Lawrence Livermore National Laboratory María Rosa Rivera Roque Research Supervisors: Shannon Ayers and Victor Sperry Research Advisor: Scot Olivier Educational Home Institution: Sistema Universitario Ana G. Méndez Deposition Thickness Experiments Using a Vacuum Chamber

OVERVIEW Introduction to nanolaminate Introduction to nanolaminate The goal of the experiments The goal of the experiments Vacuum chamber Vacuum chamber The development of the experiments The development of the experiments Discussion of results Discussion of results Conclusion Conclusion Acknowledgements and references Acknowledgements and references

Introduction Nanolaminate Has been developed for adaptive optical correction. Has been developed for adaptive optical correction. This technology is applicable. This technology is applicable. Create thin, flexible and lightweight nanolaminate mirrors. Create thin, flexible and lightweight nanolaminate mirrors.

Deposition Thickness Experiments Using a Vacuum Chamber The goal of the experiments were to characterize the deposition rate and thickness profile for three elements. ELEMENT S CarbonZirconiumCopper

Vacuum Chamber Create the deposition environment Create the deposition environment Inside it, begins the deposition of a film or coating Inside it, begins the deposition of a film or coating Three basic technologies for developing a coating: Three basic technologies for developing a coating: Ion plating EvaporationSputtering

Magnetron Sputtering Technology Is a vacuum process used to deposit very thin films on substrates. It is performed by applying a low pressure gas to create a plasma. During the sputtering energized plasma and ions strike the target and cause atoms from that target to be ejected with enough energy to travel and bond with the substrate.

The Development of the experiments consist of: The set up of the experiment Prepared a 60 inch in diameter plate Set up the vacuum chamber and the computer Add wafers Perform the experiment Put the plate inside the vacuum chamber Parameters of the experiments No rotation and No translation (Static) Discussion of results and conclusions Use the profilometer Analyze thickness curve of the elements Depositing Pure Power Run Experiment Zirconium 3600 watts 13:10 min Carbon 500 watts 105 min Copper 500 watts 28:45 min

Discussion of Results The profilometer is a thin film thickness measuring tool. It is used to measure the thickness of the deposition at a specific location.

Discussion of Results ∫ x 2 dx Thickness Curve for Carbon Target Thickness in Angstroms Thickness Curve for Copper Target Thickness in Angstroms Distance in cm from centerline of target Thickness Curve for Zirconium Target Thickness in AngstromsDistance in cm from centerline of target

Discussion of Results TARGET 60’’ DIAMETER PLATE WAFERS 4 5/8 ’’ Higher angles for sputtering - the deposition will be spread less on the wafers.

Conclusions These experiments are important to know how thick the nanolaminate mirror is going to be. These experiments are important to know how thick the nanolaminate mirror is going to be. With these thickness profiles and rates we can also calculate for future experiments: With these thickness profiles and rates we can also calculate for future experiments: the rotation (revolution per minute) linear translation (cm per minute)

Acknowledgements This project is supported by the National Science Foundation Science and Technology Center for Adaptive Optics, managed by the University of California at Santa Cruz under cooperative agreement No. AST – This project is supported by the National Science Foundation Science and Technology Center for Adaptive Optics, managed by the University of California at Santa Cruz under cooperative agreement No. AST – REU by the HACU Hispanic Scientist Development Program. REU by the HACU Hispanic Scientist Development Program. Sperry, Victor – Research Supervisor Sperry, Victor – Research Supervisor Ayers, Shannon – Research Supervisor Ayers, Shannon – Research Supervisor

References