1. ALD work status and next plan Nov-23-2010
Anil Mane, Qing Peng, Jeff Elam
ALD Research Program, Process Technology Research Group
Energy Systems Division.

2. ALD work current status:
Two 33mm MCPs to Prof. Ossy (10/22/10)
Working MCPs (4) to Matt and presented data and testing continue
Processed 3x 33mm AAO MCPs with active area of ~1.5cm2 20µm pores form Hau
Prior to ALD coating 2 MCP has cracked and chip off
These MCPs are very fragile and got random crack during handling but active area is good
Sent for electrode coating at Fermi lab
Demonstrated 8”x8” Grid spacer coating by ALD with appropriate resistance (3M)
Demonstrated first time 8”x8” MCP coating by ANL ALD group
Processed with ALD resistive chemistry (1 ,2) and SEE ( 1, 2)
MCP sent to Prof. Ossy for electrode deposition, gain test and many more test….
Note: these MCPs has cracked prior to deposition (during shipping from Incom to ANL)

3. ALD Plan-1:
Goal:
Mock tile we need following items to prepare: (Target date = Feb/11)
4x pairs of 33mm MCPs with same resistance (ALD chemistry -2)
2 pair will have MgO and other 2 pairs will have ALO SEE layer
3x  8”x8” grid spacers coating
Resistance of grid will be depend on the MCP resistance and current flowing through circuit
2x “George space” glass pate with 4x 33 mm holes
10x higher resistance than MCP for charge dissipation
Ship mock tile to Prof. Ossy for testing
2x pairs (4x  33mm MCPs) with same chemistry to Matt
RGeorge >>RMCP

4. Resistance calculations for one section:
The resistance calculation will based on MCP resistance
Layer
Thickness (mm)
number of items
R Item (MOhm)
R Layer (MOhm)
V(V)
I(μA)
grid 1
0.7 1
8.75
140 16
MCP 1
1.2 4 30
7.5
1200
grid 2
1.1
13.75
220
MCP 2
grid 3
2.5
31.25
500
Total
6.7
68.75
3260
Note: R George >=
750
MOhms

5. ALD Plan-2:
Goal:
To study simulation vs. experimental data comparison (Target date: Mid Dec/10)
3x 33mm MCPs to Matt gain test:
Half resistive-only, half 2 nm MgO
Half resistive-only, half 20 nm MgO
Half resistive-only, half 20 nm Al2O3
Coupons to Slade for SEE measurements:
Only resistive
2nm MgO on resistive
20 nm MgO on resistive
20 nm Al2O3 on resistive
Both gain and SEE data will supply to Zeke, Valentin for simulation
Resistive
Layer
Resistive
Layer + SEE
SEE layer
Resistive layer
Substrate
Resistive layer
Substrate

6. Near term requirements:
Good 33mm MCPs (Received 11/22/10)
Good 8”x8” MCPs
Good 8”x8” Grids
Good 8”x8” George Spacers
For better electrical data:
8”x8” MCP holder for electrode (design is given to Fermi lab)
8”x8” Grid holder for electrode (Al plate with grid impression grove)

7. 8”x8” Grid holder for electrode
Grove in Al plate as per 8”x8” Grid dimension
Push
rods/screws
To hold the MCP
8.5”x8.5”x10mm Al plate

8. 8”x8” Grid holder for electrode

9. 8”x8” Grid holder for electrode

10. 8”x8” Grid holder for electrode
Evaporation source