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Kurt J Lesker Kurt J Lesker… Is a global supplier and manufacturer of high & ultra high vacuum solutions Established in 1954 Kurt J Lesker Company

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(0) Kurt J Lesker Kurt J Lesker Company LTD European Headquarters Established in 1991 New facility 2008 Centre for European operations Sales support office Design office Test & Assembly Clean Room Extensive warehouse facilities

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Kurt J Lesker Vacuum Components

(0) Kurt J Lesker Manufacturing Vacuum Chamber Manufacturing Pittsburgh- USA Hastings – UK Capabilities Standard vacuum chambers Complete bespoke Solutions Quality Management 3D Inspection facilities ISO Certification

(0) Kurt J Lesker Materials Group Kurt J Lesker support a wide range of production groups Solar panel manufacture Semiconductor Electronic devices Optical coatings Automotive lighting R&D Complete custom solutions available Materials Backing plates Filaments

(0) Kurt J Lesker Process Equipment Division PVD Tools 21 Standard vacuum platforms Custom PVD Tools Bespoke design and process solutions Thin Film Deposition Expertise: Thermal E-Beam OLED sputtering Metal /Organic chemical vapour deposition Atomic layer deposition

(0) Kurt J Lesker Process Equipment Division Sputtering /OLED SourcesSputtering Linear Cathodes We develop & manufacture our own range of sputtering/ OLED sources In addition we are able to offer a wide selection of linear cathodes

Features System Designers…Manufacturers…Experts Manufacturing systems since 1974 Chamber manufacturers Extensive application knowledge USA & UK clean room assembly areas KJL designed and built Magnetron Torus  sputter guns KJL designed and built OLED sources 8 standard system platforms Custom solutions available Magnetron sputtering Thermal evaporation Atomic layer deposition E-beam evaporation Organic evaporation Kurt J Lesker Systems Deposition Techniques: NANO 36 PVD Series PVD 75 PVD 225 PVD 250 PVD 500 CMS Series CMS-18 CMS-24 LAB-18 SPECTROS Series Mini-SPECTROS SPETROS 100/150 Super-SPECTROS 150/200 LUMINOS OCTOS ALD Series AXXIS (0)

NANO36 Adaptable chamber options Compact integrated design High speed diffusion pump Single wide range gauge PLC control with touch screen interface Film thickness monitor with thermal sources Multi-technique options: Up to 3 metal thermal sources Torus  circular magnetron sputtering sources 1”-4” options Options: SS bell jar SS chamber Dry roughing pump 300l/s Turbo Substrate rotation Heating to either 150  C or 350  C (0)

NANO36 The Nano36 is the newest and most economical deposition system It showcases our ability to provide the versatility and reliability that the Kurt J. Lesker Company has become known for around the world The Nano36 is our most affordable deposition platform available designed with the entry to mid level user in mind The Nano36 will accommodate most evaporation processes as well as magnetron sputtering The Nano36 has a small footprint (0)

PLC control This affordable, full feature system offers reliable PLC control with a color touch screen interface Single button commands and manual operation are accessed from the touch screen This offers a simple and convenient user interface with the Nano36 Process control (0)

Chamber options The Nano36 has standard configurations to suit most users Chamber choices are either a simple 12”Diameter x 18” High glass bell jar or a 16” x 16” stainless steel box chamber The box chamber door opens wide for easy chamber access Maintenance of the chamber, source replenishment, and source change out can be performed in a matter of minutes Process Chamber 16” x 16” Box Chamber as shown. Also a 12” Diameter x 18” high glass bell jar available (0)

Vacuum Pumps The Nano 36 has 3 standard High Vacuum pumping options: 300L/S Turbo, 685 L/S Turbo, or a 700 L/S Diffusion Pump High Vacuum pump choices include 300 L/S Turbo, 685 L/S Turbo, or 700 L/S Diffusion Pump Dry Foreline/Roughing pumps available (as pictured) as well as oil sealed rotary vane pumps (0)

Platen Flat plate substrate fixture Substrate options include primary rotation and heating up to 350 C with dual quartz lamp heaters Dual Quartz Lamp Heaters Substrate Plate on central twist lock hub. Substrate can be held in a fixed position or rotated about the central shaft (0)

