11/8/99 SFR Workshop - Education 1 Small Feature Reproducibility A Focus on Semiconductor Technology Education UC-SMART Major Program Award D.B. Graves, T.J. King, and C.J. Spanos Second Annual Workshop 11/08/99

11/8/99 SFR Workshop - Education 2 Agenda 8:30 – 9:00 Introductions, Overview / Spanos 9:00 – 10:15 Lithography / Spanos, Neureuther, Bokor 10:15 – 10:45 Break 10:45 – 12:00 Sensor Integration / Poolla, Smith, Solgaard, Dunn 12:00 – 1:00 lunch, poster session begins 1:00 – 2:15 Plasma, TED / Graves, Lieberman, Cheung, Aydil, Haller 2:15 – 2:45 CMP / Dornfeld 2:45 – 3:30 Education / Graves, King, Spanos 3:30 – 3:45 Break 3:45 – 5:30 Steering Committee Meeting in room 775A / Lozes 5:30 – 7:30 Reception, Dinner / Heynes rm, Men’s Faculty Club

11/8/99 SFR Workshop - Education 3 Milestones Year 1  Conduct first Inter-campus seminar series and Industry workshop.  Modify UCB/EE143 for deployment in the fall of  Design Equipment Laboratory. Year 2  Conduct second Inter-campus seminar series and Industry workshop.  Implement Equipment Laboratory for deployment in Spring 2000.

11/8/99 SFR Workshop - Education 4 EE 143: Processing and Design of IC’s Name changed to “Microfabrication Technology” –course now covers MEMS as well as IC device technology Prerequisites changed to sophomore physics and electronics (Phys 7B & EE 40 or equivalent) –course is more accessible to students in ChE, ME, MSE, Physics, etc. New equipment to be purchased by Spring 2000 –will ease impact of increased enrollment (to 48 students per semester) Laboratory units on (1) oxidation and (2) lithography to be shared with the new SMART equipment lab

11/8/99 SFR Workshop - Education 5 EE 143 Enrollment History

11/8/99 SFR Workshop - Education 6 EE 143 Fall 1999 Enrollment Statistics (46 students total)

11/8/99 SFR Workshop - Education 7 Changes to EE 143 Implemented in Fall 1999 Additional graduate-student instructors hired –one extra laboratory section to accommodate 8 more students –new weekly discussion sections (2) to supplement lectures –design of new mask set Elimination of selected topics –bipolar junction transistor & DRAM devices and technology Addition of new topics –surface-micromachining technology –mechanical properties of thin films –MEMS device structures: operation and design, process integration Changes made in laboratory component –elimination of bipolar junction transistor characterization

11/8/99 SFR Workshop - Education 8 Improvements to existing test structures e.g. increase # of contact holes, increase overlay error tolerance –for improved device yield Addition of MEMS test structures: –actuators thermal bimorphs (using poly-Si resistive heaters) –sensors strain gauge (poly-Si piezoresistors) –fold-up structure (Campanile) Modifications to EE 143 Mask Set (to be completed in Fall 1999)

11/8/99 SFR Workshop - Education 9 Further Changes to EE 143 Lab (Spring 2000) Deployment of new mask set Addition of thin-film device characterization work Installation of new equipment –new wafer-probe station –spin-rinse-dryer –furniture

11/8/99 SFR Workshop - Education 10 New joint EECS/ChE/ME/MSME course at UCB available to B.S., M.S., and Ph.D. students. Important component in education/training plans. Focus on equipment and processes; existing labs focus on device fabrication (e.g. UCB/EE143). Emphasis on chemical and physical processes occurring within equipment, including transport, plasma and chemical kinetics, materials science. This project has been accelerated. SMART Lab Overview

11/8/99 SFR Workshop - Education 11 Smart Lab Outline

11/8/99 SFR Workshop - Education weeks lab; 5 weeks lectures/presentations Lectures taped, available for review Web component: equipment models, virtual equipment (e.g. vacuum systems), readings students/section; 4 sections/week Timing Lab debugged in fall 1999 First class spring 2000 SMART Lab Description

11/8/99 SFR Workshop - Education 13 Lab space renovation completed Vacuum systems apparatus constructed and operating Plasma etcher installed and working CMP equipment installed Electroplating experiment under consideration Web page development begun, equipment model obtained (G. Rubloff, U. Maryland), global plasma simulation development begun SMART Lab Development Status

11/8/99 SFR Workshop - Education 14 Lab Space Renovation (1 Gilman Hall)

11/8/99 SFR Workshop - Education 15 Vacuum Systems Experiment

11/8/99 SFR Workshop - Education 16 Plasma Systems Experiment (I)

11/8/99 SFR Workshop - Education 17 Vacuum/Plasma Systems Apparatus

11/8/99 SFR Workshop - Education 18 Plasma Systems Experiment (II) Plasma-Therm 500 Series

11/8/99 SFR Workshop - Education 19 Please Help! Two 300W, MHz RF power supplies with matching networks and PC-compatible outputs are needed for the SMART equipment lab. We can also use “educational props” (i.e. pictures videos, chip cutouts, demo wafers, etc.) See David Graves if you can arrange for a donation.

11/8/99 SFR Workshop - Education 20 Student-Company Interactions: Web Page Links Company human resources Student resumes (on web site already) Posting for job/intern opportunities

11/8/99 SFR Workshop - Education 21 Interactive Seminars

11/8/99 SFR Workshop - Education 22 Fall 99 On-line Seminars

11/8/99 SFR Workshop - Education 23 New Curricula in Semiconductor Manufacturing New EECS sample program in semiconductor manufacturing at UCB effective fall 1999 Chemical Engineering option in electronic materials processing at UCB will incorporate new SMART lab List of suggested courses (Chem Eng, EECS, IEOR, and MSE at UCB; EEC at UCD) relevant to semiconductor manufacturing posted on SMART web site

11/8/99 SFR Workshop - Education 24 Summary Major restructure of senior IC processing course. New semiconductor equipment laboratory course. Student training at BS, MS, and Ph.D. levels Possible ‘outreach’ programs: short courses/summer lab programs. New curricula in semiconductor manufacturing. On-line seminars and workshops.

11/8/99 SFR Workshop - Education Ideas Semiconductor Internships Deployment of Short Courses Distance learning on 143/123 Focus on other campus deployment: UCD, UCSB, UCLA