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Metal-Oxide-Semiconductor Fields Effect Transistors (MOSFETs) From Prof. J. Hopwood

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Structure: n-channel MOSFET (NMOS) p n+ metal L W source S gate G drain D body B oxide I G =0 I D =I S ISIS

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Circuit Symbol (NMOS) G D S B (I B =0, should be reverse biased) I D = I S ISIS I G = 0

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V GS = 0 n + pn + structure I D = 0 p n+ metal L W source S gate G drain D body B oxide + - V D >V s

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0 < V GS < V t n + -depletion-n + structure I D = 0 p n+ metal L W source S gate G drain D body B oxide + - +++ V D >V s

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V GS > V t n + -n-n + structure I D > 0 p n+ metal L W source S gate G drain D body B oxide + - +++ - - - - - V D >V s

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Summary V t is the threshold voltage If V GS < V t, then there is insufficient positive charge on the gate to invert the p-type region –This is called “cut-off” If V GS > V t, then there is sufficient charge on the gate to attract electrons and invert the p-type region, creating an n-channel between the source and drain –The MOSFET is now “on” –2 modes of operation: triode and saturation

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Triode Region A voltage-controlled resistor @small V DS G p n+ metal SD B oxide + - +++ - - V GS1 >V t p n+ metal SD B oxide + - +++ - - - V GS2 >V GS1 p n+ metal SD B oxide + - +++ - - - - - - - - - V GS3 >V GS2 +++ IDID V DS 0.1 v increasing V GS Increasing V GS puts more charge in the channel, allowing more drain current to flow cut-off

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Saturation Region occurs at large V DS p n+ metal source S gate G drain D body B oxide + - +++ V D >>V s As the drain voltage increases, the difference in voltage between the drain and the gate becomes smaller. At some point, the difference is too small to maintain the channel near the drain pinch-off

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Saturation Region occurs at large V DS p n+ metal source S gate G drain D body B oxide + - +++ V D >>V s The saturation region is when the MOSFET experiences pinch-off. Pinch-off occurs when V G - V D is less than V t.

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Saturation Region occurs at large V DS p n+ metal source S gate G drain D body B oxide + - +++ V D >>V s V G - V D < V t … V GS - V DS < V t … V DS > V GS - V t

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Saturation Region once pinch-off occurs, there is no further increase in drain current IDID V DS 0.1 v increasing V GS triode saturation V DS >V GS -V t V DS

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Simplified MOSFET I-V Equations Cut-off: v GS < V t i D = i S = 0 Triode: v GS >V t and v DS < v GS -V t i D = k n ’ (W/L)[(v GS -V t )v DS - 1 / 2 v DS 2 ] Saturation: v GS >V t and v DS > v GS -V t i D = 1 / 2 k n ’(W/L)(v GS -V t ) 2 where k n ’ = (electron mobility)x(gate capacitance) = n ( ox /t ox ) … electron velocity = n E and V t depends on the doping concentration and gate material used

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Electrostatic Discharge (ESD) The gate oxide is very thin –t ox < 10 nm (10x10 -9 m) It is very easy for static electricity to destroy this very thin insulating layer Must practice precautions, such as wrist straps and static free work areas

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Parasitic Capacitance Notice that the entire gate structure looks exactly like a capacitor (metal-insulator-semiconductor) This parasitic capacitance at the gate allows current to flow at high frequencies! i G > 0 as frequency increases and, just like other semiconductor devices, the parasitic capacitance limits the speed of the device (turning the MOSFET “on” requires charging the gate capacitance). The R sig C gate time constant tells us the signal delay for digital circuits and the upper cut-off frequency for analog circuits.

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Conclusion For the remainder of the class, we will look at the behavior of semiconductor devices in much more detail Occasionally, you might get caught-up in the details! Please refer back to this overview to see how it all fits together.

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1 Chapter 5. Metal Oxide Silicon Field-Effect Transistors (MOSFETs)

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