Presentation on theme: "Nilton Morimoto General Manager: Jacobus Swart The Millennium Institute Program and Projects SCMN NAMITEC General overview MEMS Activities Micromachining."— Presentation transcript:
The Millennium Institute Program and Projects SCMN NAMITEC General overview MEMS Activities Micromachining techniques MEMS device development Irrigation control system Concluding remarks
2001 – 2005: SCMN - Research Network on System-on-Chip, Microsystems and Nanoelectronics 17 projects / all fields 2005 – 2008: NAMITEC - MIcro and NAnoelectronics TEChnologies for Intelligent Integrated Systems - 34 projects / all fields Value: R$ 4.540.000,00 (~US$ 2.7 million)
São Paulo Porto Alegre Florianópolis Campinas Recife Brasília Rio de Janeiro São Carlos 59 PhD researchers 11 groups/departments 8 institutions 8 cities 6 states SCMN (2002-2005):
São Paulo Porto Alegre Florianópolis Campinas Recife Brasília Rio de Janeiro Campina G. São Luiz Belo Horizonte NAMITEC (2005-2008): 93 PhD researchers 28 groups/departments 18 institutions 12 cities 10 states São Carlos Natal
NAMITEC – Objectives: SoC and sensor network methodologies and tools for the design and test of low-power and fault-tolerant integrated circuits, including analog, RF and digital circuits micro- and nanoelectronic devices, photonic and optoelectronic devices, MEMS and NEMS, and their integration and packaging processes micro- and nanofabrication materials and techniques, required for the manufacturing of integrated devices and circuits
Goals: 1) Systems on chip: i) To develop a design platform for systems on chip. ii) To develop architectures of systems on chip. iii) To develop an environment for SoC applications. iv) To develop test methodologies, including design aimed at testability, CAD, test techniques. v) Construction of a reconfigurable System on Chip. vi) Demonstration of a pilot unit of a system of precision irrigation control based on SoC, developed within the SCMN (our previous Millennium project). vii) Demonstration of pilot units of the system for monitoring and scanning of animals and fruit plants. viii) Demonstration for the system of water quality monitoring.
2) Circuits and tools for physical synthesis: i) To develop new analog, RF and digital circuits. ii) To develop new tools for automatic physical synthesis. iii) To develop methodologies for physical synthesis of digital circuits, which do not depend on the use of cell libraries, allowing for a real logic circuit minimization. iv) To develop new fault tolerant circuits.
3) Electronic and photonic devices and MEMS/NEMS: i) To develop FinFET/SOI transistors. ii) To develop CNT based devices: transistor e gas sensor. iii) To develop optoelectronic and photonic devices. iv) MEMS/NEMS devices. v) Organic devices.
4) Materials and techniques of micro and nanofabrication: i) Nanofabrication techniques: electron beam lithography, lithography by AFM, nanofabrication by FIB, plasma etching. Development of advanced nanofabrication techniques. ii) Synthesis of CNT: Development and modeling of new processes of aligned CNT growth for applications in electronics and chemical sensors. iii) Synthesis of Nanofibers: Development of electrochemical process of metal nanofiber synthesis for applications in chemical sensors. Development of the electrospinning process for synthesis of polymeric nanofibers for applications in chemical sensors.
iv) Synthesis of Si and Ge nanoparticles. Development of the nanoparticles growth processes aiming at their applications in optoelectronics and for charge storage (memory). v) High k dielectrics. Development of the processes of growth and characterization for new high k dielectrics, required for sub 100 nm transistors, among them: compounds such as HfSiON, HfAlO, AlNO, oxynitrides of Si with metals. Study of the MOS systems thermal stability. vi) Processes of thin and ultrathin films growth: Si-poly, TiN, Cu, silicides, dielectrics, and polymers. Microchemical and morphological characterization of thin films; detection, characterization, creation, elimination and applications of electrical domains in isolators.
IC Design: EMC RF Blocks Front-end of reconfigurable radio Amplifier for Bio-potentials
High-k Requirements (Thermodynamics and Stability) Preserve capacitance of gate after the processing After sintering 450 o C/30min Ti (from electrode) incorporated at the SiON film B (from substrate) incorporated at the SiON film and the Al/Ti electrode Source: Diniz
Carbon Nanotubes Carbon Nanotubes Plasma Deposition Photonic and Electronic Application of Carbon Nanotubes Deposition of Nanostructured Carbon Thin films Photonic and Electronic Application of Nanostructured Carbon Thin films
4/15/2015 Centro de Componentes Semicondutores – UNICAMP (www.ccs.unicamp.br)16 CNTs for interconnects MWNTs: controlled deposition between metal electrodes from solutions using ac di-electrophoresis; 2 and 4 points measurements using FIB: Resistance MWNTs produced by CVD at T~900C ( 10 k / m) is too high for interconnection applications; V I I 1324 4-points, side-contacted MWNT FIB ID Pt FEB ID Pt
FinFETs Microsquids Nanostructures by e-beam lithography
50nm x 10m lines 4 1 2 3 5 6 789 10 11 12 Loops de histerese locais obtidos por SNOM em partículas de 0,5µm a 16µm Nanomagnetic structures
Graphene on Silicon Fonte: Science, 2008 Nanoelectronic Devices on Graphene Electronic Transport Nanostructures by e-beam lithography
MEMS Devices Pressure sensors Glucose sensor Electrochemical sensor Gas sensors Gas flow sensor Bolometer – IR detection THz Resonant filters
Integrated System for water quality control using microsensors and LTCC technology
Gas Flow Sensor Al Si SiO 2 B-doped Si Microheater : poly-si p type; 0.5 x 20 x 200 m; Flow with controlled temperature Circuits for interface and conditioning At T= 27 ºC: R = 401,92 TCR = 1.50 ppm/ºC P-doped poly-Si heater
Biosensor Structure Sistema de eletrodos (trabalho, referência e auxiliar) sem modificação. Magnificação de 500x.
Rattus norvergicus Glucose Sensor x Destro (continuous test)
Polimeric nanofibers recovered by electroless deposition Without metal deposition With metal deposition The non-woven fabrics obtained in the electrospun process: The obtained material of fibers is recovered by metal by electroless process in order to obtain a substrate sensible and or selective for gas sensors applications May be used as an electrode in a dye based photovoltaic cell May be used as a layer in a preconcentrator structure To obtain metallic tubes in nanometric range With metal deposition
System on Chip: SoC Integration Integrated SoC Layout and Picture
Microsystems on a Package Process intensifiers: Microfluidic Devices for Nanoparticle Generation/Encapsulation
Microsystems on a Package Micro-Analytical Systems Contaminants in Water (Heavy Metals, Phosphates, etc.) Pb ++
NAMITEC - Summary Increased number of institutions and members Increased interdisciplinarity Increasing cooperation with other institutions & companies Innovation in many issues Many students involved (under & graduate & pos-doc) Teaching of microtechnologies Improved installations Social, economical and environmental important applications: irrigation control system, sensor networks, etc. Importance of the field for Brazilian industrial policy – priority for semiconductors.
Acknowledgments: MCT/CNPq for financial support To all NAMITEC members for the results