STUDY OF TRANSPARENT FERROELECTRIC THIN FILMS BY OPTICAL REFLECTOMETRY AND ELLIPSOMETRY I. Aulika Institute of Solid State Physics, University of Latvia,

Slides:



Advertisements
Similar presentations
Eyk Bösche et al. BBC2 Workshop, Oktober 2004: Eyk Bösche et al. BBC2 Workshop, Oktober 2004: Simulation of skylight polarization with the DAK model and.
Advertisements

Vapor-deposited thin films with negative real refractive index in the visible regime J. J. Yi, A. Lakhatakia, W. Y. Ching, T.L. Chin Optics Express Vol.
Optical Modeling of a-Si:H Thin Film Solar Cells with Rough Interfaces Speaker : Hsiao-Wei Liu 08/18/2010 Wed.
Spectroscopic Ellipsometry University of Texas at El Paso Lynn Santiago Dr. Elizabeth Gardner Chem 5369.
Angstrom Advanced Inc.. – 1056 Washington St., Canton, MA Tel. : Fax : Who we are: Angstrom.
1 Extreme Ultraviolet Polarimetry Utilizing Laser-Generated High- Order Harmonics N. Brimhall, M. Turner, N. Herrick, D. Allred, R. S. Turley, M. Ware,
Silicon Oxidation ECE/ChE 4752: Microelectronics Processing Laboratory Gary S. May January 15, 2004.
Deal-Grove Model Predictions Once B and B/A are determined, we can predict the thickness of the oxide versus time Once B and B/A are determined, we can.
Ferroelectric Ceramics
Photonic Ceramics EBB 443-Technical Ceramics Dr. Sabar D. Hutagalung School of Materials and Mineral Resources Engineering Universiti Sains Malaysia.
PHY 1371Dr. Jie Zou1 Chapter 37 Interference of Light Waves (Cont.)
Study of optical properties of aerogel
NIH 3T3 fibroblasts stained for Filamentous-actin Phalloidin Alexa Fluor 488 nm A. G. Sostarecz, P.A. Janmey, data not published.
Model-free extraction of refractive index from measured optical data
1 Optical Properties of Materials … reflection … refraction (Snell’s law) … index of refraction Index of refraction Absorption.
SiO2 thickness measurements Using the NanoSpec Model 200 Automatic Film Thickness tool.
An Introductory Information about Optical Tweezers Mustafa Yorulmaz Koç University, Material Science and Engineering.
Silver / Polystyrene Coated Hollow Glass Waveguides for the Transmission of Visible and Infrared Radiation Carlos M. Bledt a and James A. Harrington a.
Some Applications of Ferroelectric Ceramics 1.Capacitors 2. Ferroelectric Thin Films 2.1 Ferroelectric Memories 2.2 Electro-Optic Applications Thin.
A Stable Zn-indiffused LiNbO 3 Mode Converter at μm Wavelength STUT Hsuan-Hsien Lee 2, Ruey-Ching Twu 1, Hao-Yang Hong 1, and Chin-Yau Yang 1 1.
Models The first major model is that of Deal and Grove (1965) The first major model is that of Deal and Grove (1965) This lead to the linear/parabolic.
KIT – University of the State of Baden-Wuerttemberg and National Research Center of the Helmholtz Association Institut für Experimentelle Kernphysik
October 30th, 2007High Average Power Laser Program Workshop 1 Long lifetime optical coatings for 248 nm: development and testing Presented by: Tom Lehecka.
Optical Constants of Uranium Nitride Thin Films in the EUV (7-15 nm) Marie K. Urry EUV Thin Film Group Brigham Young University.
Optical and structural properties of RF- sputtered Si x C 1-x thin films International Conference on Nano-Materials and Renewable Energies International.
Udo_ME2006.ppt, © Udo v. Toussaint, 11. July Bayesian Analysis of Ellipsometry Measurements Udo v. Toussaint and Thomas Schwarz-Selinger Ellipsometry.
1 Investigation of Optical Properties n, k … index of refraction and damping  1,  2 … polarization and absorption Problems: The penetration depth of.
Electrical and optical properties of organic materials are closely related to its molecular orientation. SE is employed in the understanding of molecular.
