BNC Overview Ali Shakouri Director, Birck Nanotechnology Center January 16, 2013

2 Benchmarking and Recharge Analysis Ron Reger, Collin Steele, and Dave Lubelski

Birck has good total facility user base, but short of average in cleanroom Our external users are very low in both scenarios Our facility and tool use are both low compared to average Utilization PurdueAvg(6)MichHarvUMNPurdueAvg(5)MITUCSB Total # users Internal External (acad) External (other) # faculty groups Monthly users Total tool hours 42,39751,19663,90040,56617,200 19,14949,735N/A Internal 41,30745,30349,20031,41514,480 19,01439,787N/A External 1,0906,91514,7009,1512, ,948N/A Training hours 1,6243,1964,2005,8001,872 1,0361,848N/A 3 Cleanroom + External Lab Cleanroom only

Birck’s internal & external tool costs are competitive Tool Costs PurdueAvg(6)MichHarvUMNPurdueAvg(5)MITUCSB DRIE (e.g. STS) Internal (1 hr) $75$113$77$50$89 $75$82$128$35 Internal (16 hr, 4 entrances) $1,485$957$800$980$779 $1,485$1,007$510$560 E-beam Internal (1 hr) $140$141$114$48$155 $140$127$60$215 Internal (16 hr, 4 entrances) $1,405$1,367$768$948$971 $1,405$1,023$476$1,475 Contact Aligner (MA6) Internal (1 hr) $55$99$53$0$101 $55$58$51$35 Internal (16 hr, 4 entrances) $445$514$222$180$539 $445$406$408$35 Evap. 100nm Au Internal $175$160$114$100$162 $175$183$340$35 4 Cleanroom + External Lab Cleanroom only

Recharge Rates (Starting July 2013) – Rates haven’t been increased for over 3 years (inflation ~7-8%, salaries/benefit gone up), so we propose to increase Scifres and general lab equipment rates by 5% – We will move to a daily rate for Scifres, capped for the entire month after 8 days of entry ($40/day, capped at $320/month) 5

6 Fiji Atomic Layer Deposition Cleanroom Aluminum Oxide and Hafnium Oxide; ~ 1 Å/cycle Thermal & plasma capability Capable of alternate precursors, subject to approval EasyTube 3000 Lab 2221 Graphene CVD Single and multi-layer deposition Thermal and plasma capability New materials, subject to approval MA24 Aligner Cleanroom Refurbished and installed Start-up in February Front and backside alignment New Equipment

7 Heidelberg Direct Laser Writer Cleanroom Laser lithography 1  m, (future upgrade 0.6  m) Mask making and direct write Arrived, to be installed Nikon Microscopes Cleanroom Expensive parts: lenses, filters Training needed Lamps left on Filters removed and lost/broken STS ASE Cleanroom Back-up DRIE silicon etcher Bosch deep etch process Installation Spring 2013 New Equipment

8 Raman Lab 1227 Horiba LabRam Wavelengths 633 & 532 nm Manual sample stage Spectro- scopic Ellipsometer Lab 1263 Thin film characterization Multiple wavelengths & angles VASE: Variable Angle Spectroscopic Ellipsometry PVD Sputtering Cleanroom New, 2” targets Installation spring 2013 RF & DC capability Au and many other materials New Equipment

9 New Laboratories at BNC Total new laboratory space: 6,648 ft 2 John Weaver and Mark Voorhis

10 Areas Affected – Cleanroom 10

11 Areas Affected – First Floor

BNC Community Birck Coffee Hour (Fridays 3:30-4:30pm) Learn about recent advances in nanotechnology (BNC Seminars and Journal Club) New Center Initiatives Nano-Manufacturing In-vivo, in-vitro devices Electro thermal/ Power devices Imaging Nano Education (REU site) Topological materials/Solar Discovery to commercialization Always interested in new ideas: contact: