Monolithic Pixel R&D at LBNL M Battaglia UC Berkeley - LBNL Universite' Claude Bernard – IPN Lyon Monolithic Pixel Meeting CERN, November 25, 2008 An R&D.

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Monolithic Pixel R&D at LBNL M Battaglia UC Berkeley - LBNL Universite' Claude Bernard – IPN Lyon Monolithic Pixel Meeting CERN, November 25, 2008 An R&D effort of LBNL & University - INFN, Padova in collaboration with KEK & JPL-NASA

Technology/Application Matrix Thin CMOS SOI3D Technology R&D HEP/LC Imaging Spinoff Sensor Thinning In-pixel CDS Fast r/o Radiation Tolerance on-chip ADC Proof of principle Back-gating Radiation Tolerance Thinning and Backplane Processing Technology Characterisation Sensor Integration Prototype Thin Tracker ILC-compliant Sensor (20  m pixel, 25-50MHz column parallel r/o, 5-bit ADC, low power) Fast Nanoimaging in TEM Prototype Thin Tracker ILC/CLIC-compliant sensor (10  m digital pixel, >50MHz column parallel sparsified r/o, time stamping) Beam Monitoring Solar and Earth Observation Fast Nanoimaging in TEM

Prototype Monolithic Pixel Chips AMS 0.35  m-OPTO LDRD-1 (2005) 10, 20, 40  m 3T pixels LDRD-2 (2006) (+ LDRD-2RH(2007)) 20  m pixels,in-pixel CDS (+ RadHard pixels) OKI 0.15  m FD-SOI LDRD-SOI-1 (2007) 10  m pixels, analog & binary pixels OKI 0.20  m FD-SOI LDRD-SOI-2 (2008) 20  m pixels, in pixel CDS fast binary pixels LDRD-3 (2007) 20  m pixels, in-pixel CDS on-chip 5-bit ADCs LDRD-SOI-3 (2009) ~10  m pixels, 4x4 mm 2 imager w/ fast readout TEAM Imager (2009) 1k x 1k 9  m pixels, analog Thin CMOS SOI

Main R&D Objectives Demonstrator chip for ILC/CLIC Vertex Tracker Back-thinning of CMOS pixel sensors and application to ILC/CLIC tracking and vertexing Thin CMOS Imager for Dynamic Transmission Electron Microscopy Demonstration of SOI technology and development of Fast SOI Imager for low energy electrons and photons Monolithic Pixel R&D originated with ILC application, nowadays HEP R&D leveraged with on-site spin-off projects funded over 2-3 FYs:

Back-thinning of CMOS pixel sensors and application to LC tracking and vertexing NIM A579 (2007) NIM A593 (2008) FNAL MBTF T966 Data 120 GeV p on Cu target LBNL Thin CMOS Pixel Telescope Thinning of MIMOSA-5 diced chips Backthinning yield ~ 90 %: “50  m” =  m, “40  m” =  m; chips fully characterised before/after: Thin Pixel Prototype Telescope 4 layers of 50  m thin MIMOSA-5, 15 mm layer distance, tracking results at ALS 1.5 GeV e  beam and MBTF 120 GeV p beam Track Extrapolation Resolution vs. p t

Demonstrator chip for LC Vertex Tracker IEEE TNS 55 (2008) LDRD GeV e  beam Cluster S/N LDRD-2 chip with 20  m pixel, in-pixel charge storage for CDS, 25 MHz r/o tested on ALS and MBTF and irradiated at LBNL 88-inch cyclotron; Cluster S/N = for r/o from 1 MHz to 25 MHz; Chip performs well up to several hundreds kRads from 200 KeV electrons and n cm -2

Thin CMOS Imager for Electron Microscopy Epilayer 200 keV e  in LDRD2-RH Pixel Chip G4 Simulation LBNL program to develop large surface (1  4 cm 2 ), rad-hard CMOS imager with fast readout (up to 400 frames s -1 ) for deployment at TEAM microscope; Single e  sensitivity; < 10  m Point Spread Function; Radiation tolerant to > 1 MRad. Point Spread Function vs. e  Energy to appear on NIM A(2008)

Demonstration of SOI technology and development of fast SOI imager for low energy electrons and photons NIM A583 (2007) and to appear on NIM A (2009) First demonstrator with 3T analog and simple digital (10  m) Fast Analog Pixel and Digital Pixel with in-pixel CDS and current threshold Analog Pixel Resolution vs S/N Digital Pixel Hits 1.5 GeV e  Beam Analog Readout at 50 MHz, for 1.5 GeV e  Beam = 15 Digital pixel fully functional Collaborative R&D with JPL-NASA on thinning and backplane post-processing Cluster Pulse Height 1.5 GeV e  Beam

Planned Activities for FY Submission, characterisation and deployment of 1k x 1k TEAM imager, design of 2k x 2k final imager (LBNL); Beam telescope based on thinned 1k x 1k TEAM sensors and test at MBTF (LBNL+INFN Padova+Purde U(?)); Backside post-processing of thin SOI sensors for low energy radiation (LBNL+JPL-NASA); Characterisation of radiation tolerance of OKI-SOI process (LBNL+KEK+INFN Padova); Development of fast SOI imager and test at LOASIS and other facilities (LBNL+JPL-NASA+INFN Padova+IPNL); Submission and characterisation of ZyCube 3D process (LBNL+KEK)