LW4 Lecture Week 4-1 Heterojunctions Fabrication and characterization of p-n junctions 1.

Slides:



Advertisements
Similar presentations
1 Chapter 5-1. PN-junction electrostatics You will also learn about: Poisson’s Equation Built-In Potential Depletion Approximation Step-Junction Solution.
Advertisements

EBB 424E Lecture 4– LED 3 Dr Zainovia Lockman
Laser III Device Design & Materials Selection
© S.N. Sabki Revision CHAPTER 9 CHAPTER 9 Part II.
ECE 663 P-N Junctions. ECE 663 So far we learned the basics of semiconductor physics, culminating in the Minority Carrier Diffusion Equation We now encounter.
© Electronics ECE 1312 Recall-Lecture 2 Introduction to Electronics Atomic structure of Group IV materials particularly on Silicon Intrinsic carrier concentration,
1 Fundamentals of Microelectronics  CH1 Why Microelectronics?  CH2 Basic Physics of Semiconductors  CH3 Diode Circuits  CH4 Physics of Bipolar Transistors.
ECE 4339: Physical Principles of Solid State Devices
Figure 2.1 The p-n junction diode showing metal anode and cathode contacts connected to semiconductor p-type and n-type regions respectively. There are.
Integrated Circuit Devices
© 2012 Eric Pop, UIUCECE 340: Semiconductor Electronics ECE 340 Lectures P-N diode in equilibrium So far we studied:  Energy bands, doping, Fermi.
p – n junction barrier height,
Department of Electronics Introductory Nanotechnology ~ Basic Condensed Matter Physics ~ Atsufumi Hirohata.
Lecture 15, Slide 1EECS40, Fall 2004Prof. White Lecture #15 OUTLINE The pn Junction Diode -- Uses: Rectification, parts of transistors, light-emitting.
Department of Aeronautics and Astronautics NCKU Nano and MEMS Technology LAB. 1 Chapter IV June 14, 2015June 14, 2015June 14, 2015 P-n Junction.
Studies of Minority Carrier Recombination Mechanisms in Beryllium Doped GaAs for Optimal High Speed LED Performance An Phuoc Doan Department of Electrical.
Lecture #12 OUTLINE Metal-semiconductor contacts (cont.)
MatE/EE 1671 EE/MatE 167 Diode Review. MatE/EE 1672 Topics to be covered Energy Band Diagrams V built-in Ideal diode equation –Ideality Factor –RS Breakdown.
9. Semiconductors Optics Absorption and gain in semiconductors Principle of semiconductor lasers (diode lasers) Low dimensional materials: Quantum wells,
Week 8a OUTLINE The pn Junction Diode Reference Reading
Unit-II Physics of Semiconductor Devices. Formation of PN Junction and working of PN junction. Energy Diagram of PN Diode, I-V Characteristics of PN Junction,
Lecture 3. Intrinsic Semiconductor When a bond breaks, an electron and a hole are produced: n 0 = p 0 (electron & hole concentration) Also:n 0 p 0 = n.
Ideal Diode Equation. Important Points of This Lecture There are several different techniques that can be used to determine the diode voltage and current.
ECE685 Nanoelectronics – Semiconductor Devices Lecture given by Qiliang Li.
EE415 VLSI Design The Devices: Diode [Adapted from Rabaey’s Digital Integrated Circuits, ©2002, J. Rabaey et al.]
The Devices: Diode.
Chapter 4 Photonic Sources.
المملكة العربية السعودية وزارة التعليم العالي - جامعة أم القرى كلية الهندسة و العمارة الإسلامية قسم الهندسة الكهربائية ELECTRONIC DEVICES K INGDOM.
ENE 311 Lecture 10.
Solar Cells Early development of solar tech. starts in the 1960s Conversion of sunlight to electricity – by photovoltaic effect In 1974 only.
ECE 340 Lecture 27 P-N diode capacitance
P-N Junctions Physical aspects of pn junctions Mathematical models Depletion capacitance Breakdown characteristics Basis for other devices Circuit Symbol.
PN Junction Section
ENE 311 Lecture 9.
ECEE 302: Electronic Devices
