1. Furnaces and Wet bench area Savitha P

2. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots Need to have purple-nitrile gloves for all processes?

3. Wet bench - Maintenance Process run sheets for monthly monitoring of – Silicon etches – TMAH & KOH – oxide etching – Electrodeposition

4. Furnaces The exhaust problem for the Phosphorus diffusion has been solved

5. Furnace

6. Issues All furnaces have temperature control problems, especially Boron/wet diffusion – Problem with the temperature control board? – Maintenance engineer expected in Sept

7. ALD installation Installation engineer expected on 12 th Sept Needed for installation – 8 inch wafers for process (6-7)? – 100mm Silicon wafers for test runs (atleast 10 Nos. for process demonstration) – Process gas N2 purity 5.0 (3-6 Bar) – Instrument gas N2 purity 2.5 (5-6 Bar) – Cooling liquid for Huber-chiller (e.g. glycol, -25 deg C) – For process gases: 6mm Stainless Steel tube or thick wall Teflon tube outer diameter 6mm, inner diameter 3mm with ¼” VCR connection – For instrument gas flexible tube 4-10mm – Precursors e.g. TMA, DEZn, DI-water… – N2 (purity 2.5) for Dry pump min. 20SLM!!! 6mm tube. – Cooling system for dry pump (This should be a separate cooling unit apart from Unichiller shipped along with ALD tool) – Helium leak detector available – In Addition to that all the necessary Electrical inputs, N2 Generator for both instrument and process gas supplies as specified earlier.