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USP UPENN LSI Fabrication of Silicon Probes for Biosensors Dr. Marcelo Bariatto A. Fontes (Post-Doc) LSI / USP Dr. Rogério Furlan LSI / USP Dr. Jorge J.

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Presentation on theme: "USP UPENN LSI Fabrication of Silicon Probes for Biosensors Dr. Marcelo Bariatto A. Fontes (Post-Doc) LSI / USP Dr. Rogério Furlan LSI / USP Dr. Jorge J."— Presentation transcript:

1 USP UPENN LSI Fabrication of Silicon Probes for Biosensors Dr. Marcelo Bariatto A. Fontes (Post-Doc) LSI / USP Dr. Rogério Furlan LSI / USP Dr. Jorge J. Santiago-Avilés UPENN

2 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 2 MOTIVATION Biological applications –neural activities –intracellular recording –ionic distribution –electrical stimulation

3 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 3 MICROPROBE FABRICATION Glass micropipette Carbon Metal –Single electrode –Low reproducibility

4 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 4 SILICON MICROMACHINED PROBES Easy shape definition by computer-designed photomask Multidetection and spatial distribution High reproducibility IC compatible (smart sensors) Batch fabrication and Low cost

5 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 5 MICROMACHINING TECHNIQUES Boron etch stop Plasma etching Deep boron diffusion – high temperature and time Lateral diffusion – “large”dimensions Strong crystal orientation dependence Low temperature process Better shape definition and thickness control – without lateral diffusion Quick process Low silicon crystalline orientation dependence

6 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 6 PROBE DESIGN Needle shape general purpose electrochemical system Multipoint and multispecies detection 2 to10 gold µelectrodes –90 to 340 µm tip Ag/AgCl reference Platinum auxiliary

7 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 7 FABRICATION STEPS Boron etch stop Plasma etching mask 1  probe shape mask 2  lines / contacts mask 3  windows mask 1 mask 2 mask 3 mask 1

8 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 8 FABRICATION RESULTS - SEM and AFM High reproducibility Roughness :12.5 nm (rms) –16 %  area

9 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 9 FABRICATION RESULTS - Si PROBES Etch stop Plasma etching SIMS analyses [B]=1.25 10 20 at./cm 3

10 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 10 FABRICATION RESULTS - COMPLETE SEQUENCE Uncompensated mechanical stress –coverage and lines damaged

11 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 11 FABRICATION RESULTS - FINAL DEVICE

12 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 12 CONCLUSION High reproducible micromachined multidetection silicon probe (80%) Several probe designs were explored by varying the number of the detection electrodes Plasma etching technique presented better characteristics of shape definition and processing time than “etch stop” Boron etch stop  2.4x10 19 at./cm 3 (SIMS)

13 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 13 CONCLUSION - cont. Plain silicon probes of 15 µm were obtained Uncompensated mechanical stress between SiO 2 and Si 3 N 4 –Bent structures  decrease the processing yield –Increase of probe thickness by plasma etching  45 µm Compatibility with silicon microelectronic technology –New materials for interconnection and coverage (Poly-Si / Polymers)

14 INTEGRATED MICROSYSTEMS GROUP - DMI - LSI - USP http://www.lsi.usp.br/~bariatto/ SBmicro 2000 - Manaus - Amazonas 14 ACKNOWLEDGMENTS CNPq FAPESP CNPq/PADCT/CDCT Center for Sensor Technology at UPENN

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