1. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. An aspheric mirror surface (black solid curve) for flattop mode shaping compared with a spherical surface with a radius of curvature of 9.3mm (gray solid curve). A 20th-order circular super-Gaussian with a beam diameter of 90μm was chosen as the desired mode, and the aspheric mirror was to be placed at 6.5mm away from the VCSEL aperture. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627

2. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. A typical PMGI contrast curve measured from the staircase pattern described in the text. The developing time was 30s. The black solid diamonds represent the portion of the contrast curve utilized in the aspheric optic fabrication. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627

3. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Surface figure of fabricated aspheric mirror after removing the underlying spherical envelope. A 20th-order circular super-Gaussian with a beam diameter of 90μm was chosen as the desired mode, and the mirror was to be placed at 6.5mm away from the VCSEL aperture. (a) 2-D mesh, (b) 1-D slice along x at y=0. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627

4. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Surface figure of fabricated aspheric mirror after removing the underlying spherical envelope. A 20th-order square super-Gaussian with a beam width of 80μm was chosen as the desired mode, and the mirror was to be placed at 7mm away from the VCSEL aperture, (a) 2-D mesh, (b) 1-D slice along x at y=0. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627

5. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Directly reflected mode from the aspheric mirror for circular flattop mode shaping. The incident mode was a plane wave going through a circular aperture with a diameter of 90μm placed at 6.5mm in front of the aspheric mirror. The reflected mode was simulated and measured at the aperture plane. (a) Theoretical prediction, (b) experimental measurement, (c) one-dimensional comparison of the theoretical prediction (gray dashed curve) and the experimental measurement (black solid curve) along x at y=0. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627

6. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Square flattop mode in a circular-aperture VCSEL. A 20th-order square-shaped super-Gaussian with a beamwidth of 80μm was chosen as the desired mode, and the aspheric mirror was to be placed at 7mm from the VCSEL aperture. (a) 2-D near-field intensity, (b) 1-D slice of far-field intensity. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627

7. Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Circular flattop mode in a circular-aperture VCSEL. A 20th -order circular super-Gaussian with a beam diameter of 90μm was chosen as the desired mode, and the aspheric mirror was to be placed at 6.5mm from the VCSEL aperture. (a) 2-D near-field intensity, (b) 1-D slice of far-field intensity. Figure Legend: From: Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates Opt. Eng. 2006;45(4):043401-043401-7. doi:10.1117/1.2190627