1. EBIS ARR Andrew McNerney May 4-7, 2010 Hazards and Controls for Electrical, Control, Instrumentation and Conventional Systems

2. Power Distribution System The ac power for the EBIS systems is supplied from the L-4 13.8kV to 480V,2500kVA substation. It was installed when the building addition was constructed L-4 has high resistance grounding and ground fault detection that is remotely monitored. Arc flash calculations have been completed for the distribution system and panels have been labeled with the appropriate PPE requirements. The distribution of hazard categories is: Five category 3 Four category 2 Four category 1 Eleven category 0+ All breakers have been labeled

3. Conventional Hazard Control Wet pipe ordinary hazard sprinkler system in EBIS building addition with duct smoke detection Lower equipment bay has sprinkler system Alarms tied into building system, MCR and Fire Rescue Addition of smoke detectors in EBIS addition connected to alarm panel planned before unattended operations-this would give early warning before sprinklers are activated Fire rated cable used Exit pathways marked and maintained Combustible loading minimized through regular clean-ups Fire extinguishers installed on both floors of EBIS addition MCR and CAS incident command structure integrated into BNL

4. Power Supplies EBIS: There are 58 power supplies in the EBIS on 3 major voltage platforms. AC power is provided to the platforms and series connected “stacked “ supplies by low capacitance isolation transformers.  EBIS platform: pulsed to 100kV  Cathode platform: EBIS -20kV  Collector platform: EBIS + 15kV Platforms and the EBIS source are enclosed in a Kirk key interlocked grounded wire mesh/ flame retardant polycarbonate cage. Procedure followed for entry into enclosure. Kirk key system reviewed by C-AD Chief Electrical Engineer. Cathode and Collector Platform HV supplies are in Kirk key interlocked enclosed racks within the HV cage

5. Power Supplies: EBIS PS Block Diagram

6. Power Supplies (continued) Power Supplies external to the high voltage cage are made safe for access/maintenance through lock and tag procedures. Cabinet doors are locked for exposed voltages 50 Volts and above Cable trays for ac input, dc output and control wiring are grounded and partitioned for separation of power and signal cables. Cable trays in HV cage at EBIS potential are bonded to EBIS platform Power supply outputs 600 volts or greater are enclosed in metal conduit or shielded cables. No exposed terminals 50 volts or above All units (including supplies in HV cage) have been EEI inspected.

7. Power Supplies: LEBT & Ext. Ion Sources 70 Power supplies for the LEBT/Ion Injection Flat and Spherical Electrostatic Steering Electrostatic Quadrupoles High Current Pulsed Electromagnetic Solenoid Electromagnetic Steering 11 Hollow Cathode Ion Source P Source Elements: Bias Platform, Lenses, Filters Transport Elements: Electrostatic Deflectors and Quadrupoles 7 Liquid Metal Ion Source PSs Source Elements: Bias Platform, Grids Transport Elements: Electrostatic Deflectors and Quadrupoles

8. Power supplies: MEBT & LINAC 4 Power supplies for the MEBT Four 900A Fast Pulsed Electromagnetic Quadrupoles 2 Power Supplies for the LINAC Two for 900A Fast Pulsed Electromagnetic Triplet

9. Power supplies: HEBT 20 Power Supplies for the HEBT –Two for 900A Fast Pulsed electromagnetic triplet –Seven 40A Slow Pulsed Electromagnetic Quadrupoles  Nine 20A Slow Pulsed Electromagnetic Steerers  One 3,000A, 250V, Slow Pulsed Supply for Two Big Bend Magnets  One 20A Slow Pulsed Back Leg Winding PS for Big Bend Magnet Offset

10. PS Summary EBIS58 ION INJECTION & LEBT70 ION SOURCES18 MEBT4 LINAC2 HEBT20 172total

11. Radio Frequency Systems (RF) Five 100.625 MHz Systems for RFQ, Linac, Rebuncher and 2 Debunchers -Pulse Width ≤1 ms -Repetition Rate ≤ 5Hz Digital low level RF(LLRF) system based on the common controller platform of the C- AD LLRF Upgrade. RFQ & Linac systems manufactured by Continental Electronics - 5kW drivers power two 175kW output stages feeding coaxial hybrid combiner Buncher/Rebuncher systems manufactured by Armstrong Transmitter - One 10kW and two 20kW units Lock and tag control of electrical energy Cabinet doors locked Coaxial lines and cabinets checked for rf leakage as system are brought on line

12. RF: RFQ & Linac Amplifiers Coaxial transmission line output system mounted above amplifiers

13. RF: Rebuncher/Debuncher Amplifiers Under Factory Test

14. Instrumentation Instrumentation is based on devices currently in service in operating beam lines Electronics chassis have been EEI inspected

15. Diagnostics:Bergoz Current Transformer in 12 inch Conflat Flange with Electronics

16. Diagnostics: Faraday Cup Detector head pneumatically plunged into beam path to collect entire ion beam; captured charge measured as a current in electronics - Fully destructive measurement – can also be used as beam stop - Provides time average current and pulse waveform data Fast Faraday Cup: Coaxial structure that allows observation of bunch structure of beam (available from previous project)

17. Diagnostics – Multiwire Monitor for Transverse Beam Profiles 32 X 32 and 16X16 arrays available -can be installed with Faraday cup on dual feed-through

18. Diagnostics: Pepperpot Emittance Head Acquires x and y emittance data in a single EBIS pulse Live beam profile image displayed provides immediate feedback to EBIS operator on beam focus Software provides pulse to pulse emittance calculation

19. Diagnostics: Current Transformer in HEBT

20. Diagnostics: Faraday Cup/Multiwire/Collimator in Booster Section of HEBT

21. Controls The Control System is an extension of the existing C-AD system It controls and/ or collect data from power supplies, instrumentation, vacuum devices and RF systems. Power Supply Interface (PSI) devices are located with controlled equipment and are optically isolated from local control computers (front end computer-FEC). Timing is provided by optically isolated trigger modules controlled by a synchronizing event link system 3 Linux work stations provided for EBIS machine development Hardware is EEI inspected

22. Overview of Controls Network

23. Typical Power Supply Control Path POWER SUPPLY PSI VME CHASSIS PROCESSOR V233 VME BACKPLANE Ethernet Analog I/O Digital I/O Fiber Optic Xmit/Rcv GroundHV Platform

24. SC Magnet Safety/Bake-out Precautions Safety Plan in Place for Operation/Entry of SC Magnet Unescorted Entry Requires static magnet field training and “read and sign” of safety plan Field is Below 100 Gauss Outside of Fenced Enclosure 500 gauss 80 cm radial from ends 5 Gauss Boundary Marked on Floor Warning signs in Place EBIS Vacuum Bake-out will follow existing Vacuum Group Procedures