Network for Computational Nanotechnology (NCN) UC Berkeley, Univ.of Illinois, Norfolk State, Northwestern, Purdue, UTEP First Time User Guide to OMEN Nanowire**

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Presentation transcript:

Network for Computational Nanotechnology (NCN) UC Berkeley, Univ.of Illinois, Norfolk State, Northwestern, Purdue, UTEP First Time User Guide to OMEN Nanowire** Sung Geun Kim*, Saumitra R. Mehrotra, Ben Haley, Mathieu Luisier, Gerhard Klimeck Network for Computational Nanotechnology (NCN) Electrical and Computer Engineering **

Sung Geun Kim Outline Introduction : Device →What is a nanowire? →What is a nanowire FET? →What can be measured in a nanowire FET? What can be simulated by the OMEN Nanowire? -Input What if you just hit “Simulate”? - Output Examples – input-output relationship →What if the length of the channel is changed? →What if the diameter of nanowire is changed? Limitation of the OMEN Nanowire tool References

Sung Geun Kim What is a nanowire? Nanowire : Wire-like structure with diameter or lateral dimension of nanometer(10 -9 m) ~10 -9 m=1nm ~Size of DNA → Various material systems can be used to fabricate nanowires e.g.) Silver, Gold, Copper, …, etc. (metal) Si, Ge, GaAs, GaN, …, etc. (semiconductor)

Sung Geun Kim What is a nanowire? Fig 2. Fig. 3 Nanowire FET Fig. 1 **Nanowire memory cell Fig 1. Fig. 2 ***Nanowire LED Fig 3. National Institute of Standards and Technology B. Tian, Lieber Group, Harvard University Application of nanowires

Sung Geun Kim What is a nanowire FET? Nanowire FET : field effect transistor(FET) using nanowire Gate Channel Insulator Source Drain Current »The current from the source to the drain is turned on and off by the voltage applied to the gate. »Because the gate in nanowires is surrounding the channel, it can control the electrostatics of the channel more efficiently than the conventional MOSFET. On Off

Sung Geun Kim What can be measured in a nanowire FET? IV Characteristics [1] (Id-Vg, Id-Vd) (a) Id-Vg(b) Id-Vd [1] Sung Dae Suk, et. al., IEDM, 2005, “High Performance 5nm radius Twin Silicon Nanowire MOSFET(TSNWFET) : Fabrication on Bulk Si Wafer, Characteristics, and Reliability VgVg VdVd IdId VgVg VdVd IdId

Sung Geun Kim What can be simulated by OMEN Nanowire? OMEN Nanowire can simulate nanowire FETs of different types. Gate Channel Rectangular Nanowire Insulator Circular Nanowire Channel Insulator You can choose between a rectangular nanowire and a circular nanowire Device Type

Sung Geun Kim What can be simulated by OMEN Nanowire? Nanowire FETs of various sizes. Device Structure - Geometry Geometry-XGeometry-YGeometry-Z

Sung Geun Kim What can be simulated by OMEN Nanowire? Nanowire FETs of different crystal orientation Device Structure – Crystal Orientation (a) [100](b) [110](c) [111] Cross-section of the nanowire with transport direction [3] (a) [100], (b) [110], (c) [111]

Sung Geun Kim What can be simulated by OMEN Nanowire? Nanowire FETs with strain Device Structure - Strain

Sung Geun Kim What can be simulated by OMEN Nanowire? OMEN Nanowire can simulate nanowire FETs of different material and environment parameters. Material/Environment

Sung Geun Kim What if you just hit “Simulate”? You will get the result immediately with the following message! To submit new simulation, you need to change other input parameters such as the structure, material, environment parameters. The estimated walltime/memory usage[5] to run the simulation would be posted after you click “Simulate” [5] ime_table.htmlhttp://cobweb.ecn.purdue.edu/~gekco/students/SungGeunKim/SungGeunKim_OMENNanowire_t ime_table.html

Sung Geun Kim Outputs Sequence plot Click! [ Inputdeck ] : Input parameters translated to the format that can be used for job submission to OMEN [ Id-Vg Characteristics ] : Id-Vg curve (Id-Vd curve can be chosen to be shown in the environment input option) [ 1D electron density ] : 1D electron density (/cm 3 ) to the transport direction [ 1D bandstructure ] : 1D bandstructure/Fermi levels in the contacts/transmission coefficient/current density/conduction band edge through the nanowire [ Density of states (x,E) ] : 2D density of states as function of transport direction x and energy E [ Transmission and current density ] : Transmission coefficient and the current density(=Transmission*(f L -f R ) fL/fR:fermi function at the left and right contact) [ 3D electron density ] [ 3D electron density(log) ] : log scale of 3D electron density [ 3D electrostatic potential ] [ Output Log ] : includes all the messages posted on the screen after you click “Simulate” and the output/error messages from the OMEN simulator.