Lecture 9 OUTLINE pn Junction Diodes – Electrostatics (step junction) Reading: Pierret 5; Hu
111 Notes 22 April 2013 Semiconductor Quantum Wells (QWs) A narrow gap semiconductor is sandwiched between layers of a wide band gap semiconductor Quantum.
1 Detectors RIT Course Number Lecture N: Lecture Title.
P n Excess holes Excess electrons. Fermi Level n-type p-type Holes.
Electronics The Seventh and Eighth and Lectures Eighth week 28 / 12/ 1436 هـ - 1 / 1/ 1437 هـ أ / سمر السلمي.
Dr. Nasim Zafar Electronics 1 EEE 231 – BS Electrical Engineering Fall Semester – 2012 COMSATS Institute of Information Technology Virtual campus Islamabad.
Electronics The fifth and Sixth Lectures Seventh week / 12/ 1436 هـ أ / سمر السلمي.
 P-N Junction Diodes  Current Flowing through a Diode I-V Characteristics Quantitative Analysis (Math, math and more math)
1 UCONN ECE 4243/6243 Fall 2014 Nanoscience and Nanotechnology-I L2 Energy levels in potential wells and density of states 1.Bonds and energy bands (page.
Physics of Semiconductor Devices
Chapter 3 Solid-State Diodes and Diode Circuits
MOS Device Physics and Designs Chap. 3 Instructor: Pei-Wen Li Dept. of E. E. NCU 1 Chap 3. P-N junction  P-N junction Formation  Step PN Junction  Fermi.
LED Construction – Aim – 100% light emitting efficiency ◘Important consideration - radiative recombination must take place from the side of the junction.
Many solids conduct electricity
By Squadron Leader Zahid Mir CS&IT Department, Superior University PHY-BE -04 PN Junction.
Problems All problems up to p.28 Q 4 can be done.
ECE 4211 UCONN-ECE LW3 Lecture Week 3-2 ( ) Chapter 2 Notes P-n and n-p junction Review: Forward and Reverse biasing Energy Band Diagrams Avalanche.
CHAPTER 4: P-N JUNCTION Part I.
UCONN_ECE 4211/LW2 Week 2-1, 2-2 January 26, and 28, 2016 (FCJ) Chapter 1 Quantization of levels in a quantum well Energy Band E-K Diagram: Direct and.
Slide 1EE40 Fall 2007Prof. Chang-Hasnain EE40 Lecture 32 Prof. Chang-Hasnain 11/21/07 Reading: Supplementary Reader.
CSE251 CSE251 Lecture 2 and 5. Carrier Transport 2 The net flow of electrons and holes generate currents. The flow of ”holes” within a solid–state material.
CSE251 CSE251 Lecture 2. Carrier Transport 2 The net flow of electrons and holes generate currents. The flow of ”holes” within a solid–state material.
Band Theory of Electronic Structure in Solids
Intro to Semiconductors and p-n junction devices
QUANTUM-EFFECT DEVICES (QED)
Recall-Lecture 3 Atomic structure of Group IV materials particularly on Silicon Intrinsic carrier concentration, ni.
ECE 4211_Lecture L4_Week F. Jain
L9B Lasers ENGR_ECE 4243_6243 UConn F. Jain
A p-n junction is not a device
Recall-Lecture 3 Atomic structure of Group IV materials particularly on Silicon Intrinsic carrier concentration, ni.
Other FET’s and Optoelectronic Devices
Einstein Relation—the relation between  and D
4.4.6 Gradients in the Quasi-Fermi Levels
Chapter 1 – Semiconductor Devices – Part 2
UNIT-III Direct and Indirect gap materials &
Presentation transcript:

LW4 Lecture Week 4-1 Heterojunctions Fabrication and characterization of p-n junctions 1

2 Heterojunctions: Single heterojunction Fig. 36. Energy band diagram for a p-n heterojunction. Fig. 35. Energy band diagram per above calculations. N-p heterojunction Single heterojunctions: Energy band diagrams for N-AlGaAs – p-GaAs and P- AlGaAs/n-GaAs heterojunctions under equilibrium

3 Energy band diagram: Double Heterojunction Fig. 39. A forward biased NAlGaAs-pGaAs- PAlGaAs double heterojunction diode. Fig. 42 Energy band diagram of a NAlGaAs-pGaAs-PAlGaAs double heterostructure diode.

