1. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Layout of essential elements of the EUV energy monitor. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

2. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Comparison of calibration results for the double-MLM assembly obtained at PTB (solid curve) and at IPM RAS (points). Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

3. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Tin-ion distribution over the degree of ionization in the vacuum-arc plasma. The oscillogram of the collector current of the Faraday cup in the absence of the microwave heating of the plasma. The time since the actuation of the time-of-flight analyzer gate is given on the horizontal axis. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

4. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Tin-ion distribution over the degree of ionization in the vacuum-arc plasma. The oscillogram of the collector current of the Faraday cup in the presence of the microwave heating of the plasma. The time since the actuation of the time-of-flight analyzer gate is given on the horizontal axis. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

5. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Typical waveforms. The upper curve is the EUV detector signal, 5 mV/div, lower curve is the vacuum arc current, 50 A/div. Time of plasma heating by microwave radiation indicated by the arrows. Time scale: 100 μs/div. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

6. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Schematic view of the proposed source of EUV light. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

7. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Optical scheme of the instrument. The aperture width (perpendicular to the drawing plane) is 6 mm, the sensitive area of the diode is 10×10 mm2. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

8. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Experimental setup 3-D-scheme: (a) plasma generator; (b) window for microwaves; (c) coils; (d) EUV detector; (e) flange for plasma analysis or EUV detector. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

9. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Radiation power calculations in the range of 13.5 nm±1% into a solid angle of 4π sr for the predetermined Te and Iarc. Resulting points calculated for fixed Iarc and different Te are connected by lines. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123

10. Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. MEVVA-type plasma generator scheme: 1. cathode; 2. hollow anode; 3. triggering electrode; 4. insulator. Figure Legend: From: Source for extreme ultraviolet lithography based on plasma sustained by millimeter- wave gyrotron radiation J. Micro/Nanolith. MEMS MOEMS. 2012;11(2):021123-1-021123-7. doi:10.1117/1.JMM.11.2.021123