1. Grenoble, France1 Work in Progress – Not for Publication April 26-27, 2001 ESH ITWG 2001 ITRS Status Update

2. Grenoble, France2 Work in Progress – Not for Publication April 26-27, 2001 ITWG Participants Junichi Aoyama-JEITA (SONY) Jim Jewett-SIA (Intel) Coleen Miller-SIA (ISMT/TI) Alain Roche-ESIA (ST Micro) Francois Tardif-ESIA (CEA-LETI)

3. Grenoble, France3 Work in Progress – Not for Publication April 26-27, 2001 PROPOSED CHANGES Improved Resource Conservation Metrics (energy, water, materials) will be tied to Manufactured Functions Concentrate on Materials (~80% of looming ESH Issues) in ITRS –Reference table in Roadmap Identify Banned, Restricted and Unrestricted materials and material classes –Characterization requirement for downstream residues (wastes, emissions, etc) –Rating Method for ESH Properties/Risks (e.g.. – Green/Yellow/Red Flag)

4. Grenoble, France4 Work in Progress – Not for Publication April 26-27, 2001 ASSEMBLY/PACKAGING Issues Reset tables to reflect Lead and Brominated flame retardant restrictions Revise Material Section to better define Restrictions and Timing Issues Implement concept of Absolute, Restricted and Unrestricted Materials (specific and generic) Evaluate Need for Metrics related to Resource Conservation (Energy & Water)

5. Grenoble, France5 Work in Progress – Not for Publication April 26-27, 2001 FACTORY INTEGRATION Issues Sub-Fab Space Resource Reduction Metrics TBD

6. Grenoble, France6 Work in Progress – Not for Publication April 26-27, 2001 OTHER CROSS-ITWG Interactions Realign key ESH issues with FEP, Interconnect, and Lithography Clearly identify any potential technology show- stoppers (such as PFOS, pre-cursor selection) TBD