1. 創新需求  需求再造 The Basic Concept of the Gas Filter 主講人 : 龍仁生 技術研討資料

2. 創新需求  需求再造 Content n How do gas filters work ? n Basic requirements of gas filter n Filter material comparison n Filter lifetime recommendation n Case study n How to choose a suitable filter ? n Filter technology trend n Summary Mykrolis 台灣分公司‧微電子事業處

3. 創新需求  需求再造 How do Gas Filters Work n Particle capture mechanisms 3 Impaction 3 Interception 3 Diffusion 3 Electrostatic n MPPS (Most Penetrating Particle Size) n Nature of gas Mykrolis 台灣分公司‧微電子事業處

4. 創新需求  需求再造 MILLIPORE Mykrolis 台灣分公司‧微電子事業處 How do Gas Filters Work

5. 創新需求  需求再造 Mykrolis 台灣分公司‧微電子事業處 u Theoretical Plot illustrating the Most Penetrating Particle Size Concept 10 Capture by Interception Capture by Diffusion Combines Capture by Interception and Diffusion Most Penetrating Particle Size at 50 cm sec. 10.01.02.03.06.1.2.3 Particle Diameter,  m -28 -26 -24 -22 -20 -18 -16 -14 -12 -10 -8 -6 -4 -2 Fractional Penetration

6. 創新需求  需求再造 MILLIPORE Mykrolis 台灣分公司‧微電子事業處 Particle Capture on Nickel Membrane

7. 創新需求  需求再造 Mykrolis 台灣分公司‧微電子事業處 Log Reduction Value n LRV = Log 10 (inlet Cp / outlet Cp) n Example: – Inlet Cp = 1 x 10^6 particles / ft3 – Outlet Cp = 1 particle / ft3 – LRV = 6 – 99.9999% efficient – fractional penetration = 1 x10^-6

8. 創新需求  需求再造 Basic requirements of gas filter n High retention - The ability to retain all particles,down to the smallest size. n Downstream cleanliness - The ability not to add anything ( particles or volatiles (moisture, others))to the gas stream. n High corrosion resistance - The ability to withstand in a corrosive environment. n Fast gas displacement - The ability to displace gas quickly. Mykrolis 台灣分公司‧微電子事業處

9. 創新需求  需求再造 Filter Membrane Comparison Materials Of Membrane Shedding Retention (LRV)Outgasing Gas Displacement Corrosion Resistance NickelExcellent>10.8Excellent Good SUS316LExcellent6.2GoodExcellentFair PTFEGood>10.8Poor N/A CeramicFair7.8FairPoorN/A Mykrolis 台灣分公司‧微電子事業處

10. 創新需求  需求再造 Filters Lifetime Recommendation Specialty Gas (Cl2, HBr, SiH4, DCS…) < 2 Years Inert Gas (N2, H2, O2, He…) < 5 Years Mykrolis 台灣分公司‧微電子事業處

11. 創新需求  需求再造 No.1 Upstream SEM and EDS No.2 Upstream SEM and EDS Mykrolis 台灣分公司‧微電子事業處

12. 創新需求  需求再造 No.1 downstream SEM and EDS No.2 downstream SEM and EDS Mykrolis 台灣分公司‧微電子事業處

13. 創新需求  需求再造 No.1 Housing SEM and EDS (corroded) No.2 Housing SEM and EDS (corroded) Mykrolis 台灣分公司‧微電子事業處

14. 創新需求  需求再造 How to Choose a Suitable Filter Compatibility (Corrosive / Inert) Corrosive: Ni / PTFE Inert : Ni / PTFE / SS Retention Ni / PTFE > SS Gas flow rate in need Considering Inlet pressure Fitting (VCR, Swaglok, Butt weld, IGS(Surface Mount)) Mykrolis 台灣分公司‧微電子事業處

15. 創新需求  需求再造 Filter Technology Trend Improve Process uptime & Wafer defects. Overall Process control: Particles, Moisture, Oxygen,Impurity…etc. Our best suggestion is both of Filter & Purifier can improve process uptime & overcome wafer defects. Mykrolis 台灣分公司‧微電子事業處

16. 創新需求  需求再造 The Role of Purifier Purifier play a role of remove impurities (Oxygen, Moisture,CO2…etc) Moisture is one factor cause corrosion on component & piping to process chamber.(Especially, Corrosive gas) Moisture & Impurity can affect the process uptime & wafer defects. Mykrolis 台灣分公司‧微電子事業處

17. 創新需求  需求再造 Summary n Gas filter key filtrate mechanism : diffusion & interception n Cleanliness becomes most important n All-Metal gas filters are the technology trend n Routine filter change out is the key to high quality particle performance n Purifier can enhance gas filter performance and lifetime Mykrolis 台灣分公司‧微電子事業處