G.Sirri – INFN Bologna videconf 2008-07-29 Fiducial Mark Finding with ESS 1/6 VersionDateBinarySourceConfigNote 712008-07-28zip same as 62 Recommended.

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G.Sirri – INFN Bologna videconf Fiducial Mark Finding with ESS 1/6 VersionDateBinarySourceConfigNote zip same as 62 Recommended - XY and Z references set independently: "Glass" reference is used even if "XYReference" doesn't exist zip same as 62 OLD Recommended - FlexMapX main dialog: load map string from text file - FlexMapX monitor dialog: save map string to text file - source code : mapping accuracy, MapBuilder applications zip same as 62 OLD Recommended - print the map string in the monitor window - option "edge:" substituted by "corners:" zip Development [see getting_started_57]: - new lateral mark finding strategy - source code: optionally compiling with VS.NET configuration parameters optimized for lateral marksgetting_started_ zip same as 53 Development [see getting_started_57]: - bug fixed in Log file write (with ScanServer) - new option "edge:..." for Edge Finding (only manual)getting_started_57 FlexMapX.dll What’s New [since ]:

G.Sirri – INFN Bologna videconf New Lateral Mark Finding Strategy (release>=62) 1. Scan along a perpendicular path (a) 2. Get other strip samples towards the emulsion center until candidates are found (b) Nominal edge 1° candidate found here Expected Mark Position X (a) The trajectory lays between the nominal edge and the expected mark position. The path length is “Scan Transverse Tol.” parameter. (b) The number of samples is “Max Strip candidates” parameter (1st included). The interdistance between segments is “Strip Sampling Distance” parameter Y strip case 3 4. Segments are fitted to a line. Same for the other strip. Mark position: intersection point between fitted lines. 2/ Get strip samples in the opposite direction if needed (b) No candidate found here.

Mark Finding Reproducibility  Test of mark finding reproducibility (pl57 brick 28911) Number of samples = 50 measures for each mark pattern Lateral X-ray finding parameters (MaxStripcandidates, StripSampleDist) and strategy optimized (10 different configuration x 50 measures)  Results Optical pattern ( micron) #1: = X_RMS = 0.6 = Y_RMS = 0.6 #2: = X_RMS = 0.3 = Y_RMS = 0.6 #3: = X_RMS = 0.3 = Y_RMS = 0.7 #4: = X_RMS = 0.3 = Y_RMS = 0.8 #5: = X_RMS = 0.3 = Y_RMS = 0.5 #6: = X_RMS = 0.3 = Y_RMS = 0.6 Frontal X-ray ( micron) #1: = X_RMS = 0.7 = Y_RMS = 0.6 #2: = X_RMS = 0.2 = Y_RMS = 0.7 #3: = X_RMS = 0.3 = Y_RMS = 1.0 #4: = X_RMS = 0.3 = Y_RMS = 1.0 Lateral X-ray ( micron) #1: = X_RMS = 0.6 = Y_RMS = 0.8 #2: = X_RMS = 1.1 = Y_RMS = 2.1 3/6

MapBuilder: assistant tool to create mark map The tools has been release few weeks ago. It cannot be considered bug-free. Please report about its behaviour. 4/6 available here: Procedure based on the document “NominalMarkProcedure2.pdf” sent by Cristiano NEW MAP INIT with a TEMPLATE MAP (ex. Approximate positions of LATERAL XRAY MAP) Only stage positions are used for computation. A NOT FOUND mark will be removed from the output BRICK SIZE INIT with CORNERS MAP (ex. Approximate positions of the CORNERS) Only stage positions are used for computation. A NOT FOUND corner will produce ERROR OLD MAP INIT with REFERENCE MAP (ex. FRONTAL XRAY MAP measured in CS1) OUTPUT MAP in the REFERENCE FRAMEWORK -> BRICK SIZE -> NOMINAL POSITION of the new map

G.Sirri – INFN Bologna videconf Conclusions about mark map finding  FlexMapX is working The “to do list” is not empty… (180° rotated sheet option, warning levels, focus at each lateral mark site, speed up of lateral mark finding,.. ) The mark finding reproducibility - for optical and frontal x-rays: < 1 micron - for lateral x-rays: has been reduced to 1-2 micron thank to the parameters and strategy optimization  MapBuilder has been released It is still at the debug level 2 cases of large shift between Lateral and Frontal xrays reported by Andread and Michele to be investigated (both predictions very far from the 2 available lateral marks) 5/6 Suggestion: 4 lateral marks obtained with a double exposition to disentangle: asymmetric pattern OR different exposition time for the 2 expositions

G.Sirri – INFN Bologna videconf Vacuum support for ESS  The “production list” of vacuum supports is being published in:  Model D.1: large channel mm x mm (for glued emulsions) 14 vacuum supports delivered to LNGS to be (re)distributed to labs few vacuum supports available in BOLOGNA  New design support (for glued emulsions) Glass windows has been enlarged in order to allow the whole PLASTIC support to be placed over the glass surface. First production foreseen for the end of September  Tests of surface traetment of glass in progress 6/6