Facilities in the Molecular and Materials Physics group Bill Gillin Dept of Physics

Optical Spectroscopy Photoluminescence –Tunable (215nm – 2500nm) pulsed (~6ns) excitation Can be used for time resolved measurements with detection in the range ~ nm Also photoluminescence excitation spectroscopy –CW 405nm and 532nm pump lasers

Spectroscopic ellipsometery –Horiba Jobin Yvon UVISEL NIR instrument on order nm wavelength range Automatic variable angle goniometer 40°-90° (0.01° step) Microspot optics 0.05, 0.1 and 1mm spot size Heated sample stage RT-600°C Liquid sample cell

Time of flight –Facilities for photoconductivity measurements to measure carrier mobilities in organics –Tuneable excitation using OPO –Ultrafast measurements using 355nm or 266nm

Electrical Characterisation A range of source measure units with current measurement down to femtoamps These can be used for transistor characterisation

Photolithography Spin coater Karl Suss MJB3 Mask Aligner Bakeout oven Also have UV light box for crude photolithography

Deposition systems Two dedicated organic evaporation systems –6 organic sources 2 metal sources –4 organic sources 2 metal sources Both systems have shadow mask facilities Also one general purpose evaporator mainly used for metal evaporation

Other equipment Dektak 3ST surface profiler Oxygen plasma system