The Etch and Deposition Company CORIAL The Etch and Deposition Company

CORIAL LOCATION Paris Geneva Lyon Grenoble CORIAL is located in Grenoble area, close to Lyon and Geneva, In the Heart of the French Silicon Valley, In the Middle of Strong Research Centers, Excellent Machining and Software Industry.

CORIAL NEW FACTORY

New compact products available : CORIAL COMPACT 200 Series New compact products available : Size = 75 cm wide X 108 cm deep ! The Corial 200 series are systems which can be equipped either with reactive ion etching reactors (RIE) or high density plasma reactors (ICP). All have a wide range of working conditions. They all allow highly uniform processes on large areas (200 mm diameter), The Corial D250 series are PECVD systems equipped with an isothermal pressurized plasma reactor for low stress and high quality film deposition together with high uniformity on large areas (200 mm diameter), The Corial 200 series and the Corial D250 series can be equipped with load-lock with vacuum robot for up to 200 mm wafers. The Corial 210D is a newly designed ICP-CVD tool for high quality film deposition at temperatures below 100°C. Corial 200I Corial D250 Corial 200S Corial 210IL Corial 210D Corial 200RL 4

New compact products available : CORIAL COMPACT 300 Series New compact products available : Size = 75 cm wide X 140 cm deep ! The Corial 300 series are systems which can be equipped either with reactive ion etching reactors (RIE) or high density plasma reactors (ICP). All have a wide range of working conditions. They allow highly uniform processes on large areas (320 mm diameter), The Corial D350 series are PECVD systems equipped with an isothermal pressurized plasma reactor for low stress and high quality film deposition together with high uniformity on large areas (300 mm diameter), The Corial 300 series and the Corial D350 series can be equipped with load-lock with vacuum robot for 21 (to 27) X 2” wafers, 7 X 4” wafers, 2 X 6” or 300 mm wafers. The Corial D500 is a newly designed PECVD tool for 104 X 2” wafers, 25 X 4” wafers or 9 X 6” wafers. Corial 300RL Corial 300IL Corial 300S Corial D350 Corial D500 Corial D350L 5

EXPORT NETWORK Contracts signed To be set up 6 UVM (N Europe) TBS (CIS) Evatec (UK) CORIAL ETT (Germany) CORIAL (Korea) To be set up Japan USA Turkey India AVBA (Israel) Süss China (China) MOS Technology (Taiwan) APS Ltd (South-East-Asia) Contracts signed 6

DRY ETCH SOLUTIONS FOR FAILURE ANALYSIS

SOLUTIONS FOR PASSIVE INTEGRATED OPTICS - Waveguides -

SOLUTIONS FOR ACTIVE INTEGRATED OPTICS - LEDs & OLEDs -

SOLUTIONS FOR MEMS & LEDs ICP - CVD PECVD

CONCLUSION The key points of CORIAL equipment are: The key points of CORIAL are: Accumulated > 200 years of expertise in plasma processes, Wide range of etching applications, including RIE and High Density Plasmas as Microwaves, DECR and ICP, Mastering low temperature PECVD processes (<100°C). The key points of CORIAL equipment are: Reactive Ion Etching, High Density Plasmas and Low damage etching achievable in the same process chamber, High reactor performance achieved by design of dedicated shuttles according to shape, size and material to etch, In situ plasma cleaning with no corrosion and no memory effect.