Sung Geun Kim What if the length of the channel is changed? IV Characteristics Decreasing Lc Lc:Channel Length =Gate Length Due to tunneling current * Drain current and subthreshold swing** at small Vg increases due to tunneling current as channel length decreases. * I d (A/μm) - drain current is normalized by the circumference of the nanowire ** Subthreshold swing is defined as the inverse of the slope of log 10 Id vs Vg curve = ∂(log 10 Id)/ ∂ Vg Subthreshold Swing** increasing

Sung Geun Kim What happens at small channel length? Bandstructure Current Density* Transmission Bandstructure at the Right Contact Bandstructure at the Left Contact Conduction Band Edge Tunneling Channel length = 4nm V g =0V, V d =0.4V Source Drain *Current Density =Transmission*(fL-fR) fL:left contact fermi function fR:right contact fermi function

Sung Geun Kim What if the nanowire diameter is changed? IV Characteristics Increasing Dch V th *decrease * Vth can be defined in many ways but, here we define it as a voltage where the drain current becomes larger than certain value(10 -7 A/μm) Dch: diameter of circular nanowire

Sung Geun Kim What happens in the channel? Electron Density Increasing Dch Source Drain Channel Electron density in the channel increases as diameter of nanowire increases. → Drain current increases at large diameter nanowire. Drain I d (A/μm) V g (V) V g =0V, V d =0.4V

Sung Geun Kim What is OMEN? OMEN [3,4] : atomistic full-band quantum transport simulator SourceDrain Gate Carrier transport [3] Mahieu Luisier, et. al., Physical Review B,2006 [4] Atomistic description of bandstructure – sp3d5s* tight binding model +3D Poisson and Schrodinger equation [3,4] Wave Function Approach [3,4]

Sung Geun Kim Cross section of nanowire cannot be larger than 3X3 nm 2 or smaller than 1.5X1.5nm 2 Length of gate should be less than 60 nm You cannot choose which server or the number of CPUs* in that server to use Simulation may not be converged at high Vg (e.g. larger than 0.7V) when potential barrier is about the same as the conduction band edge of the source side [6] Limitation of the OMEN Nanowire tool *The number of CPUs is estimated by OMEN Nanowire according to the time table[5] database from the cross section and gate length of the nanowire that user set up in input. [6]

Sung Geun Kim On-demand simulation Number of CPUs with which OMEN Nanowire can submit job is less than 256 in order to end the simulation in 4 hours* in Steele cluster. If your simulation needs more than 256 CPUs, then following message will appear and the simulation will be aborted. If you want to simulate large structure that would use more than 256 CPUs or if you want to simulate with different material system than what is now offered in OMEN Nanowire, you request it to the developer team via or webpage *This is the walltime limit in Steele cluster

Sung Geun Kim References Experimental Study on Nanowire FET [1] Sung Dae Suk, et. al., IEDM, 2005, “High Performance 5nm radius Twin Silicon Nanowire MOSFET(TSNWFET) : Fabrication on Bulk Si Wafer, Characteristics, and Reliability Physics of Nanowire FET [2] Wang, Jing (2006), "Device Physics and Simulation of Silicon Nanowire Transistors," OMEN [3] Mahieu Luisier, et. al., “Atomistic simulation of nanowires in the sp3d5s* tight-binding formalism : From boundary conditions to strain calculations”, Physical Review B,2006 [4] Time/memory estimation in OMEN Nanowire [5] owire_time_table.html owire_time_table.html The Limitation of the OMEN Nanowire at high gate voltage [6] OMEN Nanoiwre Supporting Document : Limitation of the Tool at Large Gate Voltage -