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Mesoporous silica thin films: k ~ 2 required for <0.10  m integrated circuits P. Yang, et al., Adv. Mat. 10, 1385 (1998) Current dense fluorinated silica.

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Presentation on theme: "Mesoporous silica thin films: k ~ 2 required for <0.10  m integrated circuits P. Yang, et al., Adv. Mat. 10, 1385 (1998) Current dense fluorinated silica."— Presentation transcript:

1 Mesoporous silica thin films: k ~ 2 required for <0.10  m integrated circuits P. Yang, et al., Adv. Mat. 10, 1385 (1998) Current dense fluorinated silica or polymer films are not suitable Porosity is required, with mechanical and thermal stability Transmission electron micrographs 1.522.533.54 Perpendicular Parallel x4 Arbitrary Intensity  95 Å (200)(300) X-ray diffraction

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3 Bio-Optic Synthetic Systems Dr.Leonard Buckley, DARPA/DSO

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5 N.A. Melosh et al., Adv. Mater., submitted. Tetraphenylporphyrin/silica/EO 106 -PO 70 -EO 106 Optical Limiting Materials for Vision/Pilot Protection Improved damage resistance compared to polymer hosts 1 mm 0 wt% F127 35 wt% F127 55 wt% F127 Increased dye solubility compared to inorganic glass hosts Reduced light transmission at higher laser intensities with Dr. Thomas Cooper, Wright-Patterson AFB


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