Semiconductor and the Integrated Circuits. In 1874, Braun discovered the asymmetric nature of electrical conduction between metal contacts and semiconductors,

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Presentation transcript:

Semiconductor and the Integrated Circuits

In 1874, Braun discovered the asymmetric nature of electrical conduction between metal contacts and semiconductors, such as copper, iron, and lead sulfide. These devices were used as detectors in early experiments on radio. German physicist Ferdinand Braun's main contribution to solid state physics was his discovery of the rectifying action that occurred when a crystal of galena was probed by a metal point. This discovery led to the development of crystal radio detectors in the early days of wireless telegraphy and radio. He shared the Nobel Prize for physics in 1909 with Guglielmo Marconi for his contributions to the development of wireless telegraphy. Braun is also known as the developer of the cathode ray oscilloscope, the precursor to the radar screen and the television tube. History

In 1906, Pickard took out a patent for a point contact detector using silicon. In 1907, Pierce published rectification characteristics of diodes made by sputtering metals onto a variety of semiconductors. By 1935, selenium rectifiers and silicon point contact diodes were available for use as radio detectors. With the development of radar, the need for detector diodes and mixers increased. Methods of achieving high- purity silicon and germanium were developed during this time. 1942, Bethe’s thermionic-emission theory The current is determined by the process of emission of electron into the metal rather than by drift or diffusion.

In December 1947, the first transistor was constructed and tested at Bell Telephone Laboratories by William Shockley, John Bardeen, and Walter Brattain. This first transistor was a point contact device and used polycrystalline germanium.

In the end of 1949, single-crystal material was used as the transistors. The single crystal yields uniform and improved properties throughout the whole semiconductor material. The next significant step in the development of the transistor was the use of the diffusion process to form the necessary junctions. The diffused mesa transistor was commercially available in germanium in 1957 and in silicon in The diffusion process also allowed many transistors to be fabricated on a single silicon slice, so the cost of these devices decreased.

The Integrated Circuit (IC) In September 1958, Jack Kilby of Texas Instruments demonstrated the first integrated circuit, which was fabricated in germanium. At about the same time, Robert Noyce of Fairchild Semiconductor introduced the integrated circuit in silicon using a planar technology. The first circuit used bipolar transistors. Practical MOS transistors were developed in the mid- ’60s. The MOS technologies, especially CMOS, have become a major focus for IC design and development.

Moore’s Law? The number of transistors that can be placed inexpensively on an integrated circuit doubles approximately every two years. This trend has continued for more than half a century and is expected to continue until at least 2015 or GaAs SiGe