1. CERN PCB workshop activities
Rui de Oliveira on behalf of PCB workshop team
29/11/2012

2. outline Activity Technologies Resistors MPGD history
RD51 collaboration participation
Developments
Trainings
Gallery
29/11/2012

3. Activities 1.7 Mchf/year turnover + 10% in 2013 6 Mchf equipment
20 persons
Building :1000 sqr meters
Making PCBs since 1960
-PCB
-Rigid
-Flex
-Flex-rigid
-Microvias
-fine line (10um)
-large size (up to 2m)
-Thick film Hybrids
-Thin film Hybrids
-Chemical milling
-Cu, Fe, Al, Au, Ag, W, Mb, Ti, Cr, Ni
-MPGD
-GEM/thinGEM/THGEM/RETHGEM -MSHP/Cobra
-MICROMEGA/ Bulk/ Micro-BULK -RES BULK
-Resistive MSGC
-R&D on new structures
-Low mass circuits
-Multilayer flexes with aluminum strips
-embedded heat sinks (carbon, graphite,metals, diamon)
-Embedded components
-passive
-Active
1.7 Mchf/year turnover + 10% in 2013
6 Mchf equipment
Crete june Rui De Oliveira

4. Technologies In house Close collaboration with industry for: In study
All processes related to Photolithography technics
Chemical and electrochemical plating
CNC dilling and milling for small pattern
Chemical etching of metals and dielectrics
Vacuum + high pressure gluing
Screen printing (metal , dielectrics and resistors)
Clean rooms ( class 100 , 1000 and 10000)
Close collaboration with industry for:
Vacuum deposition ( Metal resistors dielectrics)
Laser drilling and milling
Plasma etching (RIE)
Large PCBs mass production
Large screen printing mass production
In study
New generation Ink jet printers (metal resistors dielectrics)
29/11/2012

5. Resistors -A Resistor is define by: -Value Ohms -Precision %
-TCR ppm/Deg C
-max power W or W/m2
-breakdown voltage V
-Resistivity in Ohm*m
-Sheet resistance or surface resistivity in Ohm/sqr
-TCR: Temperature coefficient of the resistor
-Cermet: is a composite material composed of ceramic (cer) and metallic (met) materials.
13/04/2011
Rui De Oliveira

6. Resistors for static dissipative application available at CERN
Screen printed polymers
Filled cavity polymers
Screen printed RuO resistors
DLC vacuum deposited resistors
Resistive Kapton
All of them can be paterned
29/11/2012

7. Resistors why carbon? @ 300 K in (Ω·m) Silver 16·10-9 (Ω·m)
Ruthenium (Ω·m)
Germanium 460·10-9 (Ω·m)
Ni/Cr ·10-9 (Ω·m)
Carbone ·10-9 (Ω·m)
13/04/2011
Rui De Oliveira

8. MPGD history ‘96: GEM 50 x 50mm with a gain of 10.
‘97: GEM 100 x 100mm with gain of 1000.
‘98: GEM 400 x 400mm; 1D and 2D readouts; micro-groove and micro-well detectors.
‘00: 3D GEM readout; 1D readout for Micromegas in COMPASS.
‘01: PIXEL GEM readout; 2D Micromegas readout.
‘03: PIXEL Micromegas readout.
‘04: Bulk Micromegas detector 100mm x 100mm. Micro BULK detectors
‘06: Half cylindrical GEM detector.
’08: first large GEM 1.2m x 0.4m. First spherical GEM
‘09: first large BULK Micromegas 1.5m x 0.5m
‘11: First resistive Bulk Micromegas 100mm x 100mm
‘12: First 30cm x 30cm NS2 GEM detector
‘12: First 1m2 Resistive Micromegas
‘12: First 2m2 Resistive Micromegas
‘12: First NS2 GEM detector 1.2m x 0.5m
‘12: Full cylindrical GEM detector
‘14: GEM 2m x 0.5m ?? Micromegas 3.4m x 2.2m ??

9. Participation in RD51 WG1 :R&D on new structures, we have introduce:
Bulk Micromega ( with Saclay collaboration)
Resistive protections (with Atlas Collaboration)
Large GEM (with CERN GDD/CMS/INFN Frascati/TUM Munich …)
GEM embedded stretching system NS2
WG6 :Industrialisation, our contribution:
Companies visits (more than 10)
TT transfer with selected companies
Institutes trainings
29/11/2012

10. Passed developments Large size GEM Blind GEM / Micro well
Chemical micro-vias
Bulk Micromegas
Resistive protections in Micromegas detectors
Capacitive couplings to reduce electronic channel count
Piggy Back Micromegas
Micro BULK Micromegas
PG and TPG thermal management devices
Full Aluminium circuits
Embedded active devices in flex
29/11/2012

11. Trainings and TT GEM production training and TT:
Techtra 2 weeks at CERN + full technology transfer
Xiaomei Li (CIAE Beijing) 1 week at CERN
Tech-etch full technology transfer
Mecaronics full technology transfer
Close to 10 licenced companies
Micromegas production training and TT:
CEA Saclay (BULK and resistive protection) many
CEA Saclay : BULK facility Saclay
CIREA and ELTOS (BULK and resistive) 2 CERN + 2 ELTOS + full TT
INFN Frascati (Large Micromegas detector) 2
THGEM production
VECC KolKata (polyurethane protection) 1
Weissmann institute Israel (test and Cleaning) 2
29/11/2012
Crete june Rui De Oliveira

12. GEM Single mask examples
GEM 1.1m x 500mm
CMS GEM detector GE1/1
KLOE – Cylindrical 3 GEM Detector
GEM 800mm x 500mm
Read-out 2D : 800mmx 500mm
03/10/12
Rui De Oliveira

13. CMS GE1/1 NS2 detector
03/10/12
Rui De Oliveira

14. Bulk Micromegas examples
BULK Technology
DUPONT PC 1025 coverlay
BOPP Meshes
SERITEC stretching
Largest size produced:
2m x 1m
ILC DHCAL
T2K
03/10/12
Rui De Oliveira
Crete june Rui De Oliveira

15. ATLAS NSW
detector opened
detector closed

16. Thank you
29/11/2012

17. Thin film
13/04/2011
Rui De Oliveira

18. Thin film
WEB SITE:
13/04/2011
Rui De Oliveira

19. Thick film Some supplier can build 100 Mohms/sqr pastes 13/04/2011
Rui De Oliveira

20. Polymer resistive pastes
1 Mohms/Sqr seems to be the limit for these polymers
13/04/2011
Rui De Oliveira

21. Polymer Resistive foils
13/04/2011
Rui De Oliveira

22. Other products
13/04/2011
Rui De Oliveira