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Nanolitografi E-beam litografi Nano imprint litografi.

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Presentation on theme: "Nanolitografi E-beam litografi Nano imprint litografi."— Presentation transcript:

1 Nanolitografi E-beam litografi Nano imprint litografi

2 Mikroskopi

3 SEM (scanning electron microscope)

4 F =-e v x B Komponenter i SEM Magnetisk linse Schottky emitter elektronkilde

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9 E-beam litografi - Dedikerede e-beam systemer - SEM med Raith Gmbh kontrolsystem og ’pattern generator’ DANCHIP

10 Test of nanowire writing E-beam writing+RIE ( Nano 9 – Tom+Jeppe )

11 Wires and channels

12 2D grating: Periodicity - 250nm Optiske strukturer Diffraktive komponenter

13 Nano Imprint Lithography (NIL)

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17 Nanowire detektor Appl. Phys. Lett. 89, (2006)

18 Focused Ion Beam (FIB) System

19 Focused Ion Beam Writing As the diagram on the right shows, the gallium (Ga + ) primary ion beam hits the sample surface and sputters a small amount of material, which leaves the surface as either secondary ions (i + or i - ) or neutral atoms (n 0 ). The primary beam also produces secondary electrons (e - ). As the primary beam rasters on the sample surface, the signal from the sputtered ions or secondary electrons is collected to form an image.

20 E-beam ~10 nm FIB ~20 nm EDX E-beam og FIB litografi

21 TEM samples

22 FIB skrivning AAU-logo på et hår

23 CVD med FIB stråle Shinji MATSUI

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29 FIB skrivning AAU-logo på et hår


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