Platen Flat plate substrate fixture The Nano36 can accommodate up to an 8” diameter substrate mounting plate One single 8” wafer or multiple smaller wafers can be held in place The substrate plate can be easily removed or placed into the system with either a “lift up and out” hub mount or a twist-lock mounting Pin/Hub mounted platen can easily be lifted and removed with one hand (0)

Film thickness control Evaporation methods are controlled via a quartz crystal sensor in conjunction with a thin film controller The controller offers ease of use and reliability that is necessary to control the most demanding evaporation processes Twist-Lock platen with quartz crystal monitor head. Front Panel Film Thickness Controller Film Thickness (0)

Thermal Evaporation Source The Nan36 can be configured with three thermal evaporation sources on the base plate The evaporation sources are sufficiently isolated from each other by shields to prevent cross contamination The sources also are stood off of the base plate of the chamber and are mounted on water cooled posts to limit excess heating of the chamber Thermal sources can be filament, basket heaters, box heaters, boats (coated and uncoated), rods, and screens Easy access to the boats and the mounting posts makes these sources very user friendly The Kurt J. Lesker Company is a global supplier of a large range of deposition sources and deposition materials Evaporation Up to Three thermal evaporation sources can be accommodated. The thermal sources are well shielded from each other and the chamber by the use of shielding (0)

Sputtering Torus Sputtering Source The Nan36 can be configured with two thermal evaporation sources on the base plate Pneumatic shutters DC, RF or Pulsed DC Easy access for target change

Utilities Utilites The Nano36 has a small footprint and comes with heavy duty wheels and retractable mounting pads. This makes the system very easy to wheel into place, set up, and level Utilities are accessed from central point on the back of the system so utilities hook up is easy and straight forward This makes the Nano36 very portable. It is easy to move and set up anywhere Utilities located across the back panel of the systems frame (0)

Service and warranty Yearly service package One day Two days Three days Four days Five days Package includes: Service/preventative maintenance and/or Training Excludes: Parts, Travel and subsistence Warranty 12 months on all systems Options within warranty period: 1 year extended warranty 2 years extended warranty (0)

NANO 36 benefits Designed for: Universities Industrial and Government laboratories R&D applications Compact footprint design Multiple chamber options Easy to use Plug & Play Installation Quick Deliver Cost Effective Price A professional and attractive system that is self contained and ready to work, the Nano36 is manufactured with quality components supplied and stocked by the Kurt J. Lesker Company. We provide the quality, availability, and economy that our customers have come to expect from us (0)

PVD 75 D-shaped 304 stainless steel chamber Aluminium door with rectangular viewport Turbomolecular or cryogenic pumping Manual touch-screen Single, multiple or custom substrate fixtures Fully enclosed “zero” clean room footprint design Multi-technique options: up to 3 Torus  circular magnetron sputtering sources multi-pocket electron beam evaporation source multiple thermal evaporation sources Options: Recipe-controlled PC based process automation Glow discharge / RF Bias Features (0)

Framework Fully enclosed system cabinet Can be flush mounted in clean room wall Utilities: Single service drop (220VAC, 50Hz, single phase, 30 Amps-- based on configuration). Dedicated earth ground required E-beam power supply: 400V AC/ 3phase/ 50Hz/ 40amps Compressed air ¼” 80 psi Dry Nitrogen Vent Gas ¼” 10 psi Water: Typically 2 to 3 gpm, psi Process Gas ¼” 5 to 7 psi (if applicable) Leveling pads Options: 400VAC, 50/60Hz, 3 phase, 5-wire, 30 Amps power distribution (0)

Process Chamber D-shaped 304 SS chamber 14" x 24" D-shaped ISO-250 top-plate & base plate ports Aluminum Door with 5.25”x 3.25” viewing area ISO 100 & 160 gauging & pumping ports (0)

Sputtering Up to 3 Torus  Magnetron sources 1”- 4” diameter Axial, right angle, flex and custom mounts Integral flip or swing shutters RF, DC, pulsed DC power Mass flow controlled gas inlet Manual or automatic upstream pressure control Compression fittings to adjust source to substrate distance VHV compatible Options: High strength magnet upgrade for use when depositing magnetic materials Gas injection ring and deposition chimney (0)

