1. 1 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 ITRS 2005 - Environmental, Safety and Health Chapter ITRS Conference, San Francisco, California July 13, 2005 Jim Jewett, Intel

2. 2 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 ITRS Conference ESH Chapter Participants ESIA – Hans-Peter Bipp (Infineon) JSIA – Takayuki Oogoshi (NEC) – Tetsu Tomine (Epson) SIA – Jim Jewett (Intel) – Walter Worth (Sematech)

3. 3 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Agenda Difficult Challenges ESH Technology Engagement Model Key ESH Focus Supplemental ESH Tools

4. 4 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 ESH Difficult Challenges (2005 Proposed) Chemical and Materials Management Process and Equipment Management Facilities Energy and Water Optimization Sustainability and Product Stewardship

5. 5 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Chemical and Materials Management –New chemical assessment –Chemical data collection –Chemical exposure management

6. 6 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Process and Equipment Management –Chemical reduction –Environment management –Water and energy conservation –Consumables optimization –By-products management –Chemical exposure management –Equipment ergonomics –Design for maintenance

7. 7 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Facilities Energy and Water Optimization –Conservation [energy and water] –Heat removal –Global warming emissions reduction

8. 8 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Sustainability and Product Stewardship –End-of-life disposal/reclaim –Product content/material declaration –Design for ESH –Process chemistries –Device power requirements –Supply chain issues

9. Optimum Time to effect changes in ESH technology ESH/Fab Technology Engagement Model YEARS to High Volume Manufacturing Ability to Effect ESH Improvements 6420 Manufacturing RampSupplier R&DExternal Research Process Development Commercialization PhasesDemonstrationRamp to HVM Research Source: Intel Equipment/Chemica l set defined and characterized Minimal flexibility to develop alternative material ESH solutions - - Tools Universities and Government Labs

10. Technology Development/ESH Intersect Model YEARS to High Volume Manufacturing Ability to Effect ESH Improvements 6420 Manufacturing Ramp Winnow Options Bgn Mat/Supl Selct Mat/Supl Selct Ramp to HVM Proof of Concept Material Development Source: Intel Optimum lead-time to anticipate impacts & identify ESH improvement needs Where we operate today Supplier R&DExternal Research Process Development

11. 11 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Key ESH Focus 1.Lithography PFOS alternatives development Energy requirements Immersion Lithography (Types of fluids and additives) 2.Factory Integration Impact of 450 mm tools POU abatement Concentration of pollutants due to water conservation 3.Interconnect CMP consumables reduction New deposition process materials 4.Front End Processing Process Complexity Increase in aqueous cleaning/stripping requirements New and novel materials

12. 12 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Key ESH Focus (Cont’d) 5.Emerging Research Materials Nanotechnology ESH research needs 6.Yield Water conservation may impact yield 7.Assembly & Packaging Product content PFC use

13. 13 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005 Supplemental Files  Two overriding issues regarding chemicals and materials: Selection Utilization  Reference Files Chemical Restrictions Materials of Concern Codes, Standards and Permits

14. Issues & Characterizatio n Show StopperHigh Restriction PotentialMedium Restriction Potential List of Chemicals or Raw Materials Subject to Actual or Potential Manufacture or Use Restrictions Asbestos Materials Certain glycol ethers Polychlorinated biphenyls Fully halogenated chlorofluorocarbons (CFCs) Carbon tetrachloride 1,1,1 trichloroethane Halons 1211, 1301, 2402 Hydrobromofluorocarbons (HBFCs) HCFC 141b Polybrominated biphenyls (PBBs) and their ethers/oxides (PBDEs) Cadmium compounds Lead compounds Mercury compounds Hexavalent Chromium compounds Polychlorinated Biphenyls (PCB)/ Terphenyls (PCT) Polychlorinated Naphthalene (PCN) Short Chain Chlorinated Paraffins (C10-13, Cl >50%) Tributyl tin (TBT) and, Triphenyl tin (TPT) compounds Certain Azo Colorants Hydrochlorofluorocarbons (HCFCs) Perfluorooctyl sulfonates (PFOS) Cadmium compounds Lead compounds Mercury compounds Hexavalent Chromium compounds Perfluorocompounds (PFCs) - SF6 - C4F10 - C2F6 - C5F12 - CF4 - C6F14 - NF3 - C4F8 - CHF3 - C3F8 Hydrofluorocarbons (HFCs) Perfluorooctanoic acid (PFOA) and its salts Certain phthalates Phenols Perfluoroalkyl sulfonates (PFAS) Ethylene Oxide Ethylene Chloride Items are listed in red if the restriction potential applies only if the material is contained in the final product, whereas process use of the material may be acceptable if it is not contained in the final product. Items listed in blue are those which have restrictions if the material is simply used in the process, but a different level of restriction if included in the final product. Items listed in black have the same restriction level regardless of whether its included in the final product. The tool is meant to focus only on the potential for legal limitations on the use of a substance, and is not meant to substitute for the broader risk assessment or for the more thorough EHS review performed as part of chemical use approval. Potential Chemical Restrictions Table DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005