1. F. Formenti - RD51 collaboration meeting February 20th-22nd, 20121 Brief CMS and Atlas upgrade plans Status and follow up for: Newflex Eltos Techtra Recent contacts with: Tech Etch, CEA Saclay Feedback from Saclay on Cirea and recent CERN-Cirea contact Micromegas license status Messages to retain and conclusions Outline

2. CMS Muon upgrade (the numbers) Concerns Muon endcap Stations 1 and 2 (3 and 4 for later) GEM proposed as competitive technology to withstand the high rate requirement for eta>1.6 StationNbr of modules Module area (containing rectangle) Total Nbr of modules (w/o spares) Total GEM foil area (3ple GEMs) Manufacturing plan 118x2x2=72~0.43m 2 (440x990)720.43x72x3=93m 2 Yrs 2014+2015 236x2=72 (long) 36x2=72 (short) ~2.4m 2 (1251x1911) ~1.6m 2 (1251x1281) 144(2.4+1.6)x72x3=864m 2 Yrs 2015+1016 2F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012 About 1000m 2 of GEM foils in total 216 triple GEM detectors

3. F. Formenti - RD51 collaboration meeting February 20th-22nd, 20123 Installation during LS2 (2017-2018) Manufacturing plan (GEM foils + assembly + tests and calibration) (2014-2016) TP has been submitted for review on February 10 th TDR by end of year 2012 for approval spring 2013 ? => Industrialization and setup of production sites in 2012-2013 Industrialization and setup of production sites in 2012-2013 <= CMS Muon upgrade (backward dates) (Data estimated from TP)

4. Atlas nSW upgrade project (the numbers) Concerns small wheel Muon Stations Micromegas proposed as competitive technology w.r.t. MDT+TGC/RPC and CSC Sector Nbr sectors Nbr chambers/sector MM layers/chambers MM layer area (containing rectangle) Total Nbr MM layers (w/o spares) Total MM PCB areaManufacturing plan Small 8x2=16 4 4x2=8 From ~0.68m 2 (696x980) To ~1m 2 (1420x730) 5120.88x512=450m 2 Yrs 2015+2016 Large8x2=16 4 4x2=8 From ~0.96m 2 (1036X930) To ~1.9m 2 (2300x835) 5121.5x512=768m 2 Yrs 2015+2016 4 F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012 About 1200m 2 of resistive bulk 1024 MM layers

5. F. Formenti - RD51 collaboration meeting February 20th-22nd, 20125 Atlas nSW upgrade project (backward dates) Installation in Atlas during LS2 (2018) Commissioning nSW on surface (2017-2018) Manufacturing plan (2015-2016) Pre production first complete sector 0, i.e. 32 MM layers (2014) nSW MoU and TDR during 2013 ? Construction of large size MM prototypes and validation in 2012/2013 => Industrialization and setup of production sites in 2012/2013 Industrialization and setup of production sites in 2012/2013 <= (Data from nSW meeting Oct 2011)

6. 6F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012 NewFlex status Third visit on September 5 th, 2011 Feedback on first single mask 6x6 foil produced => good micro-via quality, tested at CERN OK => licensing Launch production of 20 foil samples 10x10 => received at CERN on December 20 th => visual inspection OK, cleaning done at CERN Company located nearby Seoul (South Korea) Specialized in flex circuits, huge production capability (report presentation at RD51 miniweek 21-24 November)

7. F. Formenti - RD51 collaboration meeting February 20th-22nd, 20127 Preliminary results from 10x10 GEM tests by Archana’s team (Please follow dedicated presentation at WG1 for more details) Tests on 10x10 foils started at CERN beginning February 2012 HV test passed Gain calibration checked for 2 foils -> performance practically as for CERN GEM Gain stability test during 1 hour shows ~5% shift -> test is still on-going Congratulations to Newflex for the excellent samples!!

