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ISIR Tanaka lab. Tatsuya Hori 層状鉄酸化物を用いた電子相変化デバイスの 応用に向けた研究.

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Presentation on theme: "ISIR Tanaka lab. Tatsuya Hori 層状鉄酸化物を用いた電子相変化デバイスの 応用に向けた研究."— Presentation transcript:

1 ISIR Tanaka lab. Tatsuya Hori 層状鉄酸化物を用いた電子相変化デバイスの 応用に向けた研究

2 Differences between semiconductor device and Electronic phase transition device (EPT device). ・ Semiconductor device Current control is main feature. ・ EPT device Transition induce drastic changing of physical property. Unprecedented almost all new device. (Not only current control) SemiconductorEPT devices ・ Scaling merit ( 電子相変化デバイス )

3 What are EPT devices? Stimulation (T, H, E, N) H 2 O: Ice Electrons: Insulator Water Metal Applying the transition of stable electronic phase for electronics

4 Necessity for invention of EPT device Considerable expectations… But only few device works in RT has invented Conceivable applications ・ Optical switch ・ Photochromic devices ・ Magnetic modulators ・ ESD protection devices ・ etc…

5 Candidate material for EPT device 240320350500K Charge order3D charge-ordering2D charge-ordering Dielectricityanti-ferroelectricparaelectric Magnetic propertyferrimagneticparamagnetic Fe/O double layer Fe 3+ :Fe 2+ =1:1 Re/O ? + Interaction c a b ReFe 2 O 4 (Re = Dy, Ho, Er, Tm, Yb, Lu, Y) We can get the charge-ordering in room temperature. (= the state electrons are frozen)

6 Electronic field induced resistive switching in RT L. J. Zeng et al., EPL 84, 57011 (2008). Electronic phase transition Resistive switching

7 Motivations ・ Fabricating the ReFe 2 O 4 thin films, then observing the resistive switching phenomenon. then observing the resistive switching phenomenon. ・ For the electronics applying, investigate the switching phenomenon switching phenomenon

8 What is PLD method? Substrate Target Heater Plasma plume Gases Feature ・ Suitable for high-melting-point materials. ・ Easy to control thickness. ・ In situ RHEED observation. ・ etc… Laser Recipe Laser medium: ArF ( = 193nm) T sub = 950˚C, p O2 = 1×10 −4 Pa Post-annealing: 800˚C, in vacuum (b.p. ~ 1×10 −5 Pa)

9 I could fabricate LuFe 2 O 4 and YbFe 2 O 4 thin films. 1/2Re 2 O 3 +2Fe+5/2O 2 ReFe 2 O 4 HoEr Tm YbLu Y Out-of-plane 2  /  scan Achievable in our chamber * * * * * * * (003) (006) (009) I succeeded in fabrication of LuFe 2 O 4 and YbFe 2 O 4 thin film. The orientation is ReFe 2 O 4 [001]//YSZ[111] T = 1470 K * * *

10 Revelation of charge-ordering E A = 0.21 0.26 (eV) Electron transport properties are same as that of bulks’. Existence of charge-ordering confirmed. LuFe 2 O 4 YbFe 2 O 4

11 Resistive switching phenomenon was observed V sample

12 Interrelation between charge-ordering and switching 3D 2D 3D 2D 310K 300K LuFe 2 O 4 YbFe 2 O 4 Resistive switching phenomenon is observed under 3D charge-ordering region

13 Conclusion ・ I successfully fabricated ReFe 2 O 4 thin films and observed resistive switching phenomenon in two systems. ・ I got the data which imply switching phenomenon is observable under 3D charge-ordering region. From the above, I revealed this kind of switching phenomenon is common property of these charge-ordering systems. Fe/O double layer in ReFe 2 O 4


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