1. 24 July 2002 Work In Progress – Not for Publication Modeling and Simulation ITWG Jürgen Lorenz - FhG-IISB ITWG/TWG Members H. Jaouen, STM * W. Molzer, Infineon * R. Woltjer, Philips * G. Le Carval, LETI J. Lorenz, Fraunhofer IIS-B * W. Schoenmaker, IMEC * supported by EC User Group UPPER+ T. Wada, Toshiba K. Nishi, SELETE Japanese TWG 16 industrial members C. Riccobene, AMD L. Richardson, HP M. Giles, INTEL M. Orlowski, Motorola M. Meyyappan, NASA V. Bakshi, SEMATECH E. Hall, ex-chairperson/Motorola J.-H. Choi, Hynix K.H. Lee, Samsung S.-C. Wong, TSMC

2. 24 July 2002 Work In Progress – Not for Publication Key Messages Update of key messages from 2001 ITRS: Technology modeling and simulation is one of a few enabling methodologies that can accelerate development times and reduce development costs: Assessment 25% in 2001, 35% in 2003, 40% in 2006 Strong cross-cut links to the other ITRS sections were established - major goal of ITWG activities to further extend these Accurate technology experimental characterization is essential. Modeling and simulation provides an embodiment of knowledge and understanding. It is a tool for technology/device optimization and also for training/education.

3. 24 July 2002 Work In Progress – Not for Publication Equipment related Equipment/feature scale Lithography Feature scale Front End, Back End Device IC-scale Circuit elements Package modeling Interconnect performance modeling Materials Modeling Numerical Methods Technology Modeling SCOPE & SCALES (Chapter sub-sections in blue)

4. 24 July 2002 Work In Progress – Not for Publication Trends / changes from 1999/2000 edition of ITRS Increased need for fundamental materials modeling and relating those results to electronic properties ( e.g. gate stack ) Need much better techniques / methodologies for exploring end of the roadmap issues. Stronger need for RF simulation methodologies. Need greater tie between models and chip design methodologies Need better analytical and characterization techniques to aid in the development of predictive models. Relevance of advanced numerical methods and algorithms increasing & more detailed in roadmap Key Messages ( cont)

5. 24 July 2002 Work In Progress – Not for Publication Trends / changes from 2001 edition of ITRS New long-term challenge Compact modeling including statistics Adapt summary of issues in challenges list to current technical progress (e.g. skip 248 nm) Adapt details of near-term requirements to current technical progress: - esp. lithography status and roadmap - esp. multi-level hierarchical simulation ITWG actions in 2002 Update 2001 tables Further increase interactions with other ITWGs & impact of simulation Key Messages ( cont)

6. 24 July 2002 Work In Progress – Not for Publication Difficult Challenges > 65 nm

7. 24 July 2002 Work In Progress – Not for Publication Needs Efficient simulation of full-chip interconnect delay Accurate 3D interconnect model; inductance, transmission line models High-frequency circuit models that including –non-quasi-static effects –predictive noise behavior –coupling Predictive, scalable inductor model Reduction of high-frequency measurements needed for parameter extraction for active and passive devices Difficult Challenges High-Frequency Circuit Modeling (>5Ghz) (From Philips)

8. 24 July 2002 Work In Progress – Not for Publication Difficult Challenges Modeling of Ultra Shallow Dopant Distributions (Junctions, Activation), and Silicidation Needs Dopant models & parameters (damage, high-concentration, activation, metastable effects, diffusion, interface and silicide effects) Characterization tools for ultra- shallow geometries and dopant levels Source: A. Claverie, CEMES/CNRS, Toulouse, France

9. 24 July 2002 Work In Progress – Not for Publication Difficult Challenges Modeling of Deposition and Etch Variations, and Feature Variations Across a Wafer Needs Fundamental physical data ( e.g. rate constants, cross sections, surface chemistry). Reduced models for complex chemistries Linked equipment/feature scale models CMP (full wafer and chip level, pattern dependent effects) Next generation equipment /wafer models (e.g. 450 mm wafers ) Simulated across- wafer variation of feature profile for a sputter-deposited barrier.

10. 24 July 2002 Work In Progress – Not for Publication Difficult Challenges Modeling of Lithography Technology Needs Predictive resist models (incl. mechanical stability) Resolution enhancement techniques; mask synthesis (OPC, PSM) 193 nm versus 157 nm evaluation and tradeoff methodologies. Next generation lithography system models: EUV, electron projection, maskless lithography Printing of defect on phase-shift mask: bump defect (top) vs. etch defect (lower)

11. 24 July 2002 Work In Progress – Not for Publication Difficult Challenges Gate Stack Models for Ultra-thin Dielectrics Needs Electrical (breakdown, transport, reliability) & processing models for alternative gate materials and dielectrics Be able to model dielectric constant, surface states, defects, band gap,.... from process/material conditions. MSI - Band structure - Carrier effective mass... Direct Applications - Defect states - Leakage current - Impurity transport - Processing recommendations... Use atomistic models to predict physical and electronic properties of materials; eg, HfO 2. Potentials in a thin SiO 2 layer. 25 nm MIT MOSFET Density of States and IV Curve V DS =1.2V

12. 24 July 2002 Work In Progress – Not for Publication Difficult Challenges < 65 nm

13. 24 July 2002 Work In Progress – Not for Publication Needs Stress voiding Electromigration Piezoelectric effects Textures Fracture ( thin film and bulk) Adhesion Thermo-mechanical Stress in a 80x4 m 2 bamboo segment due to electromigration Difficult Challenges Thermo-Mechanical modeling (IMEC)

14. 24 July 2002 Work In Progress – Not for Publication Other 2001 ITWG Recommendations General Support increased cross-discipline efforts that bring in experts from physics, chemistry, mathematics, and other fields to aid in solving these difficult challenges Need adequate research funds for universities and laboratories for directed long range research Explore ways of standardizing and / or opening up some of the universally used modeling and simulation modules so the focus is on value-add efforts Need improved methodologies for evaluating the impact of modeling and simulation Need a hierarchy of software tools - spread sheets to ab-initio

15. 24 July 2002 Work In Progress – Not for Publication Other 2001 ITWG Recommendations Equipment Modeling Equipment suppliers should supply physical models and modeling information with equipment Process/Device Modeling Need continued modeling effort on improving process simulators Reliability models for circuit design and technology development

16. 24 July 2002 Work In Progress – Not for Publication Other 2001 ITWG Recommendations Package Simulation Need co-design integration software tools - Thermal, mechanical, and electrical - Chip and package - RF capability Circuit Modeling Increased effort on industry standard circuit models Better methodologies for linking process and new device effects to designers I off /I on software tools - e.g leakage prediction

17. 24 July 2002 Work In Progress – Not for Publication New 2002 ITWG Recommendations Tables modified in details New long-term challenge Compact Modeling Including Statistics Long-term requirement for emerging devices: Nanoscale simulation capability including accurate quantum models Long-term requirement for Package Modeling - electrical/optical models: Reliability prediction in coupled modeling

18. 24 July 2002 Work In Progress – Not for Publication Thank You