8. 8F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012 NewFlex follow up Prof. Sung Park visited us on February 2 nd Meeting organized to discuss next steps on technology transfer Main identified actions: (NB: the contribution of CMS for the detector qualification is essential) ItemsMain action on Proposed time Implications 1) Feedback to Newflex on 10x10 sample quality checkArchana’s team-> wk9Give OK to prototype 30x30 2) One student of Sung at CERN w/Archana’s teamSung, ArchanaASAP Learn QA check procedure, take one GEM detector to Seoul, copy test facility locally 3) GEM license signed by NewflexSung, Hartmut-> wk9Allow next technology transfer steps 4) Instruct Newflex on how performing GEM foil QA check Rui, Fabio, Michal, Sung -> wk9 Document GEM cleaning process, document HV test and transfer knowledge 5) Prototype a 30x30 NS2 w/QA check, if 10x10 are OK Rui, Archana’s team (test), Sung wk10 -> Preparation of the 30x30 NS2 production files 6) Series production of 10x10 w/QA check EM workshop, Sung t.b.a.Price definition vs. different volumes 7) Prototype 500x1000Archana, Rui, Sung 30x30 OK ->Support at Newflex’ premises, tooling (t.b.c.)

9. F. Formenti - RD51 collaboration meeting February 20th-22nd, 20129 Eltos status Company located in Arezzo (Italy) Full fine pitch rigid process technology in house and surface finishing with large board capability (report presentation at RD51 miniweek 21-24 November) First time knowledge transfer for non-resistive MMs performed on November 7 th -8 th 2011 Two 10x10 MMs “bulked” with local supervision of Rui (PCB and mesh stretching done by them, in-house cleaning) Resistive process was presented to Eltos for next sample tries

10. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201210 Preliminary results from 10x10 MM tests by Joerg’s team CERN Eltos Very recent results 1 st detector is sparking a lot -> reason is not identified yet (improve cleaning?) 2 nd detector has higher spark rate than the CERN S3 reference (see next slide), but is usable Gain calibration performance very similar to CERN S3 non-resistive reference MM single point test, uniformity to be done 55 Fe charge spectra of Eltos’ MM is as good as the CERN reference

11. Preliminary results from 10x10 MM tests by Joerg’s team Note: Max gain for 55 Fe is 10000 (≈510V) Max gain for cosmics is 50000 (≈560V) Beyond these, chambers spark constantly and HV cannot be maintained Good start for Eltos, let’s go on with resistive bulk !! F. Formenti - RD51 collaboration meeting February 20th-22nd, 201211 (1000 sec ≈ 16 min)

12. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201212 Eltos follow up Two days training at CERN were planned for February 9 th and 10 th, but delayed last minute because of exceptionally bad weather conditions in Italy Next slot for training at CERN to be confirmed for wk 13 Next short steps : (NB: guide from Atlas for the large size optimal roadmap is welcome) (NB: the contribution of Atlas for the detector qualification is essential) ItemsMain action onProposed timeImplications 1) Test result of 10x10 std MMs first prototypesJoerg’s teamASAPGive feedback to Eltos 2) Resistive layer training at CERNRuiwk13Needed step for 99% of applications 3) Fabrication resistive 10x10 MMs Rui, Joerg’s team (test) wk13 -> Eltos stand alone fabrication to validate knowledge transfer 4) Larger (ex. 500x1000) size resistive MM prototypeJoerg, Rui Qualified Res. MM 10X10 -> Support at Eltos’ premises, tooling (t.b.c) 5) Instruct Eltos to QA procedure for series Rui, Fabio, Michal Aim at qualified product to be used at CERN w/minimal EM workshop interventions 6) Process improvement for industrializationEltos, Rui, FabioTune MM technology to industrial mass production tools

13. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201213 Techtra status Wroclaw Technology Park is intended for: - Promoting assessment of companies (new and existing) in the high tech field - Renting offices, laboratories and equipments (start a business at lowest costs) - Providing conference and training space, IT infrastructure (develop a knowledge network) and general commercial, legal, administrative services for market development support - Example of labs: mechanics, PCB assembly, GEM, cryogenics, vacuum, biology, … - Easy liaisons with local universities Techtra was the first company applying for GEM license Is already producing GEMs w/double mask process Max possible size 30x30 (mostly produced 10x10 or similar) Own product: GEM-view standard scanner for x-ray imaging Few units/yr sold Company hosted at Wroclaw Technology Park (Poland) Visited (by Rui and Fabio) on January 23 rd -24 th, 2012 Goals:explore industrial support scope present the single mask process (Rui) Meeting with Mr. Maciej Chorowski (Polish ILO) and Mr. Piotr Bielowka (Techtra CEO)

14. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201214 Techtra next steps Techtra could offer support for: cost attractive small/medium series and fast GEM prototype turn around Main identified needs: - get experienced with single mask process - improve machines for sizeable production flow and larger width - get confirmation of investment funds from public contribution - train and secure competences (stable minimal manpower) Company’s challenge is to develop means allowing preserving active resources: - GEM only field -> sell foils or detectors to RD51 collaboration? - Industrial applications -> join ventures w/industrial partners (e.g. Eldos)? - Link w/universities -> stage program for students? - Enlarge work abilities -> complete flex manufacturing line (via plating)? - … Today the current action is with Techtra There is quite some hard work to organize, but the mission may not be totally impossible if coordinated on time Laminator Polyamide etching Copper etching Visual inspection Exposure

15. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201215 3) The tests on the single mask process seems to work well (although not yet perfect). They are quite optimistic about technological issues. 4) The financial support for machine investment is almost fixed Techtra last minute news update Report on last decisions taken at Techtra’s (from Mr. Bielowka message): 1)Move Techtra production line into a completely new location The old rooms are to small for machine upgrade, and it is not possible to make them large enough. 2) They have reserved the space in a different building (that belongs to WTP) Mr. Bielowka would like to calculate the necessary space after consultation with Rui, and after selection of all machines

16. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201216 Tech Etch, CEA Saclay Tech Etch Rui refreshed contacts with Tech Etch (Mr. David Crary) in January 2012 - Tech Etch declared interest to upgrade to GEM single mask process - They required instructions to go ahead (issue for Hartmut: license status ?) - For large sizes they say have to check some machine compatibility (imaging and poly. etching) - Rui asked quotation for large size (1.2mx0.5m) GEM foil production ranges: 100-1000-10000 Waiting for feedback … to be continued CEA Saclay CERN workshop aims at investigating for common activities with CEA Saclay - There is very valuable knowledge on MM technology - Can we avoid duplications ? Can we identify common strategies ? - Recent past actions: Alain Delbart was invited to contribute to the visit to Eltos On December 7 th, 2011 Fabio flashed a visit to S. Aune’s MM lab (stretching and “bulking”) A meeting with Alain is being organized (coordination w/Maksym) for future collaborations

17. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201217 Cirea Mr. Michel Billant E-Mailed to Rui and Fabio for a meeting at CERN on March 12th - to advertise their competence range in the domain and their industrial infrastructure - to show their progress on the bulk process variants and some remaining technical problems - to discuss how getting “qualified” on the basic standard bulk process A presentation of CIREA to a future WG6 should be organized News from Saclay (A. Delbart) CERN-Cirea recent contacts Goal for Cirea:learn and control full process, including mesh stretching in house 1 st activity (TF10PCB – small MM) One sample cannot sustain HV Second sample has uneven mesh and HV is limited to 600V (in air) If possible, second sample will be tested with gas in a defect free area 2 nd activity (PLV-3 PCB – 610cmx455cm bulk) 3 samples will be shipped to Saclay soon for inspection A meeting in CIREA will be organized to improve the bulk procedure

18. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201218 Micromegas license status Micromegas intellectual property defined by 4 patents: Need to define an agreement to enable both CEA and CERN to release licenses to industrial partners Framework agreement has been drafted: Sylviane Zaninotti (CEA) will send a copy to Hartmut Hillemanns (CERN) this week to crosscheck Basic principle is as for GEMs: free license for academic use, minimal royalties for commercial Self action for them: plan to come to a final document within 1Q12 It would be nice finalizing this administration detail to start a good industrialization approach

19. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201219 Messages to retain Atlas and CMS have quite similar global needs in terms of detector area and practically overlapping in time schedule Additionally, there are many others “smaller” MPGD projects that have not been purposely mentioned (typically a few 10’s needing support in a timescale of 3-4 months) RD51 has been successful to create opportunities for projects and many of them can be performed in the CERN EM workshop because still quite manageable in volume and time schedule To face large productions we need additional trained industrial partners and there are only 1 or 2 years in front of us

20. F. Formenti - RD51 collaboration meeting February 20th-22nd, 201220 Conclusions The industrialization program for GEMs and MMs has began with Newflex and Eltos Other companies are showing interest to our field (thanks RD51!) Contribution of Atlas and CMS is important to help driving the next steps and essential to qualify test samples Industry needs to be kept “busy” and we have to be aware that this is possible only if we all can invest in adequate manpower dedicated to this program EM workshop is missing manpower to progress in the technology transfer task, if we intend to stay behind to the Atlas and CMS schedules (1 process engineer function is most vital)