1. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 1 Nanotechnology J.R.Krenn Institute for Experimental Physics Karl-Franzens-University Graz, Austria joachim.krenn@uni-graz.at nanooptics.uni-graz.at

2. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 2 Literature [1]K.E.Drexler, Nanosystems, Wiley, New York, 1992 [2]H.-G.Rubahn, Nanophysik und Nanotechnologie, Teubner, Stuttgart 2002 (german) [3] R.Waser (ed.), Nanoelectronics and Information Technology, Wiley-VCH, Weinheim, 2003 [3]M.Köhler, Nanotechnologie, Wiley-VCH, Weinheim, 2001 (german) [4]V.Balzani et al., Molecular Devices and Machines, Wiley-VCH, Weinheim, 2003 [5]I.Fujimasa, Micromachines, Oxford Univ. Press, Oxford, 1996 [6]Nanotech, Special Issue Scientific American, September 2001 www.nanotechweb.org (news service) www.nano-tek.org (general) www.foresight.org/NanoRev/index.html (general) www.sunsite.nus.edu.sg/MEMEX/nanolink.html (link list) Illustrations were taken from websites, books and journals. Great care was taken to assign the respective copyrights. The names of companies or products mentioned in the following may be the trademark of their respective owners.

3. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 3 What is Nanotechnology? (1) –1931 M.Knoll, E.Ruska: Electron Microscope –1959 Feynman's Talk 'There's plenty of room at the bottom' www.zyvex.com/nanotech/feynman.html –1974 N.Taniguchi: 'Nanotechnology' –late 80's K.E.Drexler atom-by-atom 'assembler' –90's Molecule-by-Molecule supramolecular chemistry –late 90's Submicron Scaled Matter www.foresight.org

4. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 4 What is Nanotechnology? (2) www.foresight.orgScience november 9, 2001Scientific American september 2001 Problems: (i) energy supply, communication,... (ii) scalability, molecular fluctuations, noise, 'sticky' and 'fat' fingers

5. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 5 What is Nanotechnology? (3) –The Hardcore Definition atom or molecular scale assembling or self organization –'Anything goes' including chemistry, biology,... –A Pragmatic Definition novel effects due to controlled structuring in the size range 1 to a few 100 nm Nanoscience acept.la.asu.edu

6. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 6 Why Nanotechnology? To optimize properties readily exploited increasing speed mechanics: lower response time, higher resonance frequency electronics: shorter signal paths, lower parasitic RCL, lower power dissipation optics: faster (and higher density) storage, modulation, switching, routing material demand (e.g., Ge) To exploit novel properties approaching typical wavelength scales, increasing surface / volume ratio materials: decreasing crystallite size (mechanical strength, magnetic storage), nanoparticles for catalysis or optics electronics: quantum effects optics: near-fields, quantum communication

7. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 7 Outline (1) 1.Methods 2.Electronics 3.Optics 4.Mechanics & Materials

8. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 8 Outline (2) 1.Methods Microscopy and (Top-Down) Lithography Nanoimprinting Bottom-Up Structuring 2.Electronics The Semiconductor Roadmap Energy Quantization and Quantum Dots Conductance Quantization Molecular Electronics Scanning Tunneling Microscopy 3.Optics Micro-Optics Near-Field Optics Scanning Near-Field Optical Microscopy Surface Plasmons 4. Mechanics & Materials Micromechanics Atomic Force Microscopy Nanophase Materials Carbon Geometries

9. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 9 NANOTECHNOLOGY Part 1. Methods in Nanotechnology Microscopy and (Top-Down) Lithography –Optical –Electron –Scanning Probe Nanoimprinting Bottom – Up Structuring

10. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 10 Optical Microscopy © Nikon resolution limit Solid immersion lens (SIL) transfer function Micro-photoluminescence (a) with and (b) without SIL (www.uni-karlsruhe.de) Immersion lens from [2]

11. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 11 Confocal Optical Microscopy © Nikon Marvin Minski 1955 Principle: confocal aperture rejects light not originating from the focal plane; focussed light beam & scanning (either light beam or sample) High aperture focussing: (a)-(c) plots and (d)-(f) log. plots of the intensity distribution in the focal plane of a lens N.A.=0.966. Intensity ratios of I x :I y :I z =1:0.0081:0.192 M.Mansuripur, Classical Optics, Cambridge Univ. Press, 2002

12. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 12 Optical Lithography dot.che.gatech.edu Mask: Cr on glass; production by either focussed laser beam writing or electron beam lithography; phase shift masks Light sources: Hg arc lamp ( 0 =436, 365, 248 nm) KrF laser ( 0 =248 nm), ArF laser ( 0 =193 nm), F 2 laser ( 0 =157 nm) Lens system: projection reduction typically 1:4 Structure transfer to photosensitive polymer resists

13. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 13 Electron Microscopy U/Vv/c /nm 10 -1 6.3 10 -4 3.9 12.0 10 -3 1.2 10 1 6.3 10 -3 3.9 10 -1 10 2 2.0 10 -2 1.2 10 -1 10 4 0.19 1.2 10 -2 10 6 0.94 8.7 10 -4 De Broglie wavelength of the electron

14. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 14 Transmission Electron Microscopy buried hexagonal phase in cubic CdTe (www.nrel.gov) www.biologie.uni-hamburg.de Grain boundary in precipitate aluminum particle (www.lbl.gov) electron-sample interaction

15. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 15 Scanning Electron Microscopy Iowa State Univ. secondary electron detection www.jeol.com electron-sample interaction

16. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 16 Electron Beam Lithography

17. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 17 What else a photon or electron can tell LEEDLow energy electron diffraction AESAuger electron spectroscopy EELSElectron energy loss spectroscopy UPSUltraviolet photoemission spectroscopy XPSX-ray photoemission spectroscopy XRDX-ray diffraction IPESInverse photoemission spectroscopy TDSThermal desorption spectroscopy STMScanning tunneling microscopy STS Scanning tunneling spectroscopy..... The Surface Science ToolboxOptical Spectroscopy Abs., Trans., Refl. Fluorescence, Raman Harmonic Generation Wave mixing etc. Femtosecond time resolution

18. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 18 Scanning Probe Microscopy (1) www.fysik.dtu.dk constant gap modeconstant height mode www.ilp.physik.uni-essen.de

19. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 19 Scanning Probe Microscopy (2) www.surfchem.kth.se, www.veeco.com www.omicron.com Tip: depending on probe type Scanner: PZT piezoelectrics, electrostrictive Mechanics: compact design Electronics: preamplifier, PI feedback loop Computer: scan control, data analysis Vibration isolation SPM lithography

20. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 20 Nanoimprinting Nanoimprinting scheme (following CD/DVD process) T.Hoffmann, Univ. Wuppertal Example: gold structures on silicon PMMA resist S.Chou et al., J.Vac.Sci.Technol.B 14, 4129 (1996)

21. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 21 Soft Lithography Michel et. Al., IBM J. Res. & Dev., Vol. 45, 2001 Univ. of Delaware Replicate Forming, Micro-Contact Printing, (Capillary Moulding)

22. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 22 Bottom – Up: Molecular Architecture www.ifm.liu.se Self assembled monolayers R.D.Piner et al., Science 283, 661 (1999) Epitaxial growth (MBE) VO x on Pd (111) 7.8 x 7.8 nm2 honeycomb (2 x 2) (surface-science.uni-graz.at) AIN on SiC(0001) (www.asu.edu)

23. J.R.Krenn – Nanotechnology – CERN 2003 – Part 1 page 23 Top – Down –optical (semiconductor industry) –electron (master production, research) –scanning probe (mainly research) –Nanoimprinting ! Bottom – Up supramolecular level Summary: Lithography