E-Beam Electron Beam Evaporation Source KJLC 4 pocket (8cc) E-Beam gun 5kW solid state power supply with programmable sweep and automatic crucible indexing High voltage discharge hook Includes all electrical and water feedthroughs and shielding One pneumatically actuated source shutter 14” throw distance (0)

Evaporation Thermal Evaporation Source Module Up to 3 Thermal Source assembly with water cooled high current feedthroughs (for sequential deposition) 2 kW Power Supply Computer controlled 3-Position Source Selection Switch 1 pneumatically actuated shutter covers all sources Cross contamination shielding Options: Additional 2 kW power supply and transformer to allow co-deposition Upgrade to 4kW power supply and transformer in place of 2 kW (0)

Low temperature organic evaporation source KJLC 10cc LTE organic material evaporation source with integrated pneumatic flip shutter (Up to 6 sources may be configured in the system) KJLC LTE evaporation source power supply Options: LTE sources - 1cc - 30cc Organic (0)

Platen Substrate holder Non-rotating, top mounted substrate platen (12”) using KJLC multi-site substrate fixture Single or multiple substrates Options: Rotary drive (up to 20rpm) for platen, variable speed Pneumatically actuated flip style substrate shutter (compatible with substrates up to 8”) Pneumatically actuated swing style substrate shutter (compatible with substrates up to 4”) Custom configurations are available Substrate heating options: 150  C  C (quartz lamp) Up to 600  C (resistive element, compatible with only substrates up to 4”) (0)

Vacuum Pumps 260 l/s Pfeiffer turbomolecular pump standard Backing/roughing pump Rotary vane mechanical pump Options: 685 l/s Pfeiffer turbomolecular 1500 l/s CTI cryogenic pump Oil free Scroll Pump Base Pressure 5 x mbar or less with 260 l/s turbo 2 x mbar or less with 685 l/s turbo 5 x mbar or less with 1500 l/s cryo pump (0)

Pressure Gauges Wide range vacuum gauge reads from atmosphere to mbar (Ion gauge and Pirani) Pirani gauge in Cryo / foreline (when applicable) Readout is displayed on system control panel Options: Capacitance manometer for sputtering applications (0)

Pumping 260 l/s turbomolecular pump (standard) 5 x 10-6 in 18 minutes 5 x 10-7 Overnight Base Pressure 3 x 10-7 mbar 685 l/s turbomolecular pump (option) 5 x 10-6 in 16 minutes 2 x 10-7 in 35 minutes Base pressure 1 x 10-7 mbar 1500 l/s cryogenic pump (option) 5 x 10-6 in 4 minutes 5 x 10-7 in 10 minutes 5 x 10-8 in 65 minutes Base pressure 2 x 10-8 mbar Pump down times based on clean and dry properly conditioned chamber (0)

Process control Process PC based with optional Recipe-Control Touch screen controller Film thickness monitor/controller Automatic pump down and vent Integrated power distribution Mass flow controlled gas inlet Options: Heating Cooling Substrate bias Ion Source (0)

Computer control PC-based control system KJLC “C-Ware” Visual Basic based software (Windows XP) Screen layouts follow the guidelines of SEMI E Includes Graphical User Interface (When applicable): Vacuum Deposition Gas Motion Cooling Heating Options: Recipe driven computer control Creation and storage using Microsoft Access database Selection of “pre-written” recipe Edit, copy of existing recipes (0)

Service and warranty Yearly service package One day Two days Three days Four days Five days Package includes: Service/preventative maintenance and/or Training Excludes: Parts, Travel and subsistence Warranty 12 months on all systems Options within warranty period: 1 year extended warranty 2 years extended warranty (0)

PVD 75 benefits Designed for: Universities Industrial, Government laboratories R&D applications Small batch production “zero” clean room footprint design Plug & play installation Quick delivery Cost effective price: Thermal $65K - $120 Sputter $90K - $180K E-beam $150K - $220K Organic on request (0)

Kurt J Lesker Kurt J Lesker website and catalogue Over 14,000 standard products are found in our catalogue Our website offers “real time” information on all our products & services