1. Metrology for Nanomanufacturing
Vladimir A. Ukraintsev
Texas Instruments, Inc.

2. Contributors: Christoph Wasshuber Bob Doering Mark Rodder
Allen Bowling
Dennis Buss
Hans Stork

3. Metrology means process control
After Jerry Schlesinger
Cp with ideal metrology (P/T=0)
Cp affected by metrology
NB: Metrology is essential for manufacturing!
TI/SiTD
NNI Instrumentation & Metrology

4. NNI Instrumentation & Metrology
Current Needs
IC with nm gates are in development
Gate CD control range~ 3-4 nm (300 mm wafer!)
Gate LER better than ~ 1 nm (1)
Gate dielectric thickness control range ~ 0.1 nm
Post STI CMP (pre-gate) topography ~ nm
Total Measurement Uncertainty (TMU) ~ Range × 0.2
2004 challenges:
High-resolution “in-die” 3D CD metrology with TMU < 1 nm (true bottom CD, line & trench profile, high frequency LER)
Physical & electrical metrology of complex material stacks (concentration, porosity, interfacial defects, stress, mobility)
TI/SiTD
NNI Instrumentation & Metrology

5. NNI Instrumentation & Metrology
Future Needs
Lack of robust & inexpensive manufacturing solution is often a show stopper for novel nanotechnology
Assumptions:
CMOS to be a primary IC technology for next years
Patterning by lithography with elements of self-assembly
Hybrid IC with elements of charge based nanodevices connected to the outside world through MOSFET
Metrology needs:
Non-destructive 3D tomography with atomic-resolution capable of CD metrology & elemental analysis
High-resolution physical & electrical characterization of interfaces (composition, atomic structure, defects, traps, energy structure, charge, stress, mobility, etc.)
TI/SiTD
NNI Instrumentation & Metrology

6. NNI Instrumentation & Metrology
Challenges:
Non-destructive “in-die” 3D microscopy with atomic resolution. Probe of atomic size is a challenge. Breakthrough is needed: novel SPM, X-ray scattering, e-holography, etc.
Non-destructive single atom detection, chemical & electrical state characterization. Ultra high signal-to-noise detection is a challenge. Breakthrough in spectroscopy is needed: EDS, EELS, NMR, RBS, etc.
TI/SiTD
NNI Instrumentation & Metrology