Roll-to-Roll Fabrication Technology for Organic Semiconductors Jae Young Choi Nov. 13, 2007.

Slides:



Advertisements
Similar presentations
Quarterly Flexible, Printed Electronics Workshop October 22, 2009 Hosted by SEMI.
Advertisements

LCD TFT LED-OLED CCD CMOS DISPLAY SYSTEMS AND PHOTOSENSORS (PART 3)
Geometrically Optimized mPAD Device for Cell Adhesion Professor Horacio Espinosa – ME 381 Final Project Richard Besen Albert Leung Feng Yu Yan Zhao Fall.
Anodic Aluminum Oxide.
Adhesive bonding Ville Liimatainen Contents Introduction – Adhesive bonding – Process overview – Main features Polymer adhesives Adhesive.
Loctite PSX-D and PSX-P Thermal Interface Materials
Inert Atmosphere Systems in OLED Research and Fabrication Copyright, 1996 © Dale Carnegie & Associates, Inc.
Carbon nanotube field effect transistors (CNT-FETs) have displayed exceptional electrical properties superior to the traditional MOSFET. Most of these.
CH. 3 Solar Cell Basic III: Principle Organic Materials for Electronics and Photonics II.
INTEGRATED CIRCUITS Dr. Esam Yosry Lec. #6.
1 FASwitch Technologies Company and Technology Overview F lexible A rray S witches C hanging H ow Y ou S ee the W orld.
Nesibe Lakhani EECS 277A Prof. Richard Nelson
The Future of Organic Electronics Jaya Movva Ben Spearin Jon Anderson Joshua Wrazen.
Nanoimprint II. NIL Technology sells stamps for nanoimprint lithography (NIL) and provides imprint services. Stamps made in Siliocn, Quartz, and Nickel.
Atmospheric Pressure Atomic layer deposition (AP – ALD)
Reliability Analysis of Flexible Electronics: Case Study of Hydrogenated Amorphous Silicon (a-Si:H) TFT Scan Driver Tsung-Ching (Jim) Huang Tim Cheng Feb.
EE235 Class Presentation on Nanoimprint Lithography (Spring 2007) Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography.
Part 2.  Fabrication of organic thin film transistors  Non-volatile memory devices based on organic transistors  Development of novel conjugated polymers.
Technologies for Realizing Carbon Nano-Tube (CNT) Vias Clarissa Cyrilla Prawoto 26 November 2014.
MEMs Fabrication Alek Mintz 22 April 2015 Abstract
Workshop for NFF Nanoimprint System NFF MA6 Nanoimprint Upgrade.
MEMS Fabrication and Applications Brought to you by: Jack Link & Aaron Schiller Date delivered on: Friday the third of May, 2013 ABSTRACT: Taking a brief.
Surface micromachining
O RGANIC L IGHT E MITTING D IODES Andrew Sanders, Fawzi Salama, John P. Handrigan 12/02/2010.
Organic Electronics Yousof Mortazavi VLSI Course Presentation December 2004.
Organic Semiconductor and its applications
Fabrication of Active Matrix (STEM) Detectors
1 Fall, 2013 Instructor: J.-W. John Cheng Mech. Engr. Dept., Nat ’ l Chung Cheng Univ. Interfacial Physics and Thin-Film Processing Ch 1 Intro. to Flexible.
Large Area Processing Research Programme National Science Foundation Manufacturing Energy Workshop 24 – 25 March 2009.
POLYMER LED Presented By UMAKANTA MOHAPATRO ROLL # EI
Organic Electronics Presented By: Mehrdad Najibi Class Presentation for Advanced VLSI Course.
IPod analyses Paul, Ethan, Niels. Casing: Plastic cover Dual injection molding ▫White cover ▫Transparant layer on top of this Advantages ▫Lower part cost.
Temperature Sensitive Micro-electro-mechanical Systems Amy Kumpel Richard Lathrop John Slanina Haruna Tada Tufts University TAMPL REU 1999.
1 POLY JET PROCESS - An effective RP Technique for Sheet Metal Works.
Microcontact Printing
Lithography. MAIN TYPES OF LITHOGRAPHY: * Photolithography * Electron beam lithography –X-ray lithography –Focused ion beam lithography –Neutral atomic.
 Sol-gel grating coupler fabrication by solvent assisted micromoulding (SAMIM).  Comparison of grating couplers fabricated by SAMIM with those fabricated.
Lithography in the Top Down Method New Concepts Lithography In the Top-Down Process New Concepts Learning Objectives –To identify issues in current photolithography.
Department of Chemistry , SungKyunKwan University
LITHOGRAPHY IN THE TOP-DOWN PROCESS - BASICS
 Refers to techniques for fabrication of 3D structures on the micrometer scale  Most methods use silicon as substrate material  Some of process involved.
Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering Adviser : Shang-Chou Chang Co-Adviser : Tien-Chai.
Section 2: Lithography Jaeger Chapter 2 EE143 – Ali Javey.
Bump Bonding Development
I. Introduction  Carbon nanotubes (CNTs), composed of carbon and graphite sheets, are tubular shaped with the appearance of hexagonal mesh with carbon.
Chieh Chang EE 235 – Presentation IMarch 20, 2007 Nanoimprint Lithography for Hybrid Plastic Electronics Michael C. McAlpine, Robin S. Friedman, and Charles.
Introduction to Thin Film CIGS Solar Cells
Liquid Flame Spray Deposition on Temperature Sensitive Substrates Antti Toropainen
Dave Yao Vice President of Worldwide Sales
«Recent Progress on Solution Based Transparent Conducting Electrodes» Dr. Fevzihan BAŞARIR 31/03/2016 Sofia.
Electronic devices which are  Optically transparent  See-through  Invisibly light in weight  Transparent in visible portion of the Electromagnetic.
1 Device Fabrication And Diffusion Overview 5 and 8 February 2016 Silicon Wafer Production-Refer to Chapter “0” Prologue Raw material ― Polysilicon nuggets.
Spatial ALD Ismo Heikkinen
Antenna Project in Cameron clean room Wafer preparation, conductor deposition, photolithography.
SENSITIVE SKIN. OUTLINE INTRODUCTION SKIN MATERIALS DEVICES SIGNAL PROCESSING ADVANTAGES DISADVANTAGES APPLICATION CONCLUSION.
Integrated Circuits.
Prof. Jang-Ung Park (박장웅)
Lithography.
Light Emitting Polymers L E P
UV-Curved Nano Imprint Lithography
Organic Light Emitting Diodes (OLED) July 2011
Light Emitting Polymers
BY SURAJ MENON S7,EEE,61.
MEMS, Fabrication Cody Laudenbach.
SILICON MICROMACHINING
LITHOGRAPHY Lithography is the process of imprinting a geometric pattern from a mask onto a thin layer of material called a resist which is a radiation.
Sustainable and Efficient Light Patches for Future Illumination
Epitaxial Deposition
Fig. 5 High-speed printing and process performance metrics.
Design and fabrication of a wafer-scale organic printed photonic chip
Presentation transcript:

