1. Heidelberg Instruments VPG200 Conversion software "x-convert"1
Heidelberg Instruments VPG200 Conversion software "x-convert"
Design in layout editor format      
cut in stripes
Heidelberg internal format "lic"
Convert_V11_

2. Retrieve design data Email Network drive Online storage:2
Retrieve design data
Retrieve your design to the data directory on the conversion-pc
design.gds
design.cif
your-pc
conversion-pc data directory
linux
gdsii
cif
ewa.epfl.ch (epfl outlook)
imp.epfl.ch (epfl horde)
webmail.epfl.ch (epfl entry point)
gmail.com, live.com, & others
Network drive
user-pc
(ms windows)
mounted from
\\sti1files\cmi-transfert
Online storage:
my.epfl.ch
drive.switch.ch
dropbox.com
drive.google.com
onedrive.live.com
Secure copy - scp
winscp.net
putty

3. Retrieve design data
Get design using the “user-pc”/Windows environment with a webbrowser
WindowsKey+R then type “firefox”, followed by <cr>
WindowsKey+R then type “iexplore”, followed by <cr>
Save it to one of the folders “gdsii” / “cif that sit on the desktop.
Get your design using the conversion-pc/Linux environment
with the command line or a webbrowser such as “firefox”,
then save it to the directory /home/vec740/gdsii
or /home/vec740/cif
or /home/vec740/dxf
or /home/vec740/gerber
Prefix your design with your initials, i.e. John Doe’s mask > JDo_channel13.gds
Do not create subdirectories within the gdsii/cif/etc. directories, /home/vec740/{myDirName}/{myGds}
Do not make softlinks to design data residing outside of the gdsii/cif/etc. directories.
(the software cannot always handle it)

4. Retrieve design data Only use alpha-numeric characters,
characters for filename ok
not ok
a..z A..Z 0..9 _
[alpha numeric underscore]
- . , ; : < > ? * ( !
space, dash, dot, period, comma, semicolon, colon, special characters
Only use alpha-numeric characters,
and the “underscore”. (the software
cannot handle the rest of the charset)
filename extensions ok
not ok
gds
cif
dxf
gbr
*.g*
GDS,gds2,gdsii,sf
CIF
DXF
GBR, Gerber
Only use listed filename extensions
(the software does not recognize others)

5. Start conversion software
Use left working station (activate with mouse; NO password required) Start conversion application or
Use a terminal window
then type “app” in the terminal / on the command line (do not change directory from /home/vec740):

6. Step 1- job name
Conversion user interface pops up, click on white page or “File”
Start with a new job. Rename with your name "<your 3 initials><jobname>
e.g. John Doe -> jdo_crocodile_v2_lay28 (max 28 characters)

7. Step 2 – design format & data
Conversion user interface is updated
with frame containing your job name. "<your 3 initials><jobname>
Continue specifying the design data:
Source File: Add
Opens a popup
“Load GDSII Design” or
“Load CIF Design” etc...
Dialog to retrieve your file in the corresponding folder opens. Select and confirm with “open” (navigate in folder with mouse control, no character shortcuts)

8. Step 2 – design cell & layers "gds"
GDSII Options pop up window opens:
GDSII Structure: Select design's structure
(top cell, leaf cell)
Unselect all but only number of GDSII
Layers with structures concerning current mask level
Layer Nr: Select layer (tick box) and logical operations (OR/CUT/XOR)
Attention to distinguish
HIMT-Layer-Nr-0 and
GDSII-Layer-Nr-0
In example HIMT: “Layer Nr.1” reads data from GDSII-file “Layer 50”
When done, click “Create Default”

9. Step 2 – design cell & layers "cif"
CIF Options pop up window opens:
Top Cell: Select design's structure
(often last in list, try automatic)
Layer: Select in list of CIF-LayerNames found.
When done, click “Create Default”

10. Step 3 – view selected data
Open a Viewer to review your selection:
old school: “Tk/Tcl Preview”
New style preview is preferred (easier to find commands)
Check for mask size and center
Select “Fill” mode to view inside polygones in black (exposed area)
Simulate inverted mode. If selected must be set “dark mode” at step 6
Two zoom mode available
“Measure” activate a new tool for measurement
Close preview and return to convert interface window

11. Step 4 –Write head Select write lense:
Spot size / Resolution are hardware dependent 3 lenses are available with following specifications Lenses are labeled by focal length [mm]
write mode
write head /
write lense
minimum structure width *
[um]
pixel size
[nm]
stripe width
number of stripes for width 100mm
write speed
[mm2/min]
write time for 110mm x 110mm
High Speed
20mm
2.0
1000
100
1960
6’ 10”
Standard
10mm
0.9
500
200
980
12’ 30”
Advanced Advanced+
4mm
0.7 < 0.6
190
65’
110’ - 215’
* Minimum structure width in X/Y axis direction simultaneously. Vertical lines are smoother than horizontal. Advanced+ mode is available for 600nm critical dimensions but layout dependent

12. Step 5 – Check Option: 1-Geometry
Select Justification tab
Expose Window
Must be non-zero (0).
When size is smaller as expected double check for design's structure in step 2
Borders
Shows Upper/Lower/Right/Left limit of exposure. In case of inverted design oversize the limit to the full wafer or use “add frame” in next options (step 6)
Mirror at Y
Activate mirroring for all top side masks. Do not activate for backside masks or direct writing
Automatic Centering:
WARNING: may dis-align next layer masks. Maybe use only for single layer project
Check relative positioning with
Position Preview or old style
HIMT Preview

13. Step 6 – Check Option: 2 Exposure Polarity
Select Expose options tab:
mask polarity / mask tone and beam shape correction
clear = non-inverted
insides of layout polygons
are written with laser
dark = inverted
outsides of layout polygons
CD Bias
Check with the posted
exposure parameters
Add Frame
Active only with “dark”
Add a clear frame oversizing
exposure window. Borders in step 5 do the same job

14. Step 7 – launch for computing
Skip “optimization”
Activate “Complete task”
Design name can be changed before saving
Conversion are offline for VPG200
Complete expose job
Wait for completion of conversion
Acknowledge end of conversion “Finish”.
! Your conversion data is archived after four weeks (30 days)!

15. Step 8 – Keep confidentiality: cleanup JobDirManager
Warning:
Do this only after writing your
Job and when you are sure that you no longer need the data!
If you need to remove your design and conversion data from the conversion pc, then follow these steps:
start the “job dir” manager with
Tools->JobDirManager
Select delete job, expo, dir, and source file
Confirm
Wait for the update (find all jobs).

16. Mirroring typical for TSA mask mirror non-mirror typical for
flip->
mirror
non-mirror
flip->
typical for
BSA mask and
direct write laser

17. Non inverted vs inverted
clear
dark
inverted

18. Add Frame
clear
dark
no frame
dark
with frame

19. Recapitulation Expose options: clear = non-inverted
(inside of layout polygon are written with laser)
dark = inverted
(outside of layout polygon are written with laser)

20. Overview Window when you begin:
Click-path through progressively disclosed window: