1. E-beam litografi Nano imprint litografi
Nanolitografi
E-beam litografi
Nano imprint litografi

2. Mikroskopi

3. SEM (scanning electron microscope)

4. Komponenter i SEM Schottky emitter elektronkilde Magnetisk linse
F =-e v x B
Magnetisk linse

9. E-beam litografi - Dedikerede e-beam systemer
- SEM med Raith Gmbh kontrolsystem
og ’pattern generator’
DANCHIP

10. Test of nanowire writing E-beam writing+RIE (Nano 9 – Tom+Jeppe)

11. Wires and channels

12. Diffraktive komponenter
Optiske strukturer
Diffraktive komponenter
2D grating:
Periodicity - 250nm

13. Nano Imprint Lithography (NIL)

17. Nanowire detektor
Appl. Phys. Lett. 89, (2006)

18. Focused Ion Beam (FIB) System

19. Focused Ion Beam Writing
As the diagram on the right shows,
the gallium (Ga+) primary ion beam hits
the sample surface and sputters a small
amount of material, which leaves the
surface as either secondary ions (i+ or i-)
or neutral atoms (n0). The primary beam
also produces secondary electrons (e-).
As the primary beam rasters on the sample
surface, the signal from the sputtered ions
or secondary electrons is collected to form
an image.

20. E-beam og FIB litografi
E-beam ~10 nm
FIB ~20 nm
EDX

21. TEM samples

22. FIB skrivning AAU-logo på et hår

23. CVD med FIB stråle
Shinji MATSUI

29. FIB skrivning AAU-logo på et hår