Roll-to-Roll Fabrication Technology for Organic Semiconductors Jae Young Choi Nov. 13, 2007

Cost Saving, Simple Fabrication Process Produces Flexible Semiconductor Devices ! Roll-to-Roll Process Motivation - Low-temperature deposition - Mechanically Flexible - Light weight and shock proof - Chemical Sensitivity - Solution Processing Organic Semiconductors Non-Flexible Device Expensive Manufacturing Process Complex Fabrication Process Silicon Based Semiconductors Why?

Background OTFT (Organic TFT)

Overview Roll-to-Roll Processing Example: e-paper manufacturing

Technology I Substrate Materials GlassPlastic (PEN, PI)Stainless Steel Optical Properties (Transparency) Surface Smoothness Thermal Expansion (Maximum Process Temperature) Stiffness ( Durability, Flexibility, Young’s Modulus) Properties to be Considered

Technology II Novel Patterning Techniques (1) Soft Lithography - Mask and substrate contact may result in defects - Mask damage & stamping material life time Issues

Technology II Embosser Mold & Embossed Microcups Novel Patterning Techniques (2) E-paper by SiPix

Technology II Novel Patterning Techniques (3) Laser Ablation Recent Technology - Resolution: 120 pt/in - Droplet size: picoliters - Speed: 200 mm/sec Suffer form Drop Displacement Accuracy -Faster than RIE -Produces Cleaner lines than Thermal and Mechanical Drilling Inkjet Printing

Technology III Packaging: Barrier Layer Low work function metals oxide very easily  Moisture & Oxygen Free Environment Needed Requirement Water transmission rate = less than g m ‐ 2 /day Oxygen transmission rates = less than 10 ‐ 5 mL m ‐ 2 /day Barix Coating Technique Using continuous, roll-to-roll vacuum processing Directly Coating on the Top  Eliminating the glued-on metal ca n or the extra sheet of glass  Much thinner, lighter, more reliable display with low cost

Conclusion: Now & Future Organic LED (OLED) Organic Solar Cell Organic TFT Organic Sensors APPLICATIONS $5M $339M 83.5 % Per year Flexible Display Market Growth Cost Saving 2. Simple Fabrication Process 3. Flexible Semiconductor Devices Roll-to-Roll Process Not so much cost saving yet “Killer Application” is Needed

Reference 1.Evan Schwartz, “Roll to Roll Processing for Flexible Electronics,” 2.Jain, K. Klosner, M. Zemel, M. Raghunandan, S., “Flexible electronics and displays: high-resolution, roll-to-roll, projection lithography and photoablation processing technologies for high-throughput production,” 3.Chin, Spencer. “Report: Flex display market to grow 83.5% a year.” EETimes Online. March 23, Jain, K. “Flexible Electronics and Displays: High ‐ Resolution, Roll ‐ to ‐ Roll, Projectio n Lithography and Photoablation Processing Technologies for High ‐ Throughput Production.” Proc. IEEE, 93, 1500 ‐ 1510, (2005). 5.Tan et. al. “Roller Nanoimprint Lithography.” J. Vac. Sci. Technol. B 16, 3926 (1998 ). 6.Vitex Systems, Inc. “The Guardian Tool.” Available online: m/guardian.html. 7.SiPix Imaging, Inc. “roll-to-roll© Manufacturing Process. Flexible Displays & Electronics”, 2004.