Diffractive Optical Element Design Tools and Fabrication Process Kyunghwan Oh, Department of Physics Yonsei University

Contents Available DOE design CAD - DECAD - DOE-CAD-W - DiffacMOD - Optis - VirtualLab 2. DOE Fabrication Process - Jena Photonics Fabrication Network (JPFN) - Institute of Applied Physics, Fredrich Schiller U.

Available DOE design CAD More than 6 commercially available CADs - DECAD - DOE-CAD-W - DiffacMOD - Optis - VirtualLab Probably VirtualLab might be the most recent and and most efficient one.

Available DOE design CAD DECAD http://diffractive.optics.free.fr/ Free Download Latest Version 2.44, May 30 2005 Linux OS Used by Samsung, Sony, Toshiba Chalmers University e-beam writter file format only. Other output file formats will be added “DECAD ( Diffractive Element Computer Assisted Design ) is a powerful and versatile software developed by Dr. Olivier MAGNIN for diffractive optics design. DECAD both allows synthesis of diffracting phase functions and accurate simulation of their performances. The simulation engine relies on various selectable propagators (Angular Spectrum, Rayleigh-Sommerfeld, Kirchhoff,... ) that are used by the designer for in-depth analysis of the light diffracted by the DOE aperture.”

Available DOE design CAD DECAD Gaussian to Flat-Top Analytic Phase Function

Available DOE design CAD DECAD

Available DOE design CAD DECAD Simulation of Diffraction including High Orders Investigation of Fabrication Tolerance

Available DOE design CAD DECAD Master fabricated by e-beam lithography

Available DOE design CAD DECAD Experimental Assessment

Available DOE design CAD DOE-CAD-W http://www.holoor.co.il HOLO/OR makes DOE as well as DOE-CAD-W MS-Window based One of earliest pioneer Compatible to Optics Tool, Zemax, Oslo, CodeV, along with various outputs “DOE-CAD for windows, masks generation and performance modeling, for diffractive optical elements DOE-CAD-W is a software package designed to transform phase function specified by user into the set of mask files for generating multi-level or gray level DOEs.”

Available DOE design CAD DOE-CAD-W

Available DOE design CAD DOE-CAD-W Functions available in DOE-CAD-W Mask files in industrial formats: GDS-II, PostScript, Linework, Bitmap Mask preview with zoom and cursor Multiplication of DOE into array of elements with 100% full field factor Generation of off-center part of the DOE-mask. Numerical simulation of focal intensity distribution Estimation of efficiency, accuracy of DOE performance

Available DOE design CAD DOE-CAD-W Functional advantages · 2-D nonsymmetrical DOEs supported · Computer simulation of DOE performance · Simulation pictures in standard TIFF image format Production management advantages · Mask files placed at any directory on hard disk · Production management support: printing of production form with overview of all DOE specification, with date, serial number, model, quantity etc. · Inventory of DOE masks inputs.

Available DOE design CAD DiffacMOD http://www.rsoftdesign.com/ A module of Optical Simulation Package, Rsoft Passive Device Suite DiffractMOD™ is a general design and simulation tool for diffractive optical structures such as diffractive optical elements, subwavelength periodic structures, and photonic bandgap crystals. It is based on the Rigorous Coupled Wave Analysis (RCWA) technique which has been implemented using advanced algorithms including fast Fourier factorization and generalized transmission line formulation. Already a market leader, the tool has extensive applications in a broad range of areas including semiconductor manufacturing and wave optics.

Available DOE design CAD DiffacMOD

Available DOE design CAD Optis http://www.optis-world.com/ LSP lab from the University of Strasbourg, France, Gerchberg-Saxton algorithm. Bitmap Image input/output demo evaluation version or quotation : does@optis-world.com “There are a lot of DOE simulation tools, but every feature developed in DOEs simulation tool as been though with tolerancing issues in mind. As a consequence, the final purpose of DOEs simulation tool is to allow every even unskilled user to see the evolution of the reconstructed image quality when changing source or DOE parameters.”

Available DOE design CAD Optis Step 1 : just define you laser beam Step 2 : define your target with a BMP editor software Step 3 : choose DOE parameters you want to build : sampling, number of phase level, near field or far field optimization Step 4 : just press « Start » to see the evolution of your result during the optimization. It will automatically stop when finished Step 5 : here is your result : you can see quality, uniformity of the generated DOE, and you obtain a file that represents it: each pixel value (gray level) corresponds to a phase level. This result can be exported as a bitmap or a formatted text file for industrial manufacturing.

Available DOE design CAD Optis

Available DOE design CAD VirtualLab http://www.lighttrans.com Jena, Germany Version 3.0 October 11 2006 General Optical Simulation CAD including DOE Institute of Applied Physics, Fredrich Schiller University Fraunhofer Institute of Applied Optics Fabrication service available by Jena Photonics Fabrication Network™

Available DOE design CAD VirtualLab VirtualLab™ - Your Benefit The electromagnetic field kernel and the generalized spread sheet concept Flexopas™ constitute the fundament of VirtualLab™. Your most essential benefits can be stated in: Light Source Models Definition of System Quality Measures Adjustment of Field Propagation Techniques Rapid System Investigation Wave-Optical Design

Available DOE design CAD VirtualLab Two Movies for DOE Design

DOE Fabrication Process

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Hot Embossing Microfabrication Hot Embossing is a technique of imprinting microstructures on a substrate (polymer) using a master mold (silicon tool).

Steps in Hot Embossing Heating Silicon & Polymer above glass transition temperature (Tg). Applying load by pressing the silicon tool on polymer at certain embossing pressure. Cooling the silicon tool and polymer assembly below Tg and de-embossing the tool. Master/Mold from Femto- Second Laser Heat the substrate and mold to just above Tg of the substrate Apply embossing force on the substrate via the mold under vacuum Cool the below Tg De-embossing of the mold and

Advantages of Hot Embossing System Cost effective – Easy manufacturability. Time efficient – Fast process. Fabrication of high aspect ratio features. Bio-Compatible surfaces – Polymer substrates used. Disposable – Low cost for volume production.

Applications of Hot Embossing BioMEMS/Bio-Sensors Micro-Fluidic Devices Micro-Optics m-TAS (Micro Total Analysis Systems)

Hot Embossing v/s Other MEMS Fabrication Processes Characteristics LIGA Surface Micro-machining Hot Embossing Number of layers 1 3-5 Minimum feature size 5 microns 1 micron Aspect ratio 20 N/A 10 Cost High Moderate Low Productivity Residual Stress Very Low

Schematic Representation of Hot Embossing Setup

Hot Embossing Conceptual Solid Models

Mini-Vacuum Chamber Mini vacuum chamber used to provide a clean and moisture free environment during embossing. Mini vacuum chamber can accommodate an 8” substrate.