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Mechanisms of single-walled carbon nanotube growth and deactivation from in situ Raman measurements Laboratoire des Colloïdes, Verres et Nanomatériaux.

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Presentation on theme: "Mechanisms of single-walled carbon nanotube growth and deactivation from in situ Raman measurements Laboratoire des Colloïdes, Verres et Nanomatériaux."— Presentation transcript:

1 Mechanisms of single-walled carbon nanotube growth and deactivation from in situ Raman measurements Laboratoire des Colloïdes, Verres et Nanomatériaux Université des Sciences et Techniques du Languedoc - CNRS Montpellier, France Vincent JOURDAIN

2 Motivations The nanotube yield in catalytic CVD is limited by: -Activation processes -Growth kinetics -Deactivation processes Why Raman spectroscopy? Advantages -structural information (SWNTs vs. MWNTs, disordered C, …) -resonance effect: intense and specific signal -micron-large probed area: statistical information A few disadvantages: -the information is averaged on a large number of nanotubes -resonance effect: too specific information?  In situ measurements

3 CVD micro-reactor Setup for in situ Raman measurements Catalyst: - 5Å layer of Ni or Co on SiO 2 /Si - NO underlayer (e.g. Al 2 O 3 ) Growth conditions: - ethanol (6 Pa - 5 kPa) diluted in argon or pure methane - 450°C - 900°C Raman measurements: - l = 532 nm - P = 12 mW (on substrate)

4 Ex situ characterization Room temperature  = 532nm SEM RBM D band G band Dense entanglement of SWNTs (less than 10 nm thick) Low amount of disordered carbon Raman TEM (Raul Arenal, ONERA)

5 Catalyst activation methane, 650°C Argon purge Introduction of the carbon precursor Pretreatment: oxygen from RT to 700°C ethanol, 700°C In the growth conditions, methane and ethanol reduce cobalt oxides. The catalyst reduction occurs quickly. The nanotube growth starts after the catalyst is reduced.

6 Catalyst activation Reducing the catalyst is not enough to initiate the growth. At high temperature and low ethanol pressure, the catalyst is reduced but still unactive : no growth The precursor pressure must also exceed a threshold value. The threshold pressure increases with increasing temperature. T=850°C Possible origin: the catalyst particle has to reach carbon supersaturation to initiate the growth. T   carbon solubility   precursor pressure for supersatutarion 

7 Catalyst deactivation at high temperature Once reduced, the catalyst layer rapidly restructures at high temperature as revealed by: - a decreased activity - increased nanotube diameters Nanotubes grown in standard conditions Nanotubes grown in the same conditions after 14 min in the high-temperature non-activated region (850°C, P EtOH =10Pa) Possible origins? Ostwald ripening and/or diffusion in the substrate at high temperature

8 Growth kinetics - initial rate - lifetime  - final yield Normalize Integrate G(t) = . . (1 – e -t/  ) T = 800°C 1s acquisition time Fit Acquire

9 Growth kinetics Low temperatureHigh temperature Yield vs. Temperature  vs. Temperature LTMTHTLTMTHT

10 Initial growth rate and lifetime vs. ethanol pressure The initial growth rate displays two regimes as a function of ethanol pressure:  limited by the gas-phase precursor supply at low ethanol pressure  limited by surface reactions at high ethanol pressure  and are anticorrelated when increasing P EtOH : both growth and deactivation are influenced by the availability of the surface products of ethanol decomposition. lifetime initial growth rate Apparent reaction order n = 1.2

11 Initial growth rate and lifetime vs. temperature At LT and MT, the initial growth rate also displays two regimes as a function of temperature:  limited by surface reactions at low temperature  limited by the gas-phase precursor supply at medium temperature lifetimeinitial growth rate LTMT

12 E a  LT = -1.9 eV E a   HT = 1.0 eV E a ,LT = 2.8 eV E a , HT ~ 0 eV E a ,HT + E a ,HT = 1.0eV E a ,LT + E a ,LT = 0.9eV lifetimeinitial growth rate LTMT At LT and MT,  and are also anticorrelated when increasing temperature: confirms ethanol decomposition is a common step for growth and deactivation. The constant difference of activation energies between  and (~1eV) suggests the existence of an additional life-prolonging step of Ea ~1 eV. Initial growth rate and lifetime vs. temperature

13 Density of defects vs. growth parameters G/D ratio from ex situ Raman measurements

14 G/D ratio vs. temperature Apparent activation energy for the healing of defects at the nanotube-catalyst interface (~1 eV for Ni and Co) E a G/D = 0.9 eV E a G/D = 1.0 eV

15 E a G/D = 0.9 eV E a G/D ~ E a   HT Is defect healing by the catalyst the life-prolonging step? Apparent activation energy for the healing of defects at the nanotube-catalyst interface (~1 eV for Ni and Co) E a G/D = 1.0 eV G/D ratio vs. temperature

16 Conclusion A threshold precursor pressure to initiate the growth Two regimes for the initial growth rate  Surface-limited regime: precursor decomposition and carbon diffusion  Gas-phase diffusion-limited regime Growth rate & lifetime are anticorrelated  A common step for the growth and the deactivation (supply of the surface by carbon atoms?) Constant difference of activation energies between Growth rate & lifetime at LT and MT  A life-prolonging step of Ea~1 eV Measured activation energy for the annealing of defects at the nanotube- catalyst interface of ~1eV (for Ni and Co)  Is the annealing of defects the life-prolonging step? Is an accumulation of defects responsible for the deactivation? Change of behavior at HT:  Suggests the appearance of an additional deactivation mechanism at high temperature (Ostwald ripening?)

17 Acknowledgements Eric Anglaret (Univ. Montpellier): Raman spectroscopy eric@lcvn.univ-montp2.fr Matthieu Picher (Univ. Montpellier): PhD student (looking for a postdoc position in 2010…) picher@lcvn.univ-montp2.fr Raul Arenal (CNRS-ONERA): HR TEM raul.arenal@onera.fr

18 Yield vs. Temperature  vs. Temperature LTMTHT LTMTHT Summary Surface reactions Defect healing Ostwald ripening Our results support that the yield is limited by:

19 Possible growth mechanism

20 Theoretical interpretation? (1) Puretzky et al., Applied physics A, 2005 G(t) = . . (1 – e (-t/  ) ) Competition between the formation of a carbonaceous layer (deactivation) & the formation of a SWNT. THE MODEL 3 elementary steps  3 kinetic constants

21 Density of defects: influence of the precursor pressure

22 E a  LT = -1.9 eV E a   HT = 1.0 eV E a ,LT = 2.8 eV E a , HT ~ 0 eV - Measured Ea = sums of the activation energies of elementary steps -There is a common step (carbon flux at the surface) : favorable to & unfavorable to  (activation energy 2.8 eV) - There is an additional process involved in the lifetime (Ea of 1 eV) E a ,HT + E a ,HT = 1.0eV E a ,LT + E a ,LT = 0.9eV “life-prolonging “ Theoretical interpretation?

23 What is a Single Wall Carbon Nanotube? Unidimensional structure. Excellent mechanical properties. Physical properties remarkably dependent on the molecular structure. C h = n a 1 + m a 2 : chiral vector Tube circumference

24 General growth mechanism for CCVD synthesis

25 Temperature calibration Hipco SWCNTs 532 nm

26 Evolution of final G band Area: An optimum partial pressure is observed for each temperature. This optimum pressure shifts to higher pressures with increasing temperature.

27

28 High temperature deposition of amorphous carbon 900°C


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