Lithography and Electrodeposition

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Presentation transcript:

Lithography and Electrodeposition bnl ibm UMass manchester 2015 Nano Education Institute at UMass Amherst

How do we control the shape and size of nanostructures? Self Assembly (inspired by nature) Lithography (designed by humans)

Nanostructure height (thickness) depth width Using conventional methods, controlling the thickness (deposition) at the nanoscale is much easier than controlling the width or depth (lithography)

Computer Microprocessor Does the "thinking" "Heart of the computer" Does the "thinking" Uses transistors to create "logic" (computational units)

“Moore's Law”

Making Small Smaller Computer Microprocessors macroscale microscale nanoscale ibm.com The very small features on a computer's microprocessor and memory (RAM) are patterned with photolithography

Lithography (controlling lateral dimensions, by using stencils, masks, & templates)

Nanoscience Rocks! Nanoscience Rocks Lithography Nanoscience Rocks! Nanoscience Rocks (Using a stencil or mask)

Lithography: Basic concepts Some possible desired features narrow trench narrow line modified substrate Photolithography Electron-Beam Lithography X-ray Lithography Focused Ion-Beam Lithography Block Copolymer Lithography Nano Imprint Lithography Dip Pen Lithography Interference Lithography Contact Lithography EUV Lithography

Positive and Negative Resists Positive Resist Negative Resist resist resist expose expose scission cross-linking develop develop deposit & liftoff exposed region results in presence of structure exposed region results in absence of structure (generally poorer resolution)

Resolution Limit of Photolithography How low can you go? minimum linewidth minimum pitch There are actually many contributing factors that limit the minimum linewidth: optical diffraction () purity of light source resist sensitivity depth of focus numerical aperture of lens Using smaller wavelength enables smaller features Visible light > UV > DUV > EUV > X-rays

Electron-Beam Lithography Polymer film Silicon crystal Nanoscopic Mask ! Down to 10 nm

Nanosphere Lithography itrc.org.tw opticalproteomics.org

Diblock Copolymer Lithography (Uses self assembly) Deposition Template Etching Mask Nanoporous Membrane (physical or electrochemical) Remove polymer block within cylinders (expose and develop) Down to 3 nm

Diblock Copolymer Lithography UMass-Seagate U. Wisconsin

Density Multiplication using Diblock Copolymers (MIT) I. Bita, J.K.W. Yang, Y.S. Jung, C.A. Ross, E.L. Thomas, and K.K. Berggren Science 321, 939 (2008). Also Hitachi/UW work: R. Ruiz, H. Kang, F.A. Detcheverry, E. Dobisz, D.S. Kercher, T.R. Albrecht, J.J. de Pablo, and P.F. Nealey Science 321, 936 (2008)

Next.... ....Electrodeposition... ....another convenient way to make nanofilms

Nanofilm by Electrodeposition ("electroplating") I V cathode anode CuSO4 dissolved in water Working Electrode (WE) Counter (CE) Cu(0) –> Cu2+ + 2e- "oxidation" If using an inert Pt electrode: 2 H2O –> O2 + 4H+ + 4e- "reduction" Cu2+ + 2e- –> Cu(0)

Electrodeposition into a Nanoscale Lithographic Template nanoporous template Pulse reverse electrodeposition results in improved microcrystalline structure and improved magnetic properties (larger perpendicula magnetocrystalline anisotropy) nanowires in a diblock copolymer template nanowires in a polycarbonate filter

Electrochemical Deposition CHM video module at: http://www.umassk12.net/nanodev/NanoEd/Electrochemical_Deposition/index.html