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MOSFETs: Drain Voltage Effects on Channel Current Prof. Paul Hasler.

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Presentation on theme: "MOSFETs: Drain Voltage Effects on Channel Current Prof. Paul Hasler."— Presentation transcript:

1 MOSFETs: Drain Voltage Effects on Channel Current Prof. Paul Hasler

2 Origin of Drain Dependencies Increasing Vd effects the drain-to-channel region: increases depletion width increases barrier height

3 Drain Characteristics

4 Current versus Drain Voltage

5

6 Not flat due to Early effect (channel length modulation)

7 Current versus Drain Voltage Not flat due to Early effect (channel length modulation) In BJTs --- Base Modulation Effects

8 Current versus Drain Voltage Not flat due to Early effect (channel length modulation) I d = I d (sat) (1 + (V d /V A ) ) or I d = I d (sat) e Vd/VA In BJTs --- Base Modulation Effects

9 Current versus Drain Voltage Not flat due to Early effect (channel length modulation) I d = I d (sat) (1 + (V d /V A ) ) or I d = I d (sat) e Vd/VA R out I d (sat) GND I out In BJTs --- Base Modulation Effects

10 Early Voltage Length Dependence Width of depletion region depends on doping, not L Might expect Vo to linearly vary with L

11 Full Range of Effects 0 1 2 3 4 5 6 7 012345678910 1 100 Punchthrough Current (nA) Voltage (V) Exp model Slow / Exponential Increase: Channel Modulation / DIBL Effect Other (faster) effects: Punchthrough --- depletion regions converge Avalanche Breakdown --- impact ionization (Punchthrough voltage = 2 * V A ) V A = 5V

12 Cause of DIBL

13 Drain Induced Barrier Lowering Data taken from a popular 1.2  m MOSIS process Data taken from a popular 2.0  m MOSIS process

14 Different Manifestations of DIBL

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16 Drain Voltage Effects Channel Length Modulation / Early Effect Exponential Modeling Drain Induced Barrier Lowering (DIBL): Source of Exponential I-V dependence Punchthrough: Highest Drain-Source voltage available


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