FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Spring Conference 2008 Petersberg, Germany 1 ITRS 2008 ITWG Spring Meeting April 2-4.

Slides:



Advertisements
Similar presentations
Work in Progress --- Not for Publication 26 April Interconnect Working Group ITRS April 2001 Grenoble.
Advertisements

Metrology Roadmap Europe Rien Stoup(PAN Analytical) Mauro Vasconi (ST)
18 July 2001 Work In Progress – Not for Publication 2001 ITRS Front End Process July 18, 2001 San Francisco, CA.
April 26-27, 2001 Ed Hall Work in Progress – Not for Publication Modeling and Simulation TWG Attendees Wim ShoenmakerEurope Gilles Le CarvalEurope Herve.
FEP ITRS Major Issues April Stresa, Italy ITRS FEP- Major Issues for 2004/5 Resolution of gate electrode CD control issue Doping & Thermal.
2009 Litho ITRS Spring Meeting
1 Feb19, 2003 ITRS 2003, Sunnyvale, Ca ITRS Conference April 3-4, 2003 Amsterdam, Netherlands ITRS 2003 Yield Enhancement TWG Attendees: Mike Retersdorf.
2011 ITRS Revision Guidelines1 JAN – MARCH – ITRS TABLES DRAFTS PREPARED –ITWGs and CrossTWG Study Group meet each month with their teams to work Difficult.
IRC Roll-Out/Plenary 4/4 Technology Node identified by xx90 –Minimum Half-Pitch of Metal 1 of either DRAM or Logic –Logic node presently being represented.
November 29, 2001 Santa Clara , CA
ITRS Winter Conference 2006 The Ambassador Hotel Hsin Chu Taiwan 1 ITRS IRC/ITWG Meetings HsinChu December 4, 2006 UPDATED Linda Wilson
DRAFT - NOT FOR PUBLICATION 16 July 2003 – ITRS Public Conference Lithography Update ITRS Meeting San Francisco, CA July
Grenoble, France1 Work in Progress – Not for Publication April 26-27, 2001 ESH ITWG 2001 ITRS Status Update.
ITRS Conference, December 6, 2000
Work in Progress --- Not for Publication PIDS Summary, Peter M. Zeitzoff US Chair ITWG Meeting Vaals, Netherlands April 6-7, 2005.
ITRS Spring Conference 2007 Annecy France International Technology Roadmap for Semiconductors Radio Frequency and Analog/Mixed-Signal Technologies.
ITRS Winter Conference 2011 Incheon, Korea 1 Work in Progress: Not for Distribution 2012 ITRS Litho One Pager April 24, 2012 Mark Neisser – SEMATECH Mauro.
Litho ITRS Update Lithography iTWG July 2010.
2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Model Proposals For Public 07/13/05.
Metrology Roadmap ERD and ERM Update - Stresa EuropeUlrich Mantz (Infineon) Dick Verkleij (Philips) Mauro Vasconi (ST) JapanYuichiro Yamazaki (Toshiba)
1 Changes to Litho Tables for 2004 CD control (total CD control includes cross field, wafer and lots) –US and Japan TWG studies concluded that
(not for publication – work in progress) ITRS Summer Conference 2009 San Francisco 1 Front End Processes 2009 ITRS ITRS Public Conference July 15, 2009.
Slide ITRS Spring Meeting Sponsored by Infineon Technologies Philips Semiconductors STMicroelectronics.
The International Technology Roadmap for Semiconductors
2 December 2003 – ITRS Public Conference Tsinchu, Taiwan ITRS 2003 Front End Process ITRS Conference December 2, 2003 Hsinchu, Taiwan.
ITRS Design ITWG ITRS Design + System Drivers July 9-10, 2012 Design ITWG Masaru Kakimoto (Japan) Juan-Antonio Carballo (USA) Gary Smith (USA) David.
Metrology Roadmap 2003 Update EuropeUlrich Mantz (Infineon) Mauro Vasconi (ST) JapanMasahiko Ikeno (Mitsubishi) Toshihiko Osada (Fujitsu) Akira Okamoto.
Work in Progress --- Not for Publication 6 December Interconnect Working Group ITRS 2000 Lakeshore Hotel, Hsinchu, Taiwan, R.O.C. 6 December 2000.
International Technology Roadmap for Semiconductors
Litho ITRS Update Lithography iTWG Dec 2010.
International Technology Roadmap for Semiconductors
ITRS 2000 Update - Taipei, Taiwan, 11/06/00
Front End Processes 2010 ITRS
International Technology Roadmap for Semiconductors
Work in Progress --- Not for Publication 1 ERD WG 4/2/08 Koenigswinter FxF Meeting ERD ITWG Emerging Research Devices Working Group Face-to-Face Meeting.
Summer Public Conference ORTC 2010 Update Messages
DRAFT - NOT FOR PUBLICATION 14 July 2004 – ITRS Summer Conference PIDS Status and Key Issues: 2004 and 2005 ITRS Peter M. Zeitzoff for PIDS Technology.
International Technology Roadmap for Semiconductors
Winter Public Conference ORTC 2010 Update
Metrology Roadmap 2001 Update EuropeAlain Deleporte (ST) Ulrich Mantz (Infineon) Vincent Vachellerie (ST) Vincent Vachellerie (ST)JapanKorea Taiwan Henry.
1 DRAFT - NOT FOR PUBLICATION April 5-7, 2006, Maastricht ITRS - YE ITWG Meeting in Maastricht April 6-7, 2006 Lothar Pfitzner, ,
FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Summer Conference 2011, SF 1 Front End Processes ITRS 2011 Public Conference 13 July.
4 December 2002, ITRS 2002 Update Conference - Tokyo Front End Processes ITRS 2002 Update Conference December 4, 2002 Tokyo, JAPAN International TWG Members:
Front End Processes ITRS 2012 Summer Public Conference 12 July 2012
July 13, 2010ITRS public conference – San Francisco1 More-than-Moore Roadmapping Update.
International Technology Roadmap for Semiconductors
Design and System Drivers Worldwide Design ITWG: T
February 2010 L. Wilson Update Preparations and Formats.
ITRS Design ITWG Design and System Drivers Worldwide Design ITWG Key messages: 1.- Software is now part of semiconductor technology roadmap 2.-
International Technology Roadmap for Semiconductors 2001
International Technology Roadmap for Semiconductors
ITRS Roadmap Design + System Drivers Makuhari, December 2007 Worldwide Design ITWG Good morning. Here we present the work that the ITRS Design TWG has.
ITRS Design + System Drivers July, 2010 Design ITWG Juan-Antonio Carballo Tamotsu Hiwatashi William Joyner Andrew Kahng Noel Menezes Shireesh Verma.
4 December 2002, ITRS 2002 Update Conference Modeling and Simulation ITWG Jürgen Lorenz - FhG-IISB ITWG/TWG Members H. Jaouen, STM * W. Molzer, Infineon.
Work in progress – do not publish RF&A/MS 1-page update Analog - carrier Frequency bands LF Analog (0-0.4GHz)RF (0.4-30GHz)mm-wave (30-300GHz)THz (>300GHz)
Overall Roadmap Technology Characteristics (ORTC) 2012
Litho ITRS Update Lithography iTWG December 2008.
Overall Roadmap Technology Characteristics (ORTC) 2012
DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July updates to the Lithography chapter of the ITRS Lithography International Technology.
July 14, 2010 San Francisco, California Marriott Hotel Assembly and Packaging.
DRAFT - NOT FOR PUBLICATION 14 July 2004 – ITRS Summer Conference ITRS FEP Challenges Continued scaling will require the introduction of new materials.
4 December 2002, ITRS 2002 Update Conference Metrology Roadmap 2002 Update EuropeUlrich Mantz (Infineon) Alec Reader (Philips Analytical) Mauro Vasconi.
Work in Progress – Do not Publish - FEP ITRS Winter Public Conference 2012, Taiwan 1 Front End Processes ITRS 2012 Winter Public Conference.
1 Noordwijk April 23-/ April 2012 Summary for Plenary Abraham Arceo (Sematech) Arnaud Favre (adixen) Herve Fontaine (CEA Leti) Guillaume Gallet.
Kwangok Jeong and Andrew B. Kahng UCSD VLSI CAD Laboratory
ITRS 2000 Update Work In Progress - Do Not Publish! 1 ITRS/ORTC Table Update Technology Node, DRAM Chip Size, and Logic Chip Size Update, Based on the.
Wafer Edge Exclusion Kevin Fisher.
ITRS 2000 Update Work In Progress - Do Not Publish! 1 ITRS/ Design TWG Update 2000 System on Chip, Design Productivity, Low Power, Deep Submicron Design.
IEDM 2009 Baltimore MD December 7-9, 2009 Conference Report Dirk Wouters IEDM 2009 Conference Report - D.Wouters, IMEC - WIND project distribution1.
ITRS 2001 Renewal Work In Progress - Do Not Publish!
Presentation transcript:

FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Spring Conference 2008 Petersberg, Germany 1 ITRS 2008 ITWG Spring Meeting April 2-4 Petersburg, Germany FEP TWG Report

FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Spring Conference 2008 Petersberg, Germany 2 FEP ITWG Spring 2008 Participants NAMEREGION ADDRESS Larry Masaaki Mauro Chris Reported New TWG member FeRAM Masayoshi Horii

FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Spring Conference 2008 Petersberg, Germany 3 ITRS 2008 ITWG Spring Meeting FEP ITWG FEP Plans for 2008 Change Effective Gate Length I think Alan said Yes, change the gate length in 2008, push back if it is too difficult FEP will change all tables where the Gate Length dependence is first order

FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Spring Conference 2008 Petersberg, Germany 4 Spring 2008 FEP Round Table and Cross-TWG Discussion Notes Gate Length Based Modifications –Printed/Etched Ratio – need to agree with Litho –On-chip Frequency – Transistor and Design model – need alignment from PIDS, FEP and Design –New Drivers: Ion/W and CV/I – needs PIDs and FEP 2008 update and provide to ORTC - - FEP will be able to accommodate whichever driver PIDS and Design accept Flash/PCM plans for 2008 –update table entries based on PIDS survey results, refine projection for end of floating gate flash –add table to focus on charge trapping devices – Is this possible in the update? –update PCM tables UTBSOI –What is reason for color code – 2011: yellow, red – transmit to Starting Materials

FEP ITWG Meeting Notes (not for publication – work in progress) ITRS Spring Conference 2008 Petersberg, Germany 5 Spring 2008 Round Table Notes Edge Exclusion –Agreed with Factory Integration to change to 2mm throughout table, due to Clamp/Edge rolloff – transmit to Starting Materials 450MM wafer –Considering ROI – 2012 seems unrealistic – Push back – Transmit to Starting materials –Is there a market growth analysis that justifies this aggressive timing? Contact Maximum Resistivity –Data from MRS, IEDM shows that 1E-8 can be done – reconsider coloration. Transmit to Thermal Thin Films –Discussion with Interconnect – need to understand components and make sure lines are coordinated