1. Surface hardness of flexible carbon fiber sheets enhanced by deposition of organosilicon oxynitride thin films with an atmospheric pressure plasma jet
Yung-Sen Lin *, Yi-Chen Lai, Yui-Hung Chen
Department of Chemical Engineering, Feng Chia University
(Taichung, Taiwan 40724, R.O.C)

2. Outline Flexible carbon fiber sheets (FCFS)
Low temperature plasma polymerization
Film deposited via low temperature atmospheric plasmas
Atmospheric pressure plasma jet (APPJ)-deposited
SiOxCyNz films onto FCFS
Characterization of APPJ-synthesized SiOxCyNz films

3. Vertu Ascent Motorsport Limited Edition
FCFS
NOKIA
Vertu Ascent Motorsport Limited Edition (

4. Low Temperature Plasma-Polymerized
Organo-Silicon Oxynitride (SiOxCyNz )
Methods for Thin Film Deposition
PECVD
Physical
(1) Evaporation
(2) Sputtering
Electrochemical
(1) Electrodeposition
(2) Anodization
Chemical
(1) Chemical Vapor Deposition (CVD)
(2) Plasma Enhanced Chemical Vapor
Deposition (PECVD)
(3) Plasma Polymerization
(4) Sol-Gel
(5) Spray Pyrolysis
(6) Thermal Oxidation
(7) Chemical Oxidation
(8) Dipping
CVD
Low temperature plasma polymerization
H. Yasuda, ”Plasma Polymerization”, Academic Press, 1985.

5. low temperature atmospheric plasmas
Film deposited via
low temperature atmospheric plasmas
economical advantage
(low cost, high processing speed and simple
system which does not use vacuum equipment)
ecological advantage
(thermal plasma)
Thermal plasma
G. S. Selwyn et. al. Physics Division Progress Report 1999–2000.

6. by Low temperature atmospheric pressure plasmas
Thin Films Deposition
by Low temperature atmospheric pressure plasmas
Atmospheric plasma & (Deposition or Coatings)

7. Atmospheric pressure plasma jet (APPJ)-deposited
SiOxCyNz films onto FCFRPCs
(33.3 l/min)
(1-3 sccm)
Thickness: nm
Deposition rate: nm/s
Exposed duration: 150 seconds
20 kHz
1,000 Watts
(2 sccm)
(9 sccm)
Tetramethyldisiloxan (TMDSO)

8. Aggolomerated nano-particles
Characterization of APPJ-synthesized SiOxCyNz films
ASTM D3363
@765 g
--7H--8H 2B 8H 8H 7H
3 sccm
1 sccm
2 sccm
Surface Morphology: FESEM images 0%
12.1%
20.0%
22.3%
Grain boundary
fraction (%)
Aggolomerated nano-particles

9. Characterization of APPJ-synthesized SOxCyNz films
0000# steel
0 cycle
92 cycles
76 cycles
58 cycles
2 sccm
3 sccm
1 sccm
Surface Morphology: AFM images
Surface roughness (nm)
8.7 nm
6.4 nm
6.9 nm
10.0 nm
38.3 nm
9.0 nm
18.4 nm
25.1 nm

10. Characterization of APPJ-synthesized SiOxCyNz films
Atomic Compositions analyzed by XPS

11. Characterization of APPJ-synthesized SiOxCyNz films

12. Conclusions
SiOxCyNz films have been sucessfully deposited onto FCFS by an atmospheric pressure plasma polymerization method with an APPJ is proven to highly enhance the surface hardness from 2B for as-received FCFS to 8H for FCFS/APPJ-deposited SiOxCyNz film by injecting air gases directly into the precursor TMDSO vapors at an air flow rate of 1 sccm.
The scratch resistance of FCFS is improved from a poor scratch resistance on a scratch rate of 100% just scratched for 1st cycle for as-received FCFSW to a scratch rate of 0% after scratched for 92 cycles against a 0000#-grade steel wool at 100 g.
Atmospheric pressure plasma-polymerized SiOxCyNz films are used to offer FCFS with the smooth (Ra 6.4 nm and Rms 9.0 nm) and the hard [high combined composition of Si-(O)4 bond of up to 56.8%] surfaces synthesized in SiOxCyNz film.

13. Thank you for your attention
Acknowledgements
This study is financially supported by the Ministry of Science and Technology of Republic of China (project No: MOST E CC3, MOST E CC3, MOST E and MOST E ).
Thank you for your attention