Built-in Voltage in Heterojunctions 4 Fig. 33. Energy band diagram line up before equilibrium.

Built-in Voltage in Heterojunctions 5

Built-in Voltage in Heterojunctions Cont. 6

Built-in Voltage Method II: Gauss' Law 7 (145)

Forward-Biased NAlGaAs-pGaAs Heterojunction 8 Fig.34 Carrier concentrations in an n-p heterojunction (73) (161) Hole diffusion from pGaAs to the N-AlGaAs, (164) Electron diffusion from N-AlGaAs to the p-GaAs side, (162)

I-V Equation 9 Next we substitute the values of n po and p No in Eq. 107 (170)

I-V Equation and Current Density Plot 10 Here, we have used the energy gap difference  E g =E g2 -E g1. From Eq. 174 we can see that the second term, representing hole current density J p which is injected from p-GaAs side into N- AlGaAs, and it is quite small as it has [exp-(  E g /kT)] term. As a result, J ~ J n (x p ), and it is Fig. 38B Current density plots.

Carrier Confinement L4-1 new material Fig.41. Minority carrier concentrations in p-GaAs and in p-AlGaAs. Thus, the addition of P-AlGaAs at x=x p +d forces the injected electron concentration quite small. That is, it forces all injected carrier to recombine in the active layer. This is known as carrier confinement.

Energy band diagram of a double heterojunction 12 Fig. 42 Energy band diagram of a NAlGaAs-pGaAs-PAlGaAs double heterostructure diode.

Double heterojunction with a quantum well By reducing the thickness of p-GaAs layer to Å, we obtain a quantum well double heterostructure as shown schematically in Fig. 42B, page Al x Ga 1-x As GaAs ∆E V ∆E C 0 V(z) z -E G ∆E V -E G +∆E V z ∆E c = 0.6∆E g ∆E v = 0.4∆E g Fig. 42 B GaAs quantum well with finite barriers produced by AlGaAs layers.

14 Photon confinement in a waveguide region formed by double heterojunction layers (p.170) When electron and holes recombine in the GaAs layer, they produce photons. AlGaAs layers have lower index of refraction than GaAs layer. As a result it forms a natural waveguide. In the laser design example, we have mentioned various methods for the calculation of modes in such a slab waveguide. Also we need to calculate the confinement factor  of the mode. Confinement factor also determines the J TH. Generally, the confinement factor becomes smaller as the thickness of the active layer becomes narrower. This also depends on the index of refraction difference between the active and the cladding layers.

Fabrication of Diodes Interfacing of an n- and a p-type semiconductor forms a p-n junction (or diode). Experimentally, this is done by one of the following methods including: diffusion of p- impurities in n-Si, ion implantation of donor atoms in p-Si (generally this is followed by annealing to eliminate the damage to the lattice caused by high energy implantation), and epitaxial growth (depositing a p- layer on n-type substrate). In the case of diffusion or ion implantation, the impurity or dopant concentration is higher in the top layer than the substrate.

Diffusion from an infinite source: Predeposition p Fig. 23. The impurities distribution during predeposition. Note the increasing junction depth as a function of predeposition duration.

Junction depth measurements 17 Figure 24. (a) Sample before Diffusion (Width polished side up) (b) Sample after Diffusion (p-type) (c) Sample after back etch of p-Si diffused Layer. Figure 25. Dicing and Mesa Formation

Electrical Characterization of p-n diodes 18 Figure 26. (a) Left: Circuit connections for current source and voltage meter. (b) Right: Sample after Diffusion (p-type) Figure 27. C-V measurements Figure 29. Solar cell measurements