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Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating.

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Presentation on theme: "Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating."— Presentation transcript:

1 Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating voltage –2 nm minimum spot size –12 MHz scanning rate –150 x 190 mm write area –0.62 nm stage movement precision –< 25 nm stitching & overlay accuracy MCPFe_LiNE & ionLiNE e_LiNE is a ultra high resolution electron beam lithography system and nano-engineering workstation. Key applications: Lithography on 4 inch samples; Electron beam induced deposition and etching; In-situ electrical measurements and nano-manipulation, e.g. CNT or nanorods. ionLiNE is dedicated to ion beam nanolithography, fabrication, and engineering. Key applications: Low dose ion events; Thin film engineering; Surface fictionalization; Localized defect injection.

2 1.Light sources: Ar + laser, He-Cd laser, Xe-lamp, Ti-sapphire fs laser. 2.Photoluminescence (PL), excitation PL, photoconductivity facilities. 3.Modulated photo-reflectance facilities. 4.Hamamatsu Streak Camera C5680 for time-resolved PL. 5.OI Spectro-Mag 4000 system: magnetic field up to 7T; sample temperature range from 5K to 300K. 6.OI Spectro-Mag 2000 system: magnetic field up to 14T; sample temperature range from 0.3K to 80K. 7.Closed cycle (10 - 300K) system for variable temperature transport and optical measurements. 8.LHe cryostat (2 – 300K) for variable temperature magneto-transport measurements. 9.LN 2 cryostat (77 – 450K) for variable temperature magneto-transport and optical measurements. 10.Various electronic equipments for transport measurements Laboratory Equipment List

3 Quantum wire resonant tunneling diode fabrication by photolithography

4 Structure fabricated by e-beam lithography

5 Low temperature and high magnetic field transport measurements

6 Low temperature magneto-photoluminescence measurements

7 Variable temperature magneto-transport measurements

8 Transport measurement facilities Oxford Spectro-Mag 2000 system (B: 0  14T; T: 0.3K  80K)

9 LHe cryostat (2 – 300K, 0 – 800mT))

10 Oxford Spectro-Mag 4000 system (B: 0  7T; T: 5K  300K) Magneto-optical measurement facilities

11 Spex 1403 monochromator

12 Closed cycle (10 - 300K) system

13 Hamamatsu Streak Camera

14 2D image including spectra and temporal information Time Wavelength

15 Electronic equipments for transport measurements

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