指導教授:林克默 學 生:陳立偉 Introduction Recently,the interest in up-conversion emission has been increased due to the needs for all-solid compact.
Chapter 16 Pretest Interference and Diffraction. 1. When monochromatic light is reflected from a thin transparent film, A) constructive interference occurs.
Divergent Illumination Optical Testing Device M. Fried 1, Z. Horváth 2, G. Juhász 1, O. Polgár 1, T. Mosoni 1, P. Petrik 1 1 Research Institute for Technical.
Surface Plasmon Resonance
1 Use of gratings in neutron instrumentation F. Ott, A. Menelle, P. Humbert and C. Fermon Laboratoire Léon Brillouin CEA/CNRS Saclay.
Nano-Scale Characterization: M. Pinar Mengüç RADIATIVE TRANSFER LABORATORY Mechanical Engineering Department UNIVERSITY OF KENTUCKY College of Engineering.
NANO 225 Intro to Nano/Microfabrication
Observation of Pore Scale Liquid Behavior with NIR-Microscopy and Advanced Laser Techniques Markus Tuller and Dani Or Dept. of Plants, Soils and Biometeorology,
Electro-Ceramics Lab. Electrical Properties of SrBi 2 Ta 2 O 9 Thin Films Prepared by r.f. magnetron sputtering Electro-ceramics laboratory Department.
Integrated Target Reflectivity Analysis
Tunable Passive Devices Keith Tang Supervisor: Sorin Voinigescu.
Real-time Ellipsometry on Cesium-Telluride Photocathode Formation
Ellipsometer B 許恭銓. Problem Overview We have a thin layer of oxide on a Si substrate and we want to find its thickness by using an ellipsometer.
By Abdullah Framalawi Aly Abouhaswa Polarized Neutron Spectrometry : Studying nanostructure magnetism with the use of polarized neutron reflectometry.
The coating thermal noise R&D for the 3rd generation: a multitechnique investigation E. Cesarini 1,2), M.Prato 3), M. Lorenzini 2) 1)Università di Urbino.
Optical thin films for high temperature gas sensing in advanced power plant applications Plasmon resonance of TiO 2 / Au at extreme temperatures Presented.
Speaker: Hao-Wen Chuang ( 莊浩彣 ) Advisor: Assistant Prof. Chung-Hao Tien Assistant Prof. Yi-Pai Huang Display Institute, National Chiao Tung University,
Thermal Strain Effects in Germanium Thin Films on Silicon Travis Willett-Gies Nalin Fernando Stefan Zollner.
EPFL October 7 th Introduction to ellipsometry J.Ph.PIEL (PhD) Application Lab Manager SOPRALAB.
Thin Film Optics Physics of thin film optics
UV/VIS SPECTROSCOPY.
Ekaterina N. Lazareva1,2 and Valery V. Tuchin1,2,3
Multiple Beam Interference
Measuring Birefringence of Anisotropic Crystals
Mihai Oane1 , Rareş Victor Medianu1, Ovidiu Păcală2
Amir Reza Sadrolhosseini Dr. A.S.M. Noor, Professor Dr. M. A. Mahdi
Luminescent Periodic Microstructures for Medical Applications
Institute of Electronics, Bulgarian Academy of Sciences,
Laser Physics & Nonlinear Optics
Date of download: 11/9/2017 Copyright © ASME. All rights reserved.
BAHIRDAR UNIVERSTY COLLEGE OF SCIENCE DEPARTMENT :MATERIAL SCIENCE AND ENGINNERING PRESENTETON ON: ELLIPSOMETRY INSTRUMENT PREPEARED BY :ZELALEM GETU AMSALE.
Reproducibility Analysis of E-beam Deposited Multilayer Dielectric Reflective Filter Nancy Sharmaa , P Sunitaa, b, VSRS Praveen Kumara,b , Gaurav Dwivedia,
Characterisation of the back-etched stack
Characterizing Multilayer Thin films
UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY
Hybrid plasmonic multichannel spectroscopic sensor platform
FIB, Ellipsometry, Interferometry...
Film thickness determination
FIB, Ellipsometry, Interferometry...
Determination of the Dielectric Function of Nickel Ferrite Thin Films
Thin Film Optics Physics of thin film optics
Ellipsometry with Mueller Matrix for Transparent Substrate
Presentation transcript:

