Search for Superconductivity with Nanodevices

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Presentation transcript:

Search for Superconductivity with Nanodevices Precious Cantu1, Takahiro Nishijima2, Hidekazu Shimotani2, and Yoshihiro Iwasa2 1NanoJapan Program 2009 and Department of Electrical Engineering, Louisiana State University, Baton Rouge, LA, USA 2Institute for Materials Research, Tohoku University, Sendai, Japan Introduction Methods cont’d Results cont’d (70 nm thick) Si back gate SiO2 Ti Au (500 nm thick) (10 nm thick) 2. Comparison of HH-P3(CΞC-Dec)Th FET & EDLT Transfer Characteristic Curves Background: Conventional FET Electric Double Layer Transistor VG applied VG = 0 EDL formed 3. Comparison of P3HT & HH-P3(CΞC-Dec)Th Conductance 1 mm Measurement Apparatus: Gate Induced insulator-to-metal Transition and Superconductivity Notable Research: H. Shimotani et al., Appl. Phys. Lett. 91, 082106(2007) K. Ueno et al., Nat. Mater. 7, 855(2008) Probe Station 4. FET Carrier Motilities of P3HT & HH-P3(CΞC-Dec)Th Results Aim: To realize superconductivity in materials that have not been reached by conventional chemistry one order larger Methods 1. Comparison of P3HT FET & EDLT Transfer Characteristic Curves Conclusion and Future Work Materials and Device Fabrication Demonstrated the first field-effect transistor (FET) operation of HH-P3(CΞC-Dec)Th. The modulation of conductance in the electric double layer transistor (EDLT) was increased compared to the conventional FET in both polymers, however with poor mobility yield. Future work will focus on optimizing fabrication techniques such as: Drop cast conditions Annealing temperature Introduce spin coating This should improve the crystallinity of the polythiphene films, which may enhance the mobility, and thus the conductivity. This should aid in the metallization of the materials P3HT Structure HH-P3(CΞC-Dec)Th Structure Coplanar Structure Well-stacked Semiconductors Ionic Liquid Electron hopping Slower mobility Acknowledgement This material is based upon work supported by the National Science Foundation under Grant No. OISE-0530220