Aluminum Nitride (AlN)

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Presentation transcript:

Aluminum Nitride (AlN) Advanced Ceramic Heater Technologies Aluminum Nitride (AlN) Thermal Solutions for Challenging Semiconductor Applications

Chemical Vapor Deposition Plasma Etch • Wafer Test Multiple Heater Zones for Temperature Uniformity Integrated Tungsten RTD for Immediate Response to Temperature Change High Resistance to Chemical Corrosion Integrated RF Grid

Semiconductor Thermal Solutions Crucible Heating Complex 2 dimensional (2D) and 3 dimensional (3D) geometries High Temperature Applications Uniform Temperature Profile

Co-Fired Aluminum Nitride Substrate Low Coefficient of Thermal Expansion Homogeneous Construction Multi-Layer Construction

Fluid Dispensing Application Thermal conductivity: 190 W/mK High Heat Capacity Chemical Compatibility

Semiconductor Thermal Solutions Gas and Fluid Heating Smooth Non-Porous Surface Finish Zoned Heater Circuits High Electrical Dielectric Chemical Compatibility

Clinical Diagnostics PCR Thermal Cycler Rapid Thermal Cycling Vacuum Channels Tungsten Metallization Distributed Wattage on Edges

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