Solar Cells Fabrication: Surface Processing

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Presentation transcript:

Solar Cells Fabrication: Surface Processing Aleksei Grigorev Fys9310 23.05.2017

Source: http://www.pveducation.org Typical solar cell Source: http://www.pveducation.org

Source: http://www.pveducation.org Optical losses Source: http://www.pveducation.org

How to reduce the optical losses Minimize the coverage of the cell surface by top contacts Application of anti-reflection coatings The surface can be textured (texturing) Increase the thickness of SC Make the back surface reflective

Reflection of a silicon surface Reflection for silicon is over 30 % Silicon SC only operate in 400 to 1100 nm range typically Source: M. A. Green and Keevers, M. J., Progress in Photovoltaics: Research and Applications, vol. 3, pp. 189 - 192, 1995

Anti-Reflection Coatings (ARC) Source: http://www.pveducation.org

Source: http://www.cleanroom.byu.edu ARC thickness Source: http://www.cleanroom.byu.edu

Multi layer anti reflection coatings Double layer ARC (DLARC) OPAL2 https://www2.pvlighthouse.com.au/calculators/OPAL%202/OPAL%202.aspx

Types of ARC films Titanium Oxide (TiO2) Atmospheric pressure chemical vapor deposition Indium Tin Oxide (ITO) Transparent conducting oxide Silicon Oxide (SiO2) Thermal oxidation High temperature Passivates surface Silicon Nitride (SiNx:H) Plasma enhance chemical vapor deposition (PECVD) Low Temperature Passivates surface and bulk

Silicon nitride deposition SiH4 + N2O SiOxNy:H n = 1.46 – 1.9 SiH4 + NH3 / N2 SiNx:H n = 1.85 – 3.3 SiH4 a-Si:H n = 4.2 PECVD setup Source: https://www.oxford-instruments.com/

Surface texturing Random pyramid texturing Inverted pyramid texturing

Anisotropic texturing Etching Commonly used on the <100> crystallographic oriented c-Si wafers. Produces pyramids on the wafer surfaces on the <111> crystallographic direction, usually with an angle of 70.5º. Reduces the reflection from 35% to around 10% for the incident light with an angle of 35º. Alkaline solution etching. Typically, KOH or NaOH aqueous solutions with isopropyl alcohol (IPA) Also acidic texturing, performed with an aqueous solution based in a mix of nitric acid, hydrofluoric acid, water and some additives (as IPA). Porous silicon layer is formed Anisotropic texturing Source: E. Vazsonyi et al. /Solar Energy Materials & Solar Cells 57 (1999) 179Ð188

Other types of texturing Plasma texturing, Reactive Ion Etching (RIE) performed in chlorine or fluorine plasma can be used with a mask low production output Laser texturing laser grooving to create different patterns most accurate texturing high cost and slow

ARC and texturing can be combined

Nanowires and nanoparticles Source: Pritesh Hiralal, Chihtao Chien et al. The Royal Society of Chemistry 2014 Source: Z. Starowicz & M. Lipiński et al. Plasmonics (2013) 8:41–43

Nanowires MBE grown GaN NWs

Solar cells surface processing Texturing