1. EUVL https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

2. Lawrence Livermore National Laboratory - Key accomplishments 1 Development of extreme ultraviolet lithography (EUVL) for fabricating next- generation computer chips. https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

3. Electron beam lithography - Electron energy deposition in matter 1 A study by the College of Nanoscale Science and Engineering (CNSE) presented at the 2013 EUVL Workshop indicated that, as a measure of electron blur, 50-100 eV electrons easily penetrated beyond 10nm of resist thickness (PMMA or commercial resist); furthermore dielectric breakdown discharge is possible.[http://www.euvlitho.com/2013/P29.P DF G. Denbeaux et al., 2013 International Workshop on EUV Lithography.] https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

4. Photoresist - Chemical amplification 1 This parasitic exposure would degrade the resolution of the photoresist; for 193nm the optical resolution is the limiting factor anyway, but for electron beam lithography or EUVL it is the electron range that determines the resolution rather than the optics. https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

5. 10 nanometer 1 SPIE 6925 (2008).[http://www.nikonprecision.com/ere view/spring_2010/article05.html Intel extending ArF lithography] given the difficulty of implementing EUVL|EUV lithography by 2015.[http://www.nikonprecision.com/erevi ew/spring_2010/article05.html CNSE Technology Development Consortium for EUVL] https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

6. Extreme UV 1 Its main uses are photoelectron spectroscopy, Extreme ultraviolet Imaging Telescope|solar imaging, and EUVL|lithography. https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

7. Lawrence Livermore Laboratory - Key accomplishments 1 *Development of extreme ultraviolet lithography (EUVL) for fabricating next- generation computer chips. https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

8. Extreme ultraviolet lithography 1 'Extreme ultraviolet lithography' (also known as EUV or EUVL) is a next- generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5nm. https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

9. Extreme ultraviolet lithography - EUVL light source 1 while EUV sources are targeted to exceed 40 kW.[http://www.euvlitho.com/2013/S2.pdf ASML update Nov https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

10. Extreme ultraviolet lithography - EUVL optics 1 EUVL is a significant departure from the deep ultraviolet lithography used today https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

11. Extreme ultraviolet lithography - EUVL optics 1 The pre-production EUVL systems built to date contain at least two Condenser (optics)|condenser multilayer mirrors, six projection multilayer mirrors, and a multilayer object (mask) https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

12. Extreme ultraviolet lithography - EUVL optics 1 The wafer throughput of an EUVL exposure tool is a critical metric for manufacturing capacity. Given that EUV is a technology requiring high vacuum, the throughput is limited (aside from the source power) by the transfer of wafers into and out of the tool chamber, to a few wafers per hour.A. Brunton et al., Proc. SPIE 5448, pp. 681-692 (2004). https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

13. Extreme ultraviolet lithography - EUVL optics 1 Another aspect of the pre-production EUVL tools is the off-axis illumination (at an angle of 6 degrees)L. Peters, Double Patterning Leads Race for 32nm, Semiconductor International, October 18, 2007. on a multilayer mask. The resulting asymmetry (leading to non-telecentricity) in the diffraction pattern causes shadowing effects which degrade the pattern fidelity.M. Sugawara et al., J. Vac. Sci. Tech. B 21, 2701 (2003). https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

14. Extreme ultraviolet lithography - EUVL optics 1 EUVL's shorter wavelength also increases Lens flare|flare, resulting in less than perfect image quality and increased line width roughness.M. Chandhok et al., J. Vac. Sci. Tech B 22, 2966 (2004). https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

15. Extreme ultraviolet lithography - EUV exposure of photoresist 1 e- + acid generator - 20eV are capable of desorbing hydrogen and fluorine anions from the resist,[http://www.sematech.org/meetings/ archives/litho/8653/poster/P063_Yakshins kiy_RutgersU.pdf B. Yakshinskiy et al., Intl. Symp. on EUVL 2009] leading to potential damage to the EUV optical system.C. Song et al., Chem. Mater. 20, 3473–3479 (2008). https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

16. Extreme ultraviolet lithography - EUVL defects 1 EUVL faces specific defect issues analogous to those being encountered by immersion lithography https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

17. Extreme ultraviolet lithography - EUVL defects 1 Of course mask defects are also a known source of defects for EUVL https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

18. Extreme ultraviolet lithography - EUV with Double Patterning 1 In Intel's complementary lithography scheme at 20nm half-pitch, EUV would be used only in a second line-cutting exposure after a first 193nm line-printing exposure.[http://www.euvlitho.com/2012/P1.p df Intel presentation on Complementary Lithography at 2012 International Workshop on EUV Lithography] The cost may be compared to the expected multiple exposures using 193nm light only https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

19. Extreme ultraviolet lithography - EUV with Double Patterning 1 Such a wavelength (~6.7nm) would be beyond EUV, and is often referred to as BEUV ('B'eyond 'E'xtreme 'U'ltra'V'iolet).[http://www.euvlitho.com/201 0/P14.pdf ASML presentation at 2010 International Workshop on Extreme Ultraviolet Sources] https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

20. Extreme ultraviolet lithography - Resource requirements: EUV vs. ArF immersion double patterning 1 Mizoguchi, Laser Produced Plasma EUV Light Source Gigaphoton Update, EUVL Source Workshop, May 12, 2008. https://store.theartofservice.com/itil-2011-foundation-complete-certification-kit-fourth-edition-study-guide-ebook-and-online-course.html

21. For More Information, Visit: https://store.theartofservice.co m/itil-2011-foundation- complete-certification-kit- fourth-edition-study-guide- ebook-and-online-course.html https://store.theartofservice.co m/itil-2011-foundation- complete-certification-kit- fourth-edition-study-guide- ebook-and-online-course.html The Art of Service https://store.theartofservice.com