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CMOS FABRICATION PROCESSES
CORPORATE INSTITUTE OF SCIENCE & TECHNOLOGY , BHOPAL DEPARTMENT OF ELECTRONICS & COMMUNICATION CMOS FABRICATION PROCESSES - Prof . Rakesh K. Jha
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CMOS FABRICATION PROCESS
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P- WELL PROCESS P- well process is very much similar to that of n-well process. The base wafer is of lightly doped N type, a well mask is used to diffuse in P-type wells where the N-channel devices will be fabricated.
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TWIN-TUB PROCESS The base wafer is very weakly doped and with two separate masks wells of both P type and N type material are constructed where N-channel and P-channel devices respectively will be fabricated.
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