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NeSSI Micro-analytics Workshop May 4 th 2003 CPAC Micro-Analytics Workshop Overview of Micro-analytical Technologies and Hurdles to Development and Commercialization.

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Presentation on theme: "NeSSI Micro-analytics Workshop May 4 th 2003 CPAC Micro-Analytics Workshop Overview of Micro-analytical Technologies and Hurdles to Development and Commercialization."— Presentation transcript:

1 NeSSI Micro-analytics Workshop May 4 th 2003 CPAC Micro-Analytics Workshop Overview of Micro-analytical Technologies and Hurdles to Development and Commercialization

2 NeSSI Micro-analytics Workshop May 4 th 2003 H2scan Company Summary Company Introduction Hydrogen Sensing Technologies Competitive Technology’s Comparison Chart Tomorrow’s Hydrogen Market

3 NeSSI Micro-analytics Workshop May 4 th 2003 Company Introduction Based in Valencia (Los Angeles) California Restart from DCH Sensor Division Asset Purchase completed on Sept. 19 th 2002 Three product lines in Retail production

4 NeSSI Micro-analytics Workshop May 4 th 2003 H 2 Sensing Technologies H2scan Technology Today’s Tomorrow’s Competitive Technologies Comparison Chart

5 NeSSI Micro-analytics Workshop May 4 th 2003 Exclusive license 96-C00333 from Sandia National Labs for patents # 5,279,795 (May 7,1996) Patent on two sensing technologies, a low concentration H-FET and a high concentration Chem-Resistor, giving a total concentration range from 50 ppm to 99.9%. Use of catalytic material Pd-Ni provides large range, minimal calibrations and hydrogen specificity. H2scan Technology

6 NeSSI Micro-analytics Workshop May 4 th 2003 H2scan Technology Pd readily catalyzes H 2 (molecular) into 2 H (atomic). The atomic hydrogen moves into the lattice of the Pd (alloy) film. An equilibrium hydrogen density is reached proportional to gas concentration.

7 NeSSI Micro-analytics Workshop May 4 th 2003 Hydrogen absorbed into the Pd alloy lattice changes the bulk resistivity. H2scan’s Hydrogen- Sensing Resistor (HRES) uses this property to measure Hydrogen from 0.5% to multiple atmospheres. i V H2scan Technology

8 NeSSI Micro-analytics Workshop May 4 th 2003 Hydrogen absorbed into the Pd alloy lattice changes the charge density at a dielectric interface. H2scan’s Hydrogen-Sensing Field-Effect Transistor (HFET) uses this property to measure Hydrogen from 50 ppm to 1%. + + H2scan Technology

9 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Featured Product Hand-Held Hydrogen Detector State-of-art Portable Hydrogen Leak Detection Micro-processor design provides exceptional versatility Technical excellence

10 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Featured Product Portable Leak Detector Kit All-in-one packaging

11 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Featured Product 0% to 100% hydrogen 1 atmosphere to 450 psig Gas temperature from 0 to 110  C Hydrogen Process Monitoring System with Application Flexibility

12 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Featured Product Hydrogen Process Monitoring System (Shown in Class1, Division1 Enclosure) System monitors hydrogen used as a cooling gas in electric generator Monitors 100% hydrogen @ 2 Atmospheres

13 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Multi-Sensor System MAIN PANEL REMOTE PANEL

14 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Future Product Modular Fixed Area Monitor Leak detection Process monitoring Process control Temperature and pressure- compensated hydrogen readings Low cost sensor heads can be multiplexed

15 NeSSI Micro-analytics Workshop May 4 th 2003 Next-Generation H2scan Sensor Wide Range Sensor (WRS) Hydrogen specific 50 ppm to 100% capability Potential to meet cost targets associated with the Hydrogen Fueled Economy 1 st Deliveries scheduled for QIII 2004

16 NeSSI Micro-analytics Workshop May 4 th 2003 H2SCAN Future Product Low-cost sensor designed to meet the needs of the fuel cell and automotive industries Safety applications 50 ppm threshold Process monitoring and control To 100% hydrogen sensing Pressure and temperature compensated hydrogen readings Low power MEMS technology

17 NeSSI Micro-analytics Workshop May 4 th 2003 Wide Range Sensor Rendering via 0.15" 0.12"

18 NeSSI Micro-analytics Workshop May 4 th 2003 Mitsubishi Teledyne Analytical Instruments

19 NeSSI Micro-analytics Workshop May 4 th 2003 Current Distributors Teledyne Instruments (World wide non Exclusive) Mitsubishi (Distribution Agreement in process) Trans Pac sales (Asian Market) Toyoda Micro Systems (Asian Markets)

20 NeSSI Micro-analytics Workshop May 4 th 2003 H2scan contact Information Address: 25133 Anza Dr Valencia CA 91355 Main Switchboard: (661) 775 9575 Sales: Ext 387 Engineering Ext 618 Website: www.h2scan.comwww.h2scan.com


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