Characterizing Multilayer Thin films

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Presentation transcript:

Characterizing Multilayer Thin films Ahsan Uddin 29.03.2016

Characterization Methods X Ray Diffraction Transmission Electron Microscopy X Ray Photoelectron Spectroscopy Raman spectroscopy Ellipsometry X-ray Reflectivity (XRR) Scanning Electron Microscopy (SEM)

Ellipsometry Ellipsometry analyzes the dielectric properties of a supported ultrathin film Usually, film thickness and/or optical constants (like refractive index) are qualities measured with an ellipsometer Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity very sensitive in the optical response

Transmission Electron Microscopy EELS X-ray detector Electron beam ~ 0.1nm XEDS and EELS Scanning transmission electron microscopy (STEM) Annu. Rev. Mater. Res. 2008. 38:559–84 A.Genc- et al./Ultramicroscopy109(2009)1276–1281

Characterization of multilayer TiO2 /ZnΟ nanostructured thin films using Raman spectroscopy OPTOELECTRONICS AND ADVANCED MATERIALS – RAPID COMMUNICATIONS Vol. 9, No. 5-6, May – June 2015, p. 782 - 787

Characterization of Multilayer Thin Films by Laser- Induced Thermal Desorption Mass Spectrometry ANALYTICAL CHEMISTRY, VOL. 59. NO. 24. DECEMBER 15, 1987 2925

Scanning Electron Microscopy (SEM)