STUDY OF TRANSPARENT FERROELECTRIC THIN FILMS BY OPTICAL REFLECTOMETRY AND ELLIPSOMETRY I. Aulika Institute of Solid State Physics, University of Latvia, Riga, Latvia

Ferrolectric thin films are used: high dielectric constant capacitors non-volatile memories infrared sensors electro-optic devices Optical properties for ferroelectric thin films have been relatively rarely studied. Are investigated: Dielectric and optical properties for ferroelectric bulk materials Dielectric properties for ferroelectric thin films

Reflective coefficient R Main ellipsometric angles ,  Reflactive n and absorbtion k coefficients, thickness

Light in the visible spectrum region Computer with CCD spectrometer Sample Optical fibre input Illustrative sham for reflectometry measurements

Ellipsometer sham /4 lamina /4 lamina Polarizer Compensator Sample Analyser Detector He-Ne laser 632.8nm 0000 0000

Reflective index: R p = M 21p / M 11p R s = M 21s / M 11s Idea of the matrix method M ij s,p = I 01 s,p L 1 I 12 s,p L 2 I 23 …I ij s,p L j I j+1 Last layer 1 st layer Boundary interface 2 nd layer Ellipsometric formula: tg  e  = R p / R s Multilayer model Mean square error   =  (f exp -f teor ) 2

BaTiO 3 BT derivation tech.: laser ablation 1) BaTiO 3 BT derivation tech.: laser ablation 1) Pb(Ti 0,48 Zr 0,52 )O 3 PZT sol-gel 2), laser ablation Pb(Ti 0,48 Zr 0,52 )O 3 PZT sol-gel 2), laser ablation Pb(Mg 0.66 Ni 0.34 )O 3 PMN rf sputtering 3) Pb(Mg 0.66 Ni 0.34 )O 3 PMN rf sputtering 3) 1) In collaboration with Solid state and material research institute in Dresden, IFM-Dresden, Germany 2) In collaboration with Yosef Stefan Institute in Slovenia 3) In collaboration with University of Sarland, Germany Samples SiO 2 Au PZT Pt Ti Si

Results Refraction n and absorption k coefficients for BT thin film (thickness 340  7nm as calculated from reflectometric data; sol-gel technique).

The refractive index n and extinction coefficient k of PZT deposited by laser ablation (thickness 250nm) and so-gel (thickness 300nm ) technique.

Refraction n and absorption k coefficients for PMN thin film (thickness 770  10nm, as calculated from reflectometric data laser ablation technique).

Temperature dependence of refractive n and absorption k indexes of PZT film (thickness 300nm) at wavelength 632,8nm. Temperature slowly raised at average rate 4°C/minute.

Conclusions Ellipsometric and reflectometric measurements has been successfully applied for the thickness, refractive and absorption coefficient determination of BT, PZT, PMN thin films. Optical properties and thickness are well described by multilayer model. Slight variation of refractive index by factor 1.02 and absorption coefficient by factor of 1.04 has been observed in comparison of sol-gel and laser ablation deposited samples, respectively. Observed temperature dependence of the refractive index and the absorption coefficient in the temperature range above 400°C is described by diffuse ferroelectric/paraelectric phase transition

Ackowledgement The author is thankful V.Zauls 1), K.Kundzins 2) for valuable discussions. This work was supported by K.Morberg scholarship of Latvian University. 1, 2) Institute of Solid State Physics, University of Latvia

Thank you for attention !