina Nanotechnology Research and Teaching Facility University of Texas at Arlington http://www.uta.edu/engineering/nano/ March 13, 2009

Temperature Sensor Temperature Sensor - CoventorWare Model Flexible superstrate 0.15cm x 0.05cm x 0.005 cm Top surface is in contact with the structure cross-section cut Flexible substrate Temperature sensor is connected to external flexible circuitry through the flexible substrate

Temperature Sensor Z-scale exaggerated 5 times Aluminum Insulation Layers Sensor Element Right arm of the temperature sensor Left arm of the temperature sensor Flexible Substrate

Fabrication Process Flow for the Temperature Sensor Clean silicon wafer

Fabrication Process Flow for the Temperature Sensor 100 nm silicon nitride layer

Fabrication Process Flow for the Temperature Sensor Flexible Substrate Polyimide ~ 40 µm

Fabrication Process Flow for the Temperature Sensor Right electrode of the sensor

Fabrication Process Flow for the Temperature Sensor Sensor Element

Fabrication Process Flow for the Temperature Sensor First Insulation Layer

Fabrication Process Flow for the Temperature Sensor Left electrode of the sensor

Fabrication Process Flow for the Temperature Sensor Second Insulation Layer

Fabrication Process Flow for the Temperature Sensor Flexible Superstrate Polyimide ~ 40 µm Undercut made to access the sensor Second Insulation Layer Silicon Nitride ~ 100 nm

Fabrication Process Flow for the Temperature Sensor Top aluminum surface will be in contact with the structure Aluminum ~ 400 nm

Fabrication Process Flow for the Temperature Sensor Back side view of the Temperature Sensor Sensor are connected to flexible circuitry through the flexible substrate

Temperature Sensor Simulation Results Temperature pulse applied on the top aluminum surface 370.5 K 300.0 K Temperature Sensor CoventorWare Model Bottom Flexible substrate kept either floating or fixed at 300 K Simulated, heating thermal time constant = 0.07 ms cooling thermal time constant = 0.67 ms

Temperature Sensor Fabrication STEP 1 STEP 2 STEP 3 Right arm of the sensor Sensor Element First Insulation Layer STEP 4 STEP 5 STEP 6, 7, 8 Left arm of the sensor Second Insulation Layer Spin-coat and pattern polyimide superstrate layer Deposit Aluminum layer Etch the back-side of the wafer and get access to bond-pads

Temperature Sensor Fabrication Spin-coat and pattern polyimide superstrate layer Then deposited Aluminum on top of the superstrate layer to make contact with the structure

Temperature Sensor Results TS 80x80 µm Device 1 TS 80x